JPS6154256B2 - - Google Patents
Info
- Publication number
- JPS6154256B2 JPS6154256B2 JP10099279A JP10099279A JPS6154256B2 JP S6154256 B2 JPS6154256 B2 JP S6154256B2 JP 10099279 A JP10099279 A JP 10099279A JP 10099279 A JP10099279 A JP 10099279A JP S6154256 B2 JPS6154256 B2 JP S6154256B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- insulating film
- polycrystalline
- semiconductor
- semiconductor region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10099279A JPS5624949A (en) | 1979-08-07 | 1979-08-07 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10099279A JPS5624949A (en) | 1979-08-07 | 1979-08-07 | Manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5624949A JPS5624949A (en) | 1981-03-10 |
| JPS6154256B2 true JPS6154256B2 (enrdf_load_stackoverflow) | 1986-11-21 |
Family
ID=14288794
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10099279A Granted JPS5624949A (en) | 1979-08-07 | 1979-08-07 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5624949A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4593995A (en) * | 1984-06-11 | 1986-06-10 | Eastman Kodak Company | Method and apparatus for producing multiple sets of copies of a document |
-
1979
- 1979-08-07 JP JP10099279A patent/JPS5624949A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5624949A (en) | 1981-03-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR0180325B1 (ko) | 얇은 베이스영역에 누설전류가 흐르지 않는 바이폴라 트랜지스터를 갖는 반도체장치 및 그 제조방법 | |
| JP2503460B2 (ja) | バイポ−ラトランジスタおよびその製造方法 | |
| JPS63314844A (ja) | 半導体装置の製造方法 | |
| JPH088270A (ja) | 半導体装置およびその製造方法 | |
| JP2629644B2 (ja) | 半導体装置の製造方法 | |
| JPH09115921A (ja) | 半導体装置及びその製造方法 | |
| JPS6252963A (ja) | バイポ−ラトランジスタの製造方法 | |
| JPH06232247A (ja) | 絶縁層上に隔離された半導体層を製造する方法 | |
| JP2565162B2 (ja) | バイポ−ラトランジスタおよびその製造方法 | |
| JPS59108325A (ja) | 半導体装置の製造方法 | |
| JPH0482180B2 (enrdf_load_stackoverflow) | ||
| JPS6154256B2 (enrdf_load_stackoverflow) | ||
| JPS6095969A (ja) | 半導体集積回路の製造方法 | |
| JPH06302826A (ja) | 絶縁ゲート電界効果トランジスタ及びその製造方法 | |
| JPS6154255B2 (enrdf_load_stackoverflow) | ||
| JP2828126B2 (ja) | 半導体装置及びその製造方法 | |
| JPS6237541B2 (enrdf_load_stackoverflow) | ||
| JPS59215741A (ja) | 半導体集積回路装置の製造方法 | |
| KR100268901B1 (ko) | 반도체소자의격리영역형성방법 | |
| JPH01214166A (ja) | バイポーラトランジスタを有する半導体集積回路装置 | |
| JPH0810696B2 (ja) | 半導体装置の製造方法 | |
| JPH03185838A (ja) | 半導体装置の製法 | |
| JPH0240921A (ja) | バイポーラトランジスタの製造方法 | |
| JPS60249364A (ja) | 半導体装置の製造方法 | |
| JPH01111373A (ja) | 半導体装置の製造方法 |