JPH0322711B2 - - Google Patents

Info

Publication number
JPH0322711B2
JPH0322711B2 JP60195946A JP19594685A JPH0322711B2 JP H0322711 B2 JPH0322711 B2 JP H0322711B2 JP 60195946 A JP60195946 A JP 60195946A JP 19594685 A JP19594685 A JP 19594685A JP H0322711 B2 JPH0322711 B2 JP H0322711B2
Authority
JP
Japan
Prior art keywords
layer
junction
bonding
etching
etching mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60195946A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6257263A (ja
Inventor
Mutsuo Hidaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP60195946A priority Critical patent/JPS6257263A/ja
Publication of JPS6257263A publication Critical patent/JPS6257263A/ja
Publication of JPH0322711B2 publication Critical patent/JPH0322711B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N69/00—Integrated devices, or assemblies of multiple devices, comprising at least one superconducting element covered by group H10N60/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0912—Manufacture or treatment of Josephson-effect devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
JP60195946A 1985-09-06 1985-09-06 ジヨセフソン集積回路の製造方法 Granted JPS6257263A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60195946A JPS6257263A (ja) 1985-09-06 1985-09-06 ジヨセフソン集積回路の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60195946A JPS6257263A (ja) 1985-09-06 1985-09-06 ジヨセフソン集積回路の製造方法

Publications (2)

Publication Number Publication Date
JPS6257263A JPS6257263A (ja) 1987-03-12
JPH0322711B2 true JPH0322711B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-03-27

Family

ID=16349601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60195946A Granted JPS6257263A (ja) 1985-09-06 1985-09-06 ジヨセフソン集積回路の製造方法

Country Status (1)

Country Link
JP (1) JPS6257263A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109626323B (zh) * 2009-02-27 2020-12-01 D-波系统公司 超导集成电路
JP6326379B2 (ja) 2012-03-08 2018-05-16 ディー−ウェイブ システムズ，インコーポレイテッド 超伝導集積回路の製作のためのシステムおよび方法
US11038095B2 (en) 2017-02-01 2021-06-15 D-Wave Systems Inc. Systems and methods for fabrication of superconducting integrated circuits
US20200152851A1 (en) 2018-11-13 2020-05-14 D-Wave Systems Inc. Systems and methods for fabricating superconducting integrated circuits
WO2020168097A1 (en) 2019-02-15 2020-08-20 D-Wave Systems Inc. Kinetic inductance for couplers and compact qubits
CN115004393A (zh) 2019-12-05 2022-09-02 D-波系统公司 用于制造超导集成电路的系统和方法
US12376501B2 (en) 2020-05-11 2025-07-29 1372934 B.C. Ltd. Kinetic inductance devices, methods for fabricating kinetic inductance devices, and articles employing the same
US12392823B2 (en) 2021-11-05 2025-08-19 D-Wave Systems Inc. Systems and methods for on-chip noise measurements

Also Published As

Publication number Publication date
JPS6257263A (ja) 1987-03-12

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Legal Events

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