JPH02124739A - 合成石英ガラスおよびその製造方法 - Google Patents

合成石英ガラスおよびその製造方法

Info

Publication number
JPH02124739A
JPH02124739A JP63275297A JP27529788A JPH02124739A JP H02124739 A JPH02124739 A JP H02124739A JP 63275297 A JP63275297 A JP 63275297A JP 27529788 A JP27529788 A JP 27529788A JP H02124739 A JPH02124739 A JP H02124739A
Authority
JP
Japan
Prior art keywords
quartz glass
synthetic quartz
vacuum
particles
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63275297A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0450262B2 (cg-RX-API-DMAC10.html
Inventor
Masatoshi Takita
滝田　政俊
Takaaki Shimizu
孝明 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin-Etsu Chemical Co Ltd
Original Assignee
Shin-Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin-Etsu Chemical Co Ltd filed Critical Shin-Etsu Chemical Co Ltd
Priority to JP63275297A priority Critical patent/JPH02124739A/ja
Priority to US07/427,792 priority patent/US5063181A/en
Priority to DE8989119956T priority patent/DE68904292T2/de
Priority to EP89119956A priority patent/EP0367127B1/en
Publication of JPH02124739A publication Critical patent/JPH02124739A/ja
Publication of JPH0450262B2 publication Critical patent/JPH0450262B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/14—Substrate holders or susceptors
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/10—Reaction chambers; Selection of materials therefor
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/26—Wet processes, e.g. sol-gel process using alkoxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
JP63275297A 1988-10-31 1988-10-31 合成石英ガラスおよびその製造方法 Granted JPH02124739A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP63275297A JPH02124739A (ja) 1988-10-31 1988-10-31 合成石英ガラスおよびその製造方法
US07/427,792 US5063181A (en) 1988-10-31 1989-10-26 Synthetic silica glass article for dopant-diffusion process in semiconductors
DE8989119956T DE68904292T2 (de) 1988-10-31 1989-10-27 Gegenstand aus synthetischem quarzglas fuer den dotierungs-diffusionsprozess in halbleitern.
EP89119956A EP0367127B1 (en) 1988-10-31 1989-10-27 Synthetic silica glass article for dopant-diffusion process in semiconductors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63275297A JPH02124739A (ja) 1988-10-31 1988-10-31 合成石英ガラスおよびその製造方法

Publications (2)

Publication Number Publication Date
JPH02124739A true JPH02124739A (ja) 1990-05-14
JPH0450262B2 JPH0450262B2 (cg-RX-API-DMAC10.html) 1992-08-13

Family

ID=17553468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63275297A Granted JPH02124739A (ja) 1988-10-31 1988-10-31 合成石英ガラスおよびその製造方法

Country Status (4)

Country Link
US (1) US5063181A (cg-RX-API-DMAC10.html)
EP (1) EP0367127B1 (cg-RX-API-DMAC10.html)
JP (1) JPH02124739A (cg-RX-API-DMAC10.html)
DE (1) DE68904292T2 (cg-RX-API-DMAC10.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0388743A (ja) * 1989-06-19 1991-04-15 Shinetsu Sekiei Kk 紫外線レーザ用合成シリカガラス光学体及びその製造方法
JPH0388742A (ja) * 1989-06-09 1991-04-15 Shinetsu Sekiei Kk 合成シリカガラス光学体及びその製造方法
JPH03109233A (ja) * 1989-06-14 1991-05-09 Shinetsu Sekiei Kk 紫外線レーザ用合成シリカガラス光学体及びその製造方法
JPH0497922A (ja) * 1990-08-10 1992-03-30 Shinetsu Quartz Prod Co Ltd 紫外線レーザ用光学部材

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5141786A (en) * 1989-02-28 1992-08-25 Shin-Etsu Chemical Co., Ltd. Synthetic silica glass articles and a method for manufacturing them
JP2908150B2 (ja) * 1992-11-27 1999-06-21 日本電気株式会社 Ｓｏｉ基板構造及びその製造方法
JPH0826742A (ja) * 1994-07-11 1996-01-30 Mitsubishi Chem Corp 合成石英ガラス粉

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62207711A (ja) * 1986-03-10 1987-09-12 Seiko Epson Corp シリカ球の製造方法
JPS63236723A (ja) * 1987-03-26 1988-10-03 Shinetsu Sekiei Kk 半導体工業用石英ガラス製品

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3681113A (en) * 1969-11-19 1972-08-01 Owens Illinois Inc Refractory article and method for producing same
DE2041321C3 (de) * 1970-08-20 1978-06-08 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung von SiO2 -Fasern, ihre Verwendung und kohlenstoffhaltige SiO2 -Fasern
US3666414A (en) * 1971-03-15 1972-05-30 Heraeus Schott Quarzschmelze Method of producing transparent or opaque fused silica or glass with a high silicon content
EP0029590B1 (en) * 1979-11-21 1984-03-21 Hitachi, Ltd. Method for producing optical glass
JPS5858292B2 (ja) * 1980-01-21 1983-12-24 株式会社日立製作所 シリカガラスの製造方法
JPS5777044A (en) * 1980-10-30 1982-05-14 Central Glass Co Ltd Manufacture of glass from metallic alcoholate
US4419115A (en) * 1981-07-31 1983-12-06 Bell Telephone Laboratories, Incorporated Fabrication of sintered high-silica glasses
GB2113200B (en) * 1982-01-08 1985-06-19 Hitachi Ltd Process for producing optical glass
US4681615A (en) * 1982-12-23 1987-07-21 Seiko Epson Kabushiki Kaisha Silica glass formation process
GB2165233B (en) * 1984-10-04 1988-03-09 Suwa Seikosha Kk Method of making a tubular silica glass member
JPS6191024A (ja) * 1984-10-05 1986-05-09 Seiko Epson Corp 円筒状シリカ系ガラスの製造方法
GB2165534B (en) * 1984-10-05 1988-10-19 Suwa Seikosha Kk Method of preparing parent material for optical fibres
DE3522194A1 (de) * 1985-06-21 1987-01-02 Philips Patentverwaltung Verfahren zur herstellung von glaskoerpern
DE3525495C1 (de) * 1985-07-17 1987-01-02 Heraeus Schott Quarzschmelze Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid
US4872895A (en) * 1986-12-11 1989-10-10 American Telephone And Telegraph Company, At&T Bell Laboratories Method for fabricating articles which include high silica glass bodies
US4789389A (en) * 1987-05-20 1988-12-06 Corning Glass Works Method for producing ultra-high purity, optical quality, glass articles
EP0310486B1 (en) * 1987-09-30 1992-03-18 Shin-Etsu Chemical Co., Ltd. A method for the preparation of silica glass
US4943542A (en) * 1987-10-31 1990-07-24 Hitachi Chemical Company, Ltd. Process for producing silica glass
DE3739907A1 (de) * 1987-11-25 1989-06-08 Philips Patentverwaltung Verfahren zur herstellung von glaskoerpern
US4954327A (en) * 1988-08-12 1990-09-04 Blount David H Production of silica aerogels
US4979973A (en) * 1988-09-13 1990-12-25 Shin-Etsu Chemical Co., Ltd. Preparation of fused silica glass by hydrolysis of methyl silicate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62207711A (ja) * 1986-03-10 1987-09-12 Seiko Epson Corp シリカ球の製造方法
JPS63236723A (ja) * 1987-03-26 1988-10-03 Shinetsu Sekiei Kk 半導体工業用石英ガラス製品

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0388742A (ja) * 1989-06-09 1991-04-15 Shinetsu Sekiei Kk 合成シリカガラス光学体及びその製造方法
JPH03109233A (ja) * 1989-06-14 1991-05-09 Shinetsu Sekiei Kk 紫外線レーザ用合成シリカガラス光学体及びその製造方法
JPH0388743A (ja) * 1989-06-19 1991-04-15 Shinetsu Sekiei Kk 紫外線レーザ用合成シリカガラス光学体及びその製造方法
JPH0497922A (ja) * 1990-08-10 1992-03-30 Shinetsu Quartz Prod Co Ltd 紫外線レーザ用光学部材

Also Published As

Publication number Publication date
EP0367127A1 (en) 1990-05-09
EP0367127B1 (en) 1993-01-07
DE68904292D1 (de) 1993-02-18
DE68904292T2 (de) 1993-05-06
JPH0450262B2 (cg-RX-API-DMAC10.html) 1992-08-13
US5063181A (en) 1991-11-05

Similar Documents

Publication Publication Date Title
JP3751326B2 (ja) 高純度透明石英ガラスの製造方法
JP3128451B2 (ja) 合成石英ガラスの製造方法
JPH0940434A (ja) 高純度石英ガラス及びその製造方法
JP4181226B2 (ja) 高純度、高耐熱性石英ガラスの製造方法
JPH0450262B2 (cg-RX-API-DMAC10.html)
CN108821294A (zh) 以普通石英砂为原料制备超纯石英砂的方法
CN108675310A (zh) 以氟硅酸为原料制备超纯石英砂的方法
JP3672592B2 (ja) 合成石英ガラス部材の製造方法
JPH08183621A (ja) 高純度、高耐熱性シリカガラスの製造方法
JPH0912322A (ja) 高純度透明石英ガラス及びその製造方法
JP3123696B2 (ja) 石英ガラス坩堝の製造方法
CN108793176B (zh) 以四氟化硅为原料制备超纯石英砂的方法
JPS63166730A (ja) 石英ガラスの製造方法
JPH0427177B2 (cg-RX-API-DMAC10.html)
JPS6090843A (ja) 光フアイバ用ガラス母材の製造方法
JPH0531509B2 (cg-RX-API-DMAC10.html)
JP2614583B2 (ja) クリストバライト焼結体およびその製造方法
JP2003012331A (ja) 高純度合成石英ガラス粒子
JPH0624993B2 (ja) 石英ガラスの製造方法
JPH0563416B2 (cg-RX-API-DMAC10.html)
JPH035329A (ja) 合成石英ガラスの製造方法
JP2581612B2 (ja) ドーピングシリカ粒子の製造方法
JPH0567575B2 (cg-RX-API-DMAC10.html)
JPH03252387A (ja) 合成石英ガラスルツボの製造方法
JPH03109224A (ja) 石英ガラスおよびその製造法

Legal Events

Date Code Title Description
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20070813

Year of fee payment: 15

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080813

Year of fee payment: 16

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090813

Year of fee payment: 17

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090813

Year of fee payment: 17