JPH0367261B2 - - Google Patents

Info

Publication number
JPH0367261B2
JPH0367261B2 JP59041231A JP4123184A JPH0367261B2 JP H0367261 B2 JPH0367261 B2 JP H0367261B2 JP 59041231 A JP59041231 A JP 59041231A JP 4123184 A JP4123184 A JP 4123184A JP H0367261 B2 JPH0367261 B2 JP H0367261B2
Authority
JP
Japan
Prior art keywords
resist
pattern
condensate
base material
seconds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59041231A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60220931A (ja
Inventor
Wataru Ishii
Shozo Myazawa
Shinji Tsucha
Hisashi Nakane
Akira Yokota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP59041231A priority Critical patent/JPS60220931A/ja
Priority to US06/708,940 priority patent/US4702992A/en
Publication of JPS60220931A publication Critical patent/JPS60220931A/ja
Priority to US07/052,466 priority patent/US4902770A/en
Publication of JPH0367261B2 publication Critical patent/JPH0367261B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP59041231A 1984-03-06 1984-03-06 感光性樹脂用下地材料 Granted JPS60220931A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP59041231A JPS60220931A (ja) 1984-03-06 1984-03-06 感光性樹脂用下地材料
US06/708,940 US4702992A (en) 1984-03-06 1985-03-06 Method of preparing photoresist material with undercoating of photoextinction agent and condensation product
US07/052,466 US4902770A (en) 1984-03-06 1987-05-20 Undercoating material for photosensitive resins

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59041231A JPS60220931A (ja) 1984-03-06 1984-03-06 感光性樹脂用下地材料

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP60053276A Division JPS60227254A (ja) 1985-03-19 1985-03-19 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS60220931A JPS60220931A (ja) 1985-11-05
JPH0367261B2 true JPH0367261B2 (enExample) 1991-10-22

Family

ID=12602631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59041231A Granted JPS60220931A (ja) 1984-03-06 1984-03-06 感光性樹脂用下地材料

Country Status (2)

Country Link
US (1) US4702992A (enExample)
JP (1) JPS60220931A (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2614847B2 (ja) * 1986-06-16 1997-05-28 東京応化工業 株式会社 ポジ型感光性組成物
JPH0769611B2 (ja) * 1986-12-01 1995-07-31 東京応化工業株式会社 感光性樹脂用下地材料
JPH01169926A (ja) * 1987-12-24 1989-07-05 Toshiba Corp アライメント方法
AU4349489A (en) * 1988-09-28 1990-04-18 Brewer Science, Inc. Multifunctional photolithographic compositions
US6773864B1 (en) * 1991-11-15 2004-08-10 Shipley Company, L.L.C. Antihalation compositions
US6165697A (en) * 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
US5607824A (en) * 1994-07-27 1997-03-04 International Business Machines Corporation Antireflective coating for microlithography
TW406215B (en) 1996-08-07 2000-09-21 Fuji Photo Film Co Ltd Composition for anti-reflective coating material in lithographic process, and process for forming resist pattern
US7361444B1 (en) * 1998-02-23 2008-04-22 International Business Machines Corporation Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
JP2003189589A (ja) * 2001-12-21 2003-07-04 Canon Inc 可動磁石型リニアモータ、露光装置及びデバイス製造方法
JP4687910B2 (ja) 2004-10-12 2011-05-25 日産化学工業株式会社 硫黄原子を含むリソグラフィー用反射防止膜形成組成物
US9263286B2 (en) 2011-09-29 2016-02-16 Nissan Chemical Industries, Ltd. Diarylamine novolac resin

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
GB1375461A (enExample) * 1972-05-05 1974-11-27
JPS542720A (en) * 1977-06-08 1979-01-10 Konishiroku Photo Ind Co Ltd Forming method of photopolymerized image
JPS5536838A (en) * 1978-09-08 1980-03-14 Tokyo Ohka Kogyo Co Ltd Novel light absorber and photoresist composition containing this
JPS6046422B2 (ja) * 1978-12-07 1985-10-16 東京応化工業株式会社 新規なフオトレジスト組成物
JPS55152706A (en) * 1979-05-18 1980-11-28 Japan Synthetic Rubber Co Ltd Preparation of rubber having nonextractable deterioration-inhibiting ability
US4370405A (en) * 1981-03-30 1983-01-25 Hewlett-Packard Company Multilayer photoresist process utilizing an absorbant dye
US4414314A (en) * 1982-02-26 1983-11-08 International Business Machines Corporation Resolution in optical lithography
JPS5986046A (ja) * 1982-11-10 1984-05-18 Fuji Photo Film Co Ltd 感光性組成物

Also Published As

Publication number Publication date
US4702992A (en) 1987-10-27
JPS60220931A (ja) 1985-11-05

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