JP7540484B2 - 着色剤組成物、感光性樹脂組成物、感光材、カラーフィルタおよび液晶表示装置 - Google Patents
着色剤組成物、感光性樹脂組成物、感光材、カラーフィルタおよび液晶表示装置 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
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- Crystallography & Structural Chemistry (AREA)
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- Architecture (AREA)
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- Chemical Kinetics & Catalysis (AREA)
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- Spectroscopy & Molecular Physics (AREA)
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- Materials For Photolithography (AREA)
Description
表1において、特許JP2016-170282の合成例2の化合物1-32と同様に合成して化合物Aを得、化合物Ayと同様に合成して化合物Bを得た。
化合物組成物の総重量100重量部を基準として、化合物Aを0.4重量部、バインダー樹脂Aを79.95重量部、レベリング剤F-554を0.68重量部、およびプロピレングリコールメチルエーテルアセテート(Propylene glycol methyl ether acetate)を18.97重量部混合して、化合物組成物1を製造した。
前記化合物組成物1の製造において、化合物Aの代わりに下記表1の化合物を用いたことを除けば、化合物組成物1の製造と同様の方法で化合物組成物2~9を製造した。
製造された化合物組成物1~9をそれぞれガラス(5cm×5cm)上にスピンコーティングし、100℃で100秒間前熱処理(pre bake)して基板を製造した。
λ**@T=60%は、透過度60%における右側斜面の波長(透過度60%波長のうちの長い値)を意味し、
T@λ=470nmは、波長470nmにおける透過度を意味し、
T@λ=620nmは、波長620nmにおける透過度を意味する。
着色剤組成物の総重量100重量部を基準として、化合物組成物1を33重量部、化合物組成物3を67重量部混合して、実施例1の着色剤組成物を製造した。
前記実施例1において、化合物組成物1および3の代わりに下記表2の化合物組成物を用いたことを除けば、実施例1と同様の方法で実施例2、3および比較例1~5の着色剤組成物を製造した。
製造された着色剤組成物をガラス(5cm×5cm)上にスピンコーティングし、100℃で100秒間前熱処理(pre bake)した後、230℃で20分間後熱処理(post bake)して基板を製造した。
前記後熱処理(post bake1回)された基板を分光器(MCPD、大塚社)を用いて380nm~780nmの波長範囲における吸収スペクトルを測定し、下記表3に記載した。
Claims (11)
- 第1色材および第2色材を含む着色剤組成物であって、
前記第1色材および前記第2色材は、それぞれ波長516nm以上574nm以下における透過度が60%以下であり、
前記第1色材は、波長480nm以下および610nm以上における透過度が85%以上であり、
前記第2色材は、波長470nm以下および580nm以上における透過度が85%以上であり、
全体100重量部に対して第1色材又は第2色材を0.4重量%を含む単色組成物を、ガラス(5cm×5cm)上にスピンコーティングし、100℃で100秒間前熱処理(pre bake)して基板を製造し、分光器を用いて380nm~780nmの波長範囲における吸収スペクトルを測定することで、前記第1色材および前記第2色材の透過度は測定される、
着色剤組成物。 - 前記第1色材および前記第2色材は、顔料または染料である、請求項1に記載の着色剤組成物。
- 前記第1色材は、最大吸収波長が550nm~580nmの範囲内にある、請求項1または2に記載の着色剤組成物。
- 前記第2色材は、最大吸収波長が530nm~560nmの範囲内にある、請求項1から3のいずれか一項に記載の着色剤組成物。
- 前記第1色材および前記第2色材は、キサンテン系色材である、請求項1から4のいずれか一項に記載の着色剤組成物。
- 前記第1色材:前記第2色材の重量比は、1:9~9:1である、請求項1から5のいずれか一項に記載の着色剤組成物。
- 請求項1~6のいずれか1項に記載の着色剤組成物を含む感光性樹脂組成物。
- 前記感光性樹脂組成物は、バインダー樹脂;レベリング剤;接着助剤;開始剤;および溶媒のうちの1種以上をさらに含む、請求項7に記載の感光性樹脂組成物。
- 請求項7に記載の感光性樹脂組成物を用いて形成された感光材。
- 請求項9に記載の感光材を用いて製造されたカラーフィルタ。
- 請求項10に記載のカラーフィルタを含む液晶表示装置。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20190158334 | 2019-12-02 | ||
| KR10-2019-0158334 | 2019-12-02 | ||
| PCT/KR2020/017447 WO2021112552A1 (ko) | 2019-12-02 | 2020-12-02 | 착색제 조성물, 감광성 수지 조성물, 감광재, 컬러필터 및 액정 표시 장치 |
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| Publication Number | Publication Date |
|---|---|
| JP2022551713A JP2022551713A (ja) | 2022-12-13 |
| JP7540484B2 true JP7540484B2 (ja) | 2024-08-27 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2022521750A Active JP7540484B2 (ja) | 2019-12-02 | 2020-12-02 | 着色剤組成物、感光性樹脂組成物、感光材、カラーフィルタおよび液晶表示装置 |
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| Country | Link |
|---|---|
| US (1) | US20220413381A1 (ja) |
| JP (1) | JP7540484B2 (ja) |
| KR (1) | KR102859883B1 (ja) |
| CN (1) | CN114556213A (ja) |
| TW (1) | TWI851855B (ja) |
| WO (1) | WO2021112552A1 (ja) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003344998A (ja) | 2002-05-22 | 2003-12-03 | Fuji Photo Film Co Ltd | マゼンタ用感光性着色組成物、カラーフィルターの製造方法、及びカラーフィルター |
| JP2012230365A (ja) | 2011-04-15 | 2012-11-22 | Sumitomo Chemical Co Ltd | 着色感光性樹脂組成物 |
| JP2014205821A (ja) | 2013-03-21 | 2014-10-30 | キヤノン株式会社 | 化合物、インク、インクカートリッジ、及びインクジェット記録方法 |
| JP2016053153A (ja) | 2014-07-29 | 2016-04-14 | 住友化学株式会社 | 着色硬化性樹脂組成物 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010009058A (ko) | 1999-07-07 | 2001-02-05 | 성재갑 | 감광성 수지 조성물 |
| JP5251329B2 (ja) * | 2008-07-22 | 2013-07-31 | 東洋インキScホールディングス株式会社 | カラーフィルタ用青色着色組成物、カラーフィルタおよびカラー表示装置 |
| WO2011158794A1 (ja) * | 2010-06-15 | 2011-12-22 | 日本化薬株式会社 | 着色樹脂組成物、着色硬化膜、カラーフィルター、表示装置及び固体撮像素子 |
| KR101361679B1 (ko) * | 2012-03-30 | 2014-02-12 | (주)경인양행 | 크산텐계 자색 염료 화합물, 이를 포함하는 컬러필터용 착색 수지 조성물 및 이를 이용한 컬러필터 |
| JP2014115381A (ja) * | 2012-12-07 | 2014-06-26 | Nippon Kayaku Co Ltd | 着色樹脂組成物 |
| JP5772919B2 (ja) * | 2013-10-23 | 2015-09-02 | 大日本印刷株式会社 | カラーフィルタ用色材分散液、色材、カラーフィルタ、液晶表示装置、及び、有機発光表示装置 |
| KR101525542B1 (ko) * | 2013-11-14 | 2015-06-03 | (주)경인양행 | 크산텐 염료 화합물 및 이의 제조방법 |
| JP6536569B2 (ja) * | 2014-03-26 | 2019-07-03 | 住友化学株式会社 | 液晶表示装置 |
| JP6166683B2 (ja) * | 2014-03-28 | 2017-07-19 | 富士フイルム株式会社 | 着色硬化性組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
| CN105589297B (zh) * | 2014-11-11 | 2021-02-19 | 住友化学株式会社 | 着色固化性树脂组合物 |
| JP2017111226A (ja) | 2015-12-15 | 2017-06-22 | 住友化学株式会社 | 着色硬化性樹脂組成物、カラーフィルタ及びそれを含む液晶表示装置 |
-
2020
- 2020-12-02 TW TW109142445A patent/TWI851855B/zh active
- 2020-12-02 CN CN202080071744.6A patent/CN114556213A/zh active Pending
- 2020-12-02 WO PCT/KR2020/017447 patent/WO2021112552A1/ko not_active Ceased
- 2020-12-02 JP JP2022521750A patent/JP7540484B2/ja active Active
- 2020-12-02 KR KR1020200166541A patent/KR102859883B1/ko active Active
- 2020-12-02 US US17/775,130 patent/US20220413381A1/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003344998A (ja) | 2002-05-22 | 2003-12-03 | Fuji Photo Film Co Ltd | マゼンタ用感光性着色組成物、カラーフィルターの製造方法、及びカラーフィルター |
| JP2012230365A (ja) | 2011-04-15 | 2012-11-22 | Sumitomo Chemical Co Ltd | 着色感光性樹脂組成物 |
| JP2014205821A (ja) | 2013-03-21 | 2014-10-30 | キヤノン株式会社 | 化合物、インク、インクカートリッジ、及びインクジェット記録方法 |
| JP2016053153A (ja) | 2014-07-29 | 2016-04-14 | 住友化学株式会社 | 着色硬化性樹脂組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20220413381A1 (en) | 2022-12-29 |
| KR102859883B1 (ko) | 2025-09-15 |
| TW202134354A (zh) | 2021-09-16 |
| JP2022551713A (ja) | 2022-12-13 |
| KR20210069007A (ko) | 2021-06-10 |
| WO2021112552A1 (ko) | 2021-06-10 |
| TWI851855B (zh) | 2024-08-11 |
| CN114556213A (zh) | 2022-05-27 |
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