JPH0350410B2 - - Google Patents

Info

Publication number
JPH0350410B2
JPH0350410B2 JP60222953A JP22295385A JPH0350410B2 JP H0350410 B2 JPH0350410 B2 JP H0350410B2 JP 60222953 A JP60222953 A JP 60222953A JP 22295385 A JP22295385 A JP 22295385A JP H0350410 B2 JPH0350410 B2 JP H0350410B2
Authority
JP
Japan
Prior art keywords
semiconductor substrate
chemical
nozzle
semiconductor
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60222953A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6281715A (ja
Inventor
Kazutaka Ikeyama
Takashige Nagamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP22295385A priority Critical patent/JPS6281715A/ja
Publication of JPS6281715A publication Critical patent/JPS6281715A/ja
Publication of JPH0350410B2 publication Critical patent/JPH0350410B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP22295385A 1985-10-07 1985-10-07 半導体製造装置 Granted JPS6281715A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22295385A JPS6281715A (ja) 1985-10-07 1985-10-07 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22295385A JPS6281715A (ja) 1985-10-07 1985-10-07 半導体製造装置

Publications (2)

Publication Number Publication Date
JPS6281715A JPS6281715A (ja) 1987-04-15
JPH0350410B2 true JPH0350410B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-08-01

Family

ID=16790462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22295385A Granted JPS6281715A (ja) 1985-10-07 1985-10-07 半導体製造装置

Country Status (1)

Country Link
JP (1) JPS6281715A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63269533A (ja) * 1987-04-27 1988-11-07 Nec Corp 半導体基板の現像装置
US6938629B2 (en) * 2002-11-13 2005-09-06 Taiwan Semiconductor Manufacturing Co., Ltd Rinsing lid for wet bench
JP2011243768A (ja) * 2010-05-19 2011-12-01 Tokyo Electron Ltd 処理液の供給方法、プログラム及びコンピュータ記憶媒体
JP2011243769A (ja) * 2010-05-19 2011-12-01 Tokyo Electron Ltd 基板のエッチング方法、プログラム及びコンピュータ記憶媒体

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5252568A (en) * 1975-10-27 1977-04-27 Nec Corp Production of semiconductor element
JPS5633834A (en) * 1979-08-29 1981-04-04 Toshiba Corp Manufacturing device of semiconductor
JPS60198818A (ja) * 1984-03-23 1985-10-08 Nec Corp フオトレジストの現像装置

Also Published As

Publication number Publication date
JPS6281715A (ja) 1987-04-15

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Legal Events

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