JPS6273989A - レジストパタ−ンの形成法 - Google Patents

レジストパタ−ンの形成法

Info

Publication number
JPS6273989A
JPS6273989A JP60212072A JP21207285A JPS6273989A JP S6273989 A JPS6273989 A JP S6273989A JP 60212072 A JP60212072 A JP 60212072A JP 21207285 A JP21207285 A JP 21207285A JP S6273989 A JPS6273989 A JP S6273989A
Authority
JP
Japan
Prior art keywords
resin
ink
acid
resist
resins
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60212072A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0356672B2 (enExample
Inventor
Toshihiko Yasui
俊彦 安井
Masanori Kasai
正紀 笠井
Tetsuo Matsumoto
松本　哲雄
Kiyoo Kamei
清雄 亀井
Masahiko Yamazaki
雅彦 山崎
Shiyouzou Yamashita
山下　省蔵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIC Corp
Original Assignee
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink and Chemicals Co Ltd filed Critical Dainippon Ink and Chemicals Co Ltd
Priority to JP60212072A priority Critical patent/JPS6273989A/ja
Publication of JPS6273989A publication Critical patent/JPS6273989A/ja
Publication of JPH0356672B2 publication Critical patent/JPH0356672B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/06—Lithographic printing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Duplication Or Marking (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP60212072A 1985-09-27 1985-09-27 レジストパタ−ンの形成法 Granted JPS6273989A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60212072A JPS6273989A (ja) 1985-09-27 1985-09-27 レジストパタ−ンの形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60212072A JPS6273989A (ja) 1985-09-27 1985-09-27 レジストパタ−ンの形成法

Publications (2)

Publication Number Publication Date
JPS6273989A true JPS6273989A (ja) 1987-04-04
JPH0356672B2 JPH0356672B2 (enExample) 1991-08-28

Family

ID=16616396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60212072A Granted JPS6273989A (ja) 1985-09-27 1985-09-27 レジストパタ−ンの形成法

Country Status (1)

Country Link
JP (1) JPS6273989A (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759966A (en) * 1980-09-29 1982-04-10 Taiyo Ink Seizo Kk Uv-curable resist ink composition for dry offset printing
JPS5825374A (ja) * 1981-08-07 1983-02-15 Taiyo Ink Seizo Kk 紫外線硬化型のプリント回路板ソルダーレジストインキ組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759966A (en) * 1980-09-29 1982-04-10 Taiyo Ink Seizo Kk Uv-curable resist ink composition for dry offset printing
JPS5825374A (ja) * 1981-08-07 1983-02-15 Taiyo Ink Seizo Kk 紫外線硬化型のプリント回路板ソルダーレジストインキ組成物

Also Published As

Publication number Publication date
JPH0356672B2 (enExample) 1991-08-28

Similar Documents

Publication Publication Date Title
US4536468A (en) Method of forming resist pattern
US5753722A (en) Photocurable and thermosetting matte liquid resist composition
TWI654239B (zh) Photosensitive conductive paste, conductive film, circuit and touch panel
JP7781759B2 (ja) 光硬化性熱硬化性樹脂組成物、ドライフィルム、硬化物および当該硬化物を有する電子部品
CN107272334A (zh) 固化性树脂组合物、干膜、固化物和印刷电路板
JPH05194877A (ja) 放射線により網状化可能な被覆剤及びその用途
JP2009020191A (ja) 感光性樹脂組成物及び感光性フィルム
JPS62187722A (ja) 液状感光性樹脂組成物およびそれを用いる画像形成法
CN104977805A (zh) 固化性树脂组合物、用于形成永久覆膜的组合物、干膜以及印刷电路板
JPWO2018179259A1 (ja) 感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及び、プリント配線板の製造方法
WO2015151892A1 (ja) 感光性導電ペースト、導電性薄膜、電気回路、及びタッチパネル
JPS6273989A (ja) レジストパタ−ンの形成法
JPH09309944A (ja) 感光性樹脂組成物
JP2904321B2 (ja) 液状レジストインク組成物
JP4429440B2 (ja) 改良された剥離性及び解像度を有する光画像形成性組成物
KR20010051093A (ko) 광중합성 바인더 올리고머를 갖는 광이미지성 조성물
JP2009185192A (ja) 硬化性樹脂組成物、アルカリ現像型感光性樹脂組成物、これらの硬化物、ビニルエステル樹脂、及び酸基含有ビニルエステル樹脂
JPH0336211B2 (enExample)
JP4011747B2 (ja) 硬化性樹脂の製造方法および硬化性樹脂を含む組成物
CN107436536A (zh) 感光性树脂组合物、干膜及印刷电路板的制造方法
JPH03100009A (ja) 不飽和基含有ポリカルボン酸樹脂、これを含む樹脂組成物、ソルダーレジスト樹脂組成物及びそれらの硬化物
EP0499271A1 (en) Photosensitive resin
JPS60214593A (ja) レジストパタ−ンの形成法
JPH0263319B2 (enExample)
JPS63238174A (ja) レジストインク組成物及び印刷配線板における硬化塗膜の形成方法