JP7416254B2 - 蛍光x線分析装置 - Google Patents

蛍光x線分析装置 Download PDF

Info

Publication number
JP7416254B2
JP7416254B2 JP2022536010A JP2022536010A JP7416254B2 JP 7416254 B2 JP7416254 B2 JP 7416254B2 JP 2022536010 A JP2022536010 A JP 2022536010A JP 2022536010 A JP2022536010 A JP 2022536010A JP 7416254 B2 JP7416254 B2 JP 7416254B2
Authority
JP
Japan
Prior art keywords
fluorescent
sample
layer
ray
molten aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022536010A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2022013934A1 (https=
JPWO2022013934A5 (https=
Inventor
祐司 森久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Publication of JPWO2022013934A1 publication Critical patent/JPWO2022013934A1/ja
Publication of JPWO2022013934A5 publication Critical patent/JPWO2022013934A5/ja
Application granted granted Critical
Publication of JP7416254B2 publication Critical patent/JP7416254B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/30Accessories, mechanical or electrical features

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2022536010A 2020-07-14 2020-07-14 蛍光x線分析装置 Active JP7416254B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/027312 WO2022013934A1 (ja) 2020-07-14 2020-07-14 蛍光x線分析装置

Publications (3)

Publication Number Publication Date
JPWO2022013934A1 JPWO2022013934A1 (https=) 2022-01-20
JPWO2022013934A5 JPWO2022013934A5 (https=) 2023-03-24
JP7416254B2 true JP7416254B2 (ja) 2024-01-17

Family

ID=79555359

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022536010A Active JP7416254B2 (ja) 2020-07-14 2020-07-14 蛍光x線分析装置

Country Status (6)

Country Link
US (1) US12270773B2 (https=)
EP (1) EP4184153A4 (https=)
JP (1) JP7416254B2 (https=)
CN (1) CN115867793B (https=)
TW (1) TWI821667B (https=)
WO (1) WO2022013934A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004043882A (ja) 2002-07-11 2004-02-12 Union Steel Manufacturing Co Ltd アルミニウム合金メッキ鋼板のメッキ方法
JP2011022163A (ja) 2010-10-29 2011-02-03 Shimadzu Corp X線分析装置
JP2016109502A (ja) 2014-12-04 2016-06-20 株式会社日立ハイテクサイエンス 蛍光x線分析装置
JP2016114394A (ja) 2014-12-12 2016-06-23 日鐵住金建材株式会社 放射能汚染物質隔離容器

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2336652A1 (de) * 1973-07-18 1975-01-30 Siemens Ag Schichtsystem zur absorption von roentgenstrahlen
US4150179A (en) * 1977-12-19 1979-04-17 University College Cardiff Hot dip aluminizing of steel strip
JPH06330346A (ja) * 1993-05-24 1994-11-29 Nippon Steel Corp アルミメッキ鋼板
JP3166638B2 (ja) * 1996-11-29 2001-05-14 株式会社島津製作所 蛍光x線分析装置
US6266390B1 (en) 1998-09-21 2001-07-24 Spectramet, Llc High speed materials sorting using x-ray fluorescence
JP2004197151A (ja) 2002-12-18 2004-07-15 Lucite Japan Kk 耐食性鉄材の製造方法
JP4166099B2 (ja) * 2003-02-14 2008-10-15 Tdk株式会社 試料容器
JP4854005B2 (ja) * 2006-02-24 2012-01-11 エスアイアイ・ナノテクノロジー株式会社 蛍光x線分析装置
JP2013108726A (ja) * 2011-11-24 2013-06-06 Mitsubishi Electric Corp 検知装置、及び、検知方法
US10175184B2 (en) * 2015-06-22 2019-01-08 Moxtek, Inc. XRF analyzer for light element detection
FR3052259B1 (fr) * 2016-06-02 2023-08-25 Avenisense Capteur, procede de calibration d'un capteur et methode automatisee de suivi en ligne de l'evolution d'un corps liquide
JP6642372B2 (ja) * 2016-10-14 2020-02-05 株式会社島津製作所 X線分析装置
US10914694B2 (en) * 2017-08-23 2021-02-09 Government Of The United States Of America, As Represented By The Secretary Of Commerce X-ray spectrometer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004043882A (ja) 2002-07-11 2004-02-12 Union Steel Manufacturing Co Ltd アルミニウム合金メッキ鋼板のメッキ方法
JP2011022163A (ja) 2010-10-29 2011-02-03 Shimadzu Corp X線分析装置
JP2016109502A (ja) 2014-12-04 2016-06-20 株式会社日立ハイテクサイエンス 蛍光x線分析装置
JP2016114394A (ja) 2014-12-12 2016-06-23 日鐵住金建材株式会社 放射能汚染物質隔離容器

Also Published As

Publication number Publication date
WO2022013934A1 (ja) 2022-01-20
EP4184153A4 (en) 2024-04-17
CN115867793B (zh) 2025-08-05
US12270773B2 (en) 2025-04-08
JPWO2022013934A1 (https=) 2022-01-20
TW202202835A (zh) 2022-01-16
TWI821667B (zh) 2023-11-11
US20230251214A1 (en) 2023-08-10
EP4184153A1 (en) 2023-05-24
CN115867793A (zh) 2023-03-28

Similar Documents

Publication Publication Date Title
US5226067A (en) Coating for preventing corrosion to beryllium x-ray windows and method of preparing
JP6962831B2 (ja) イオン化方法及び試料支持体
US20130279654A1 (en) Apparatus for protecting a radiation window
Wolstenholme Auger electron spectroscopy: practical application to materials analysis and characterization of surfaces, interfaces, and thin films
US8437451B2 (en) X-ray shutter arrangement
Steinberger et al. Oxygen accumulation on metal surfaces investigated by XPS, AES and LEIS, an issue for sputter depth profiling under UHV conditions
Abe et al. X‐ray fluorescence analysis of trace metals in environmental water using preconcentration with an iminodiacetate extraction disk
JP7416254B2 (ja) 蛍光x線分析装置
JP5783318B1 (ja) 微量炭素定量分析装置および微量炭素定量分析方法
JP2008058014A (ja) X線分析装置
JP5292323B2 (ja) 微小部x線計測装置
JP2014211325A (ja) 水素分布観察装置及び水素分布観察方法
Russ et al. Routine use of a second‐generation windowless detector for energy‐dispersive ultra‐light element X‐ray analysis
Williams et al. Principles of X-ray energy-dispersive spectrometry in the analytical electron microscope
Procop et al. Improvements of the low‐energy performance of a micro‐focus x‐ray source for XRF analysis with the SEM
Tong et al. Semi-quantitative analysis of geological samples using laser plasma time-of-flight mass spectrometry
Datta et al. Simultaneous quantification of Zr, Cr and Cu in copper alloy matrix using charged particle activation analysis
KR950010390B1 (ko) 전반사 형광 x선 분석 장치
JP2004347566A (ja) Aes分析方法及び分析装置
Van Craen et al. SIMS study of a 55% Al Zn alloy coating for corrosion protection of steel wire products
Perlea et al. Reassessment of standardless XRF and PIXE analysis of some dental materials used in endodontics and orthodontics
JPS59149644A (ja) 表面分析装置
Trigg Review–Characterisation and analysis of surface engineered thin films
Im et al. Role of oxygen in the angular distribution of sputtered constituents from Fe/Cr alloy studied by laser post-ionization SNMS
JP2008058076A (ja) 蛍光x線分析装置および蛍光x線分析方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230110

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230110

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230816

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20231205

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20231218

R151 Written notification of patent or utility model registration

Ref document number: 7416254

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151