JPH0136255B2 - - Google Patents

Info

Publication number
JPH0136255B2
JPH0136255B2 JP56193491A JP19349181A JPH0136255B2 JP H0136255 B2 JPH0136255 B2 JP H0136255B2 JP 56193491 A JP56193491 A JP 56193491A JP 19349181 A JP19349181 A JP 19349181A JP H0136255 B2 JPH0136255 B2 JP H0136255B2
Authority
JP
Japan
Prior art keywords
substrate
container
biasing
contact
door
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56193491A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5895812A (ja
Inventor
Nobutoshi Abe
Yukio Kakizaki
Jiro Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP56193491A priority Critical patent/JPS5895812A/ja
Priority to US06/445,030 priority patent/US4422547A/en
Publication of JPS5895812A publication Critical patent/JPS5895812A/ja
Publication of JPH0136255B2 publication Critical patent/JPH0136255B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67353—Closed carriers specially adapted for a single substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67369—Closed carriers characterised by shock absorbing elements, e.g. retainers or cushions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67386—Closed carriers characterised by the construction of the closed carrier

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Library & Information Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP56193491A 1981-12-01 1981-12-01 基板の収納容器及び収納容器の装着装置 Granted JPS5895812A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56193491A JPS5895812A (ja) 1981-12-01 1981-12-01 基板の収納容器及び収納容器の装着装置
US06/445,030 US4422547A (en) 1981-12-01 1982-11-29 Container for holding substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56193491A JPS5895812A (ja) 1981-12-01 1981-12-01 基板の収納容器及び収納容器の装着装置

Publications (2)

Publication Number Publication Date
JPS5895812A JPS5895812A (ja) 1983-06-07
JPH0136255B2 true JPH0136255B2 (enExample) 1989-07-31

Family

ID=16308917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56193491A Granted JPS5895812A (ja) 1981-12-01 1981-12-01 基板の収納容器及び収納容器の装着装置

Country Status (2)

Country Link
US (1) US4422547A (enExample)
JP (1) JPS5895812A (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0219421Y2 (enExample) * 1984-12-30 1990-05-29
JPH0620091B2 (ja) * 1985-01-31 1994-03-16 株式会社ニコン 基板の搬送装置
JPH0237752Y2 (enExample) * 1985-05-21 1990-10-12
JPS61278159A (ja) * 1985-06-03 1986-12-09 Yamaichi Electric Mfg Co Ltd Ｉｃパツケ−ジ用キヤリア
US4842136A (en) * 1987-02-13 1989-06-27 Canon Kabushiki Kaisha Dust-proof container having improved construction for holding a reticle therein
JP3089590B2 (ja) * 1991-07-12 2000-09-18 キヤノン株式会社 板状物収納容器およびその蓋開口装置
EP0582016B1 (en) * 1992-08-04 1997-04-23 International Business Machines Corporation Pressurized sealable transportable containers for storing a semiconductor wafer in a protective gaseous environment
JP3200776B2 (ja) * 1992-08-06 2001-08-20 大日本印刷株式会社 基板保持用ケース
FR2697000B1 (fr) * 1992-10-16 1994-11-25 Commissariat Energie Atomique Boîte plate de confinement d'un objet plat sous atmosphère spéciale.
US5429240A (en) * 1992-12-30 1995-07-04 Minnesota Mining And Manufacturing Company Light-tight container
US5320225A (en) * 1993-04-23 1994-06-14 Hrc Products Apparatus and method for securely carrying a substrate
JPH0758192A (ja) * 1993-08-12 1995-03-03 Nikon Corp 基板収納ケース
US5453383A (en) * 1994-06-14 1995-09-26 General Mills, Inc. Method of applying sugar coating by using steam assisted discharge nozzle
US5727685A (en) * 1995-10-19 1998-03-17 Svg Lithography Systems, Inc. Reticle container with corner holding
JPH09304918A (ja) * 1996-05-17 1997-11-28 Nikon Corp ペリクル貼付け装置及びペリクル貼付け方法
DE19703059A1 (de) * 1997-01-28 1998-09-17 Siemens Ag Vorrichtung und Verfahren zur Halterung und zum Schutz von Halbleiter-Wafern
US7253443B2 (en) * 2002-07-25 2007-08-07 Advantest Corporation Electronic device with integrally formed light emitting device and supporting member
TWI224719B (en) * 2003-05-28 2004-12-01 Gudeng Prec Ind Co Ltd Reinforced structure device of mask frame
JP2005123292A (ja) * 2003-10-15 2005-05-12 Canon Inc 収納装置、当該収納装置を用いた露光方法
US7720558B2 (en) * 2004-09-04 2010-05-18 Applied Materials, Inc. Methods and apparatus for mapping carrier contents
MY154896A (en) * 2005-09-27 2015-08-14 Entegris Inc Reticle pod
TWI394693B (zh) 2006-02-03 2013-05-01 Entegris Inc 吸震式基材容器
US7581372B2 (en) * 2006-08-17 2009-09-01 Microtome Precision, Inc. High cleanliness article transport system
WO2008151095A2 (en) * 2007-05-30 2008-12-11 Blueshift Technologies, Inc. Vacuum substrate storage
US8376178B2 (en) * 2008-04-16 2013-02-19 Leonard Steinberg Hinged overflow pan
US10825714B2 (en) * 2016-04-02 2020-11-03 Intel Corporation Stretching retention plate for electronic assemblies
CN108107672B (zh) * 2016-11-25 2021-03-02 上海微电子装备（集团）股份有限公司 一种掩模版版盒
CN206720206U (zh) * 2017-05-11 2017-12-08 京东方科技集团股份有限公司 掩膜版卡匣搬运车
CN109292280B (zh) * 2018-09-11 2021-01-26 京东方科技集团股份有限公司 用于装载薄膜的盒和装载薄膜的方法
JP7127731B2 (ja) * 2019-02-22 2022-08-30 村田機械株式会社 蓋開閉装置
US11987445B2 (en) * 2019-02-22 2024-05-21 Murata Machinery, Ltd. Lid opening-and-closing device
JP7350907B2 (ja) * 2022-01-24 2023-09-26 株式会社Ｓｃｒｅｅｎホールディングス 処理チャンバおよび基板処理装置
TWI867892B (zh) * 2023-12-12 2024-12-21 友達光電股份有限公司 物料容納盒及自動化補料系統

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2275373A (en) * 1940-01-31 1942-03-03 Lois B Crown Document case
US3353656A (en) * 1965-03-12 1967-11-21 Better Equipment For Electron Holder for electron microscopy grids
US3383507A (en) * 1965-07-12 1968-05-14 Polaroid Corp X-ray film cassette having means for permitting slidable movement of the film withrespect ot the cassette
US3615006A (en) * 1969-06-26 1971-10-26 Ibm Storage container

Also Published As

Publication number Publication date
JPS5895812A (ja) 1983-06-07
US4422547A (en) 1983-12-27

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