JPH0161250B2 - - Google Patents
Info
- Publication number
- JPH0161250B2 JPH0161250B2 JP7045981A JP7045981A JPH0161250B2 JP H0161250 B2 JPH0161250 B2 JP H0161250B2 JP 7045981 A JP7045981 A JP 7045981A JP 7045981 A JP7045981 A JP 7045981A JP H0161250 B2 JPH0161250 B2 JP H0161250B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- electrode
- opening
- auxiliary layer
- electrode material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007772 electrode material Substances 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 238000010897 surface acoustic wave method Methods 0.000 claims description 9
- 229910010272 inorganic material Inorganic materials 0.000 claims description 7
- 239000011147 inorganic material Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 6
- 239000011368 organic material Substances 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- 238000000059 patterning Methods 0.000 claims description 3
- 239000010936 titanium Substances 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 230000013011 mating Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7045981A JPS57185713A (en) | 1981-05-11 | 1981-05-11 | Manufacture for surface acoustic wave reed screen shaped converter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7045981A JPS57185713A (en) | 1981-05-11 | 1981-05-11 | Manufacture for surface acoustic wave reed screen shaped converter |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57185713A JPS57185713A (en) | 1982-11-16 |
JPH0161250B2 true JPH0161250B2 (enrdf_load_stackoverflow) | 1989-12-27 |
Family
ID=13432114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7045981A Granted JPS57185713A (en) | 1981-05-11 | 1981-05-11 | Manufacture for surface acoustic wave reed screen shaped converter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57185713A (enrdf_load_stackoverflow) |
-
1981
- 1981-05-11 JP JP7045981A patent/JPS57185713A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57185713A (en) | 1982-11-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4202914A (en) | Method of depositing thin films of small dimensions utilizing silicon nitride lift-off mask | |
JPH0161250B2 (enrdf_load_stackoverflow) | ||
JPH1154460A (ja) | 電導性構造を製造する方法 | |
JPS62149138A (ja) | 半導体装置の製造方法 | |
JP2778127B2 (ja) | 半導体装置の製造方法 | |
JP2887878B2 (ja) | レジストパターンの保護膜の形成方法 | |
JPH066160A (ja) | 弾性表面波素子の製造方法 | |
JPH0864931A (ja) | 電子部品の微細電極形成方法 | |
JPH0789535B2 (ja) | 粒子ビ−ム露光用位置合せマ−ク | |
JP2002141762A (ja) | 弾性表面波フィルタの製造方法 | |
JPH07176501A (ja) | 半導体装置の製造方法 | |
JPS60254733A (ja) | パタ−ン形成法 | |
JPS63292630A (ja) | 半導体素子の製造方法 | |
JPH05251425A (ja) | Au膜エッチング方法 | |
JPH04155816A (ja) | 半導体装置の製造方法 | |
JPH10256229A (ja) | 半導体装置の製造方法 | |
KR100408030B1 (ko) | 표시소자의 전극패턴 형성방법 | |
JPS6116527A (ja) | 金属電極の製造方法 | |
JPH08339971A (ja) | 電子部品の製造方法 | |
JPS5892224A (ja) | パタ−ン形成方法 | |
JPH0821574B2 (ja) | パタ−ン形成方法 | |
JPH06237136A (ja) | 電子部品素子の製造方法 | |
JPS60175425A (ja) | 選択エツチング方法 | |
JPH05335339A (ja) | T字型ゲート電極の形成方法 | |
JPH02214126A (ja) | 半導体装置の製造方法 |