JPH0133550B2 - - Google Patents

Info

Publication number
JPH0133550B2
JPH0133550B2 JP18244481A JP18244481A JPH0133550B2 JP H0133550 B2 JPH0133550 B2 JP H0133550B2 JP 18244481 A JP18244481 A JP 18244481A JP 18244481 A JP18244481 A JP 18244481A JP H0133550 B2 JPH0133550 B2 JP H0133550B2
Authority
JP
Japan
Prior art keywords
acid
fluorine
group
salt
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18244481A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5884974A (ja
Inventor
Iwao Hisamoto
Tomoaki Maeda
Satoru Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Kogyo Co Ltd filed Critical Daikin Kogyo Co Ltd
Priority to JP56182444A priority Critical patent/JPS5884974A/ja
Publication of JPS5884974A publication Critical patent/JPS5884974A/ja
Publication of JPH0133550B2 publication Critical patent/JPH0133550B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
JP56182444A 1981-11-13 1981-11-13 エツチング剤組成物 Granted JPS5884974A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56182444A JPS5884974A (ja) 1981-11-13 1981-11-13 エツチング剤組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56182444A JPS5884974A (ja) 1981-11-13 1981-11-13 エツチング剤組成物

Publications (2)

Publication Number Publication Date
JPS5884974A JPS5884974A (ja) 1983-05-21
JPH0133550B2 true JPH0133550B2 (enrdf_load_stackoverflow) 1989-07-13

Family

ID=16118369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56182444A Granted JPS5884974A (ja) 1981-11-13 1981-11-13 エツチング剤組成物

Country Status (1)

Country Link
JP (1) JPS5884974A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6039176A (ja) * 1983-08-10 1985-02-28 Daikin Ind Ltd エッチング剤組成物
US4517106A (en) * 1984-04-26 1985-05-14 Allied Corporation Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions
JPS61207586A (ja) * 1985-03-12 1986-09-13 Morita Kagaku Kogyo Kk 二酸化シリコン膜のエツチング液

Also Published As

Publication number Publication date
JPS5884974A (ja) 1983-05-21

Similar Documents

Publication Publication Date Title
KR900000739B1 (ko) 부식제 조성물
KR960013146B1 (ko) 마이크로 프로세싱용 표면처리 조성물
JP4815406B2 (ja) シリコン酸化膜選択性湿式エッチング溶液及びエッチング方法
TWI600746B (zh) 選擇性移除鈦氮化物硬遮罩及蝕刻殘留物的移除
US20050197273A1 (en) Fluorinated sulfonamide surfactants for aqueous cleaning solutions
EP0159579A2 (en) Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions
JPH0694596B2 (ja) Ｎｈ４ｆ／ｈｆ系の二酸化ケイ素エッチング液およびその製法
CN111793531A (zh) 用于去除蚀刻残余物的清洗液
EP4200895A1 (en) Composition, its use and a process for selectively etching silicon-germanium material
JPH0613364A (ja) シリコンウエハーおよび半導体素子洗浄液
JPH0133550B2 (enrdf_load_stackoverflow)
JPS6332867B2 (enrdf_load_stackoverflow)
JPH02240285A (ja) 低表面張力硫酸組成物
DE69833692T2 (de) Ätzlösung für das selektive ätzen von siliziumoxid mit fluorid-salz, komplexmittel und glykol-lösungsmittel
JP2808799B2 (ja) 窒化シリコン膜のエッチング方法
JPH0433833B2 (enrdf_load_stackoverflow)
JP2569574B2 (ja) 半導体処理剤
JP2001040389A (ja) ウエハ洗浄液
EP0278628A2 (en) Etching solutions containing ammonium fluoride
JP3353359B2 (ja) 低表面張力硫酸組成物
JP2915167B2 (ja) ホトレジスト用現像液
JPS62109985A (ja) エツチング用組成物
JPH11238725A (ja) エッチング組成物
JP2000109987A (ja) 新規な組成物
JPH0570798A (ja) 低表面張力硫酸組成物