JPH0228267B2 - - Google Patents
Info
- Publication number
- JPH0228267B2 JPH0228267B2 JP58225818A JP22581883A JPH0228267B2 JP H0228267 B2 JPH0228267 B2 JP H0228267B2 JP 58225818 A JP58225818 A JP 58225818A JP 22581883 A JP22581883 A JP 22581883A JP H0228267 B2 JPH0228267 B2 JP H0228267B2
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- type
- silicon oxide
- silicon
- resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D88/00—Three-dimensional [3D] integrated devices
- H10D88/01—Manufacture or treatment
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Bipolar Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58225818A JPS60117764A (ja) | 1983-11-30 | 1983-11-30 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58225818A JPS60117764A (ja) | 1983-11-30 | 1983-11-30 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60117764A JPS60117764A (ja) | 1985-06-25 |
| JPH0228267B2 true JPH0228267B2 (enrdf_load_stackoverflow) | 1990-06-22 |
Family
ID=16835276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58225818A Granted JPS60117764A (ja) | 1983-11-30 | 1983-11-30 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60117764A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01165167A (ja) * | 1987-12-22 | 1989-06-29 | Mitsubishi Electric Corp | 半導体装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5352392Y2 (enrdf_load_stackoverflow) * | 1977-05-12 | 1978-12-14 | ||
| JPS5476677U (enrdf_load_stackoverflow) * | 1977-11-11 | 1979-05-31 |
-
1983
- 1983-11-30 JP JP58225818A patent/JPS60117764A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60117764A (ja) | 1985-06-25 |
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