JPH0356672B2 - - Google Patents

Info

Publication number
JPH0356672B2
JPH0356672B2 JP60212072A JP21207285A JPH0356672B2 JP H0356672 B2 JPH0356672 B2 JP H0356672B2 JP 60212072 A JP60212072 A JP 60212072A JP 21207285 A JP21207285 A JP 21207285A JP H0356672 B2 JPH0356672 B2 JP H0356672B2
Authority
JP
Japan
Prior art keywords
resin
acid
resist
ink
oil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60212072A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6273989A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP60212072A priority Critical patent/JPS6273989A/ja
Publication of JPS6273989A publication Critical patent/JPS6273989A/ja
Publication of JPH0356672B2 publication Critical patent/JPH0356672B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/06—Lithographic printing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Duplication Or Marking (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP60212072A 1985-09-27 1985-09-27 レジストパタ−ンの形成法 Granted JPS6273989A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60212072A JPS6273989A (ja) 1985-09-27 1985-09-27 レジストパタ−ンの形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60212072A JPS6273989A (ja) 1985-09-27 1985-09-27 レジストパタ−ンの形成法

Publications (2)

Publication Number Publication Date
JPS6273989A JPS6273989A (ja) 1987-04-04
JPH0356672B2 true JPH0356672B2 (enExample) 1991-08-28

Family

ID=16616396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60212072A Granted JPS6273989A (ja) 1985-09-27 1985-09-27 レジストパタ−ンの形成法

Country Status (1)

Country Link
JP (1) JPS6273989A (enExample)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759966A (en) * 1980-09-29 1982-04-10 Taiyo Ink Seizo Kk Uv-curable resist ink composition for dry offset printing
JPS5825374A (ja) * 1981-08-07 1983-02-15 Taiyo Ink Seizo Kk 紫外線硬化型のプリント回路板ソルダーレジストインキ組成物

Also Published As

Publication number Publication date
JPS6273989A (ja) 1987-04-04

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