JP7404208B2 - 半導体装置 - Google Patents

半導体装置 Download PDF

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Publication number
JP7404208B2
JP7404208B2 JP2020159922A JP2020159922A JP7404208B2 JP 7404208 B2 JP7404208 B2 JP 7404208B2 JP 2020159922 A JP2020159922 A JP 2020159922A JP 2020159922 A JP2020159922 A JP 2020159922A JP 7404208 B2 JP7404208 B2 JP 7404208B2
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Japan
Prior art keywords
electrode
bonding sheet
conductive bonding
sheet
semiconductor chip
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JP2020159922A
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JP2022053224A (ja
Inventor
達也 小林
史義 川城
悠志 富田
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Toshiba Corp
Toshiba Electronic Devices and Storage Corp
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Toshiba Corp
Toshiba Electronic Devices and Storage Corp
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Priority to JP2020159922A priority Critical patent/JP7404208B2/ja
Priority to CN202110835836.3A priority patent/CN114256168A/zh
Priority to US17/465,703 priority patent/US11923270B2/en
Publication of JP2022053224A publication Critical patent/JP2022053224A/ja
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Publication of JP7404208B2 publication Critical patent/JP7404208B2/ja
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Description

本発明の実施形態は、半導体装置に関する。
半導体モジュールの大電流化に伴い、半導体チップ同士を接続する配線の許容電流量の増加が求められている。
特許第６４４５５８４号
本発明の一実施形態は、信頼性の高い半導体装置を提供するものである。
本実施形態によれば、第１面に第１電極を有する半導体チップと、金属板と、半導体チップの第１面と金属板の間に位置し、第１電極と金属板を接合する第１導電性接合シートと、を有し、第１導電性接合シートは、Ａｇ粒子を含み、半導体チップから金属板方向に第１電極の外周辺と第１導電性接合シートの外周辺を重ねた際の距離の最大値は０．１ｍｍ以下である実施形態の半導体装置が提供される。
実施形態の半導体装置の断面図。 実施形態の導電性接合シートによる接続の説明図。 実施形態の導電性接合シートによる接続の説明図。 実施形態の半導体装置の製造方法のフローチャート。 実施形態の半導体装置の製造方法の工程図。 実施形態の半導体装置の製造方法の工程図。 実施形態の半導体装置の製造方法の工程図。 実施形態の半導体装置の製造方法の工程図。 実施形態の半導体装置の製造方法の工程図。 実施形態の半導体装置の製造方法の工程図。 実施形態の半導体装置の断面図。 実施形態の半導体装置の断面図。 実施形態の半導体装置の断面図。
以下、図面を参照して本開示の一実施の形態について説明する。なお、本件明細書に添付する図面においては、図示と理解のしやすさの便宜上、適宜縮尺および縦横の寸法比等を、実物のそれらから変更し誇張してある。
以下、図面を用いて実施形態を説明する。なお、図面中、同一又は類似の箇所には、同一又は類似の符号を付している。
本明細書中、同一又は類似する部材については、同一の符号を付し、重複する説明を省略する場合がある。
本明細書中、部品等の位置関係を示すために、図面の上方向を「上」、図面の下方向を「下」と記述する。本明細書中、「上」、「下」の概念は、必ずしも重力の向きとの関係を示す用語ではない。
さらに、本明細書において用いる、形状や幾何学的条件並びにそれらの程度を特定する、例えば、「平行」、「直交」、「同一」等の用語や長さや角度の値等については、厳密な意味に縛られることなく、同様の機能を期待し得る程度の範囲を含めて解釈することとする。
（第１実施形態）
第１実施形態は、半導体装置に関する。第１実施形態は、より具体的には、パワー半導体モジュールに関する。図１に実施形態の半導体装置１００の断面図を示す。図１の半導体装置１００の断面図は、半導体装置１００の要部を表している。
図１の半導体装置１００は、基板１０、半導体チップ２０、第１導電性接合シート３１、第２導電性接合シート３２、第１金属層４１及び配線５１、５２を有する。図１には、２つの半導体チップ２０が基板１０上に設けられている。
基板１０は、絶縁性の支持体１１及び金属膜１２を有する。基板１０は例えばプリント基板である。支持体１１は、例えば、樹脂、ＳｉＮ、ＡｌＮやＡｌ２Ｏ３などのセラミックである。金属膜１２は、基板１０の配線層である。支持体１１の金属膜１２側とは反対側にも金属膜が設けられていてもよい。金属膜１２は、Ａｕ、Ａｇ、Ｃｕ、Ｎｉ、Ｐｄ及びＰｔからなる群より選ばれる１種以上の金属を含む。金属膜１２の膜厚は、典型的には、１００μｍ以上１０００μｍ以下である。金属膜１２は、第２導電性接合シート３２を介して半導体チップ２０の第２電極２３と接合している。
半導体チップ２０は、半導体素子２１と半導体素子２１の表面に設けられた第１電極２２及び第２電極２３を有する。図１では２つの半導体チップ２０が基板１０上に設けられている。半導体装置１００では、図示していないが１０以上の半導体チップ２０を含み、それらの半導体チップ２０が電気的に接続している。半導体素子２１は、より具体的には、ＩＧＢＴ（Insulated Gate Bipolar Transistor）やＭＯＳＦＥＴ、ショットキーバリアダイオード、PINダイオード等のパワー半導体素子である。図１には、半導体チップ２０の一部の電極を示している。第１電極２２Ａ及び第１電極２２Ｂは、半導体素子２１の第１面に設けられている。第２電極２３は半導体素子２１の第１面とは反対側の第２面に設けられている。第１電極２２は、例えば、エミッタ電極又はソース電極またはアノード電極である。第２電極２３は、例えばコレクタ電極又はドレイン電極またはカソード電極である。第１電極２２及び第２電極２３は、Ａｌに加え、Ａｕ、Ａｇ、Ｃｕ、Ｎｉ、Ｐｄ及びＰｔからなる群より選ばれる１種以上の金属をさらに含むことが好ましい。第１電極２２及び第２電極２３の表面は、Ｎｉ／Ａｕ、Ｎｉ／Ａｇ、Ｎｉ／ＣｕやＮｉ／Ｐｄなどでメッキされていることが好ましい。なお、フリップチップ構造をとっても良く、上下の電極構成は逆転してもよい。
第１導電性接合シート３１及び第２導電性接合シート３２は、部材同士を接合する導電性のシートである。第１導電性接合シート３１は、半導体チップ２０の電極２２（２２Ａ、２２Ｂ）と第１金属板４１（４１Ａ、４１Ｂ）の間に設けられている。第２導電性接合シート３２は、半導体チップ２０の電極２３と金属膜１２の間に設けられている。以下、第１導電性接合シート３１及び第２導電性接合シート３２を総称して導電性接合シートと略記することがある。
導電性接合シートは、Ａｇ粒子を含む。導電性接合シートには、微量の樹脂などの有機物が含まれていてもよい。導電性接合シートは、例えば、一次粒子径が１０ｎｍ以上５μｍ以下のＡｇ粒子、一次粒子径が１０ｎｍ以上５μｍ以下のＣｕ粒子及び一次粒子径が１０ｎｍ以上５μｍ以下のＮｉ粒子からなる群から選ばれる１種以上の金属粒子を含む。導電性接合シートは、一次粒子径が１ｎｍ以上５００ｎｍ以下の金属粒子を含むシート状の導電性ダイアタッチ接合材料を加圧して加熱して焼結して得られたものである。導電性シートの厚さは１０μｍ以上２００μｍ以下であることが好ましく、２０μｍ以上５０μｍ以下がより好ましい。導電性接合シートの内部には、外接円直径が１０ｎｍ以上２μｍ以下の空隙を含む場合がある。シート状の導電性ダイアタッチ接合材料は、Ａｇ粒子、低沸点バインダー及び熱分解性のアクリル樹脂やポリカーボネート樹脂などを含む。導電性接合シートは、シート状の導電性ダイアタッチ接合材料に含まれる有機物とその分解物が一部残存している場合がある。
実施形態では、塗布または印刷した導電性ペーストを用いずにシート状の導電性ダイアタッチ接合材料を加圧して加熱して焼結して接合している。導電性ペーストを用いると塗布や印刷の際にズレが生じ、また、加圧する際に半導体チップ２０の側面にはみ出て、さらに半導体チップ２の側面を這い上がることがある。塗布や印刷のズレは、接合面積の低下による伝導性及び信頼性の低下の原因になる。また、ズレによって接合部材間からのはみ出しが大きくなる恐れがある。ズレによるはみ出しが少なければ影響は少ないが、ズレによるはみ出しが多いと、這い上がりによってショートや絶縁耐圧不良が生じたり、はみ出た部分が剥がれてショートが生じたりすることがある導電性接合シートによる接合であれば、加圧による変形がほとんど無いためこのようなはみ出しや這い上がりによるショートの可能性が非常に低い。また、シート状の材料であるため、電極面や半導体チップ２０と接合する部材に転写をすることが可能になり、電極面に対して、位置及び形状が合った導電性接合シートによる部材間の接続ができる。
図２及び図３に導電性接合シートによる接続の説明図を示す。図２及び図３では、第１導電性シート３１について示しているが、第２導電性シート３２についても同様である。図２では、第１電極２２と第１金属板４１の間の第１導電性接合シート３１の位置及び大きさを示している。図３は、第１電極２２と第１金属板４１の間の第１導電性接合シート３１の部分断面図であり、第１導電性接合シート３１の位置及び断面形状を示している。図２の実線で示した矩形は、第１電極３１と第１金属板４１の外周辺を示している。破線で示した矩形は、第１導電性接合シート３１の外周辺を示している。第１導電性接合シート３１は、シート状の導電性ダイアタッチ接合材料を金属板４１又は第１電極２２に転写して加圧下で加熱しているため、電極２２の位置及び形状とのズレが安定して少ない。ペーストを用いた場合、ペーストは粘度が高い為、精度の高い接合面積の調整は困難である。導電性ペーストを焼結した後のはみ出しを防ぐために接合面より小さくなるようにペーストを塗布などするか、確実に全面で接合するように接合面より大きく塗布などするかすることで安定した接合をしている。シート状の導電性ダイアタッチ接合材料を用いると、転写が可能であるため、位置ずれや大きさのズレを少なくすることができる。また、シート状の導電性ダイアタッチ接合材料は加圧しても変形が少ないため、はみ出しが這い上がりになりにくい。図３に示すように、はみ出しの部分が半導体チップ２０の側面に沿うように這い上がりにくい。半導体チップ２０から第１金属板４１方向に半導体チップ２０の第１電極２２の外周辺と第１導電性接合シート３１の外周辺を重ねた際の距離の最大値は０．１ｍｍ以下であることが好ましい。また、半導体チップ２０から第１金属板４１方向に半導体チップ２０の第１電極２２の外周辺と第１導電性接合シート３１の外周辺を重ねた際の距離の平均値は０．１ｍｍ以下であることが好ましい。半導体チップ２０から第１金属板４１方向に半導体チップ２０の第１電極２１の外周辺と第１導電性接合シート３１の外周辺を重ねた際の距離は、第１電極２２の外周辺に沿って１ｍｍ間隔で測定することが好ましい。
また、図３に示すように、第１導電性接合シート３１の断面形状は、台形の形状を有する。第１導電性接合シート３１がはみ出していない場合は、第１導電性接合シート３１の断面形状は、全体的に台形の形状を有する。つまり、第１導電性接合シート３１は、四角錐台（半導体チップ２０が四角形以外の多角形であれば、多角錐台）の形状を有し、第１金属板４１側を底面とし、半導体チップ２０側を上面とする。実施形態における角錐台の形状は、厳密な形状だけではなく、上面と底面の大きさが異なる先細りの形状を含む。焼結後の第１導電性接合シート３１の形状が台形の形状になることで、良好な接合と這い上がり等による短絡の可能性の低減を両立する。角錐台形の第１導電性接合シート３１の上面側が対向する面と底面側が対向する面は、転写の条件によって入れ替わる。角錐台形の第１導電性接合シート３１の上面と底面の面積の差が大きいと非接合面の比率が高くなる。そこで、角錐台形の第１導電性接合シート３１の上面の面積は、角錐台形の第１導電性接合シート３１の底面の面積の９０％以上９９％以下が好ましく、９５％以上９９％以下がより好ましい。上記面積は、断面における、上面の長さと底面の長さから求めてもよい。
第１電極２２の外周辺に対して、第１導電性接合シート３１の外周辺が外側に出ている部分がはみ出しの部分であり、内側に入り込んでいる部分が非接合部分である。第１電極２２の面積に対してはみ出しの部分と非接合部分の比率が低いと、接合部分の伝導性が高く信頼性が高い。そこで、半導体チップ２０から第１金属板４１方向に半導体チップ２０の第１電極２２の外周辺と第１導電性接合シート３１の外周辺を重ねた場合において、第１電極２２の外周辺に対して、第１導電性接合シート３１の外周辺が外側に出ている部分の面積と、第１電極２２の外周辺に対して、第１導電性接合シート３１の外周辺が内側に入り込んでいる部分の面積の和は、第１電極２２の面積の５％以下が好ましく、３％以下がより好ましい。
第２導電性接合シート３２も第１導電性接合シート３１と同様である。そこで、半導体チップ２０から金属膜１２方向に半導体チップ２０の第２電極２３の外周辺と第２導電性接合シート３２の外周辺を重ねた際の距離の最大値は０．１ｍｍ以下であることが好ましい。また、半導体チップ２０から金属膜１２方向に半導体チップ２０の第２電極２３の外周辺と第２導電性接合シート３２の外周辺を重ねた際の距離の平均値は０．１ｍｍ以下であることが好ましい。また、半導体チップ２０から金属膜１２方向に半導体チップ２０の第２電極２３の外周辺と第２導電性接合シート３２の外周辺を重ねた場合において、第２電極２３の外周辺に対して、第２導電性接合シート３２の外周辺が外側に出ている部分の面積と、第２電極２３の外周辺に対して、第２導電性接合シート３２の外周辺が内側に入り込んでいる部分の面積の和は、第１電極２２の面積の５％以下が好ましく、３％以下がより好ましい。
第１金属板４１Ａ、４１Ｂは、第１導電性接合シート３１を介して第１半導体チップ２０の第１電極２２Ａ、２２Ｂと接続している。第１金属板４１Ａと第１金属板４１Ｂ間は配線５２で接続されている。第１金属板４１Ａ、４１Ｂは配線５１を介して基板１０の金属膜１２と電気的に接続している。
第１金属板４１は、例えば、Ｃｕ、Ｍｏ又はＷの板が好ましい。また、これらの板にニッケル金メッキなどを施してもよい。第１金属板４１の厚さは、典型的には、３０μｍ以上１ｍｍ以下である。電流容量や放熱性などを考慮して適宜選択される。
配線５１、５２は、半導体チップ２０間、または、半導体チップ２０と金属膜１２間を電気的に接続する。配線５１には、例えば、ＡｌやＡｌ／Ｃｕなどのアルミクラッド材を用いる。配線５１、５２は、ボンディングワイヤ、リボン、金属柱などの導電体が好ましい。図１では、ボンディングワイヤまたはリボンを想定した配線５１、５２を示している。
図４に第１実施形態の半導体装置１００の製造方法のフローチャートを示す。フローチャートには、半導体装置１００の製造方法における一部の工程を示している。シート状の導電性ダイアタッチ接合材料を加圧焼結して導電性接合シートで接合する方法を２つ挙げる。図４の左側のフローは、半導体チップ２０と第１金属板４１との接合に関する。図４の右側のフローは半導体チップ２０と基板１０の金属膜１２との接合に関する。図４では加圧焼結を行なうフローを示しているが、シート状の導電性ダイアタッチ接合材料の種類によっては加圧をせずに大気圧下で焼結を行なってもよい。
１つめは、第１金属板４１にシート状の導電性ダイアタッチ接合材料を転写する工程（Ｓ０１）と、半導体チップ２０にシート状の導電性ダイアタッチ接合材料を転写した第１金属板４１を貼り合わせる工程（Ｓ０１）と、第１金属板４１と半導体チップ２０間に圧力を印加して焼結する工程（Ｓ１１）とを有する。圧力を印加して焼結することで、シート状の導電性ダイアタッチ接合材料中の金属粒子によって第１金属板４１と半導体チップ２０の第１電極２１間を接合する。
２つめは、半導体チップ２０にシート状の導電性ダイアタッチ接合材料を転写する工程（Ｓ０３）と、金属膜１２にシート状導電性ダイアタッチ接合材料を転写した基板１０の金属膜１２を貼り合わせる工程（Ｓ０４）と、半導体チップ２０と基板１０間に圧力を印加して焼結する工程（Ｓ１１）とを有する。圧力を印加して焼結することで、シート状の導電性ダイアタッチ接合材料中の金属粒子によって基板１０の金属膜１２と半導体チップ２０の第２電極２２間を接合する。
以下、図５から図１０の半導体装置１００の製造方法の工程図を示して半導体装置１００の製造方法について説明する。図５の工程図には、第１金属板４１にシート状の導電性ダイアタッチ接合材料３３を転写する処理を示している。第１金属板４１よりも大きな面積を有するシート状の導電性ダイアタッチ接合材料３３を貼り合わせてから、加熱と圧力により、第１金属板４１の形状に合うようにシート状の導電性ダイアタッチ接合材料３３を転写する。第１金属板４１へのシート状の導電性ダイアタッチ接合材料３３の転写面積を制御するために、シート状の導電性ダイアタッチ接合材料３３の上にマスク材を形成して転写を行ってもよい。後に、半導体チップ２０の第１面の２つの第１電極２２Ａ、２２Ｂに貼り合わせるために、１つの半導体チップ２０に対してシート状の導電性ダイアタッチ接合材料３３Ａ、３３Ｂが第１金属板４１Ａ、４１Ｂに転写された部材を２部用意する。第１金属板４１を貼り付ける半導体チップ２０の第１電極２２が１つである場合は、半導体チップ２０１つあたり上記部材を１部用意する。このとき、必要に応じて、ゲート配線用の開口部が形成されている第１金属板４１を用いる。
図６の工程図には、シート状の導電性ダイアタッチ接合材料３３Ａ、３３Ｂが第１金属板４１Ａ、４１Ｂに転写された部材を半導体チップ２０の第１面の第１電極２２Ａ、２２Ｂに貼り合わせて、仮固定する。
図７の工程図では、図６に示す部材を焼結して、第１金属板４１Ａ、４１Ｂと半導体チップ２０を接合する。焼結によって、シート状の導電性ダイアタッチ接合材料３３Ａ、３３Ｂは、第１導電性接合シート３１Ａ、３１Ｂの金属粒子は焼結が不完全な状態であるが、接合にかかる焼結により金属粒子の凝集が進行して第１金属板４１Ａ、４１Ｂと半導体チップ２０の第１電極２２Ａ、２２Ｂを接合する導電性接合シートに変わる。そして、第１金属板４１Ａ、４１Ｂと半導体チップ２０の第１電極２２Ａ、２２Ｂが第１導電性接合シート３１Ａ、３１Ｂで接合された部材が得られる。第１金属板４１Ａ、４１Ｂと半導体チップ２０を接合する焼結では接合強度を高めるために、適切な加圧を行なうことが好ましい。
図８の工程図では、第１金属板４１Ａ、４１Ｂと半導体チップ２０の第１電極２２Ａ、２２Ｂが第１導電性接合シート３１Ａ、３１Ｂで接合された部材において、半導体チップ２０の第１面とは反対側の第２面に設けられている第２電極２３にシート状の導電性ダイアタッチ接合材料３４を転写する。転写は、第２電極２３の形状に合わせて行なうことが好ましい。図８に示す工程図は、シート状の導電性ダイアタッチ接合材料３４が転写された部材を示している。半導体チップ２０の第２面より大きなシート状の導電性ダイアタッチ接合材料３４を貼り合わせて、加熱と圧力によって転写を行なうことが好ましい。
図９の工程図では、シート状の導電性ダイアタッチ接合材料３４が転写された半導体チップ２０を基板１０の金属膜１２の面に貼り付ける。貼り付け後、シート状の導電性ダイアタッチ接合材料３４を焼結して半導体チップ２０と基板１０の金属膜１２が第２導電性接合シート３２で接合された図１０の工程図に示す部材が得られる。図１０の部材に配線５１、５２を形成して半導体装置１００を得る。
半導体チップ２０の両面を導電性接合シートで接合することで、信頼性が高く電流容量の多い配線を形成することができる。
（第２実施形態）
第２実施形態は半導体装置に関する。図１１に第２実施形態の半導体装置１０１の断面図を示す。図１１に示す半導体装置１０１は、第１金属板４１に替わり、第２金属板４２を用いていることが第１実施形態の半導体装置１００と異なる。第１実施形態と第２実施形態において、共通する内容についてはその説明を省略する。
半導体装置１０１では、２つの半導体チップ２０が１部の第２金属板４２でと接続している。図示していないが、第２金属板４２には、ゲート配線用の開口部が設けられていて、図示しない配線がゲート電極と接続している。
第２実施形態の半導体装置１０１を製造する場合、半導体チップ２０の第１電極２２Ａにシート状の導電性ダイアタッチ接合材料を転写して、第２金属板４２と接合することができる。また、シート状の導電性ダイアタッチ接合材料を第２金属板４２に転写して、半導体チップ２０の第１電極２２Ａと接合してもよい。第２実施形態では、２以上の半導体チップ２０を同時に第２金属板４２に貼り付けて、接合することができる。従って、チップ数が増えても少ない工程数で半導体装置１０１を製造することができる。
（第３実施形態）
第３実施形態は半導体装置に関する。図１２に第３実施形態の半導体装置１０２の断面図を示す。図１２に示す半導体装置１０２は、配線として、金属柱５３を用いて、基板１０の金属面１２と第２金属板４２を接続していることと、第２金属板４２に凸部を設け凸部が第１導電性シート３１を介して半導体チップ２０と接続していることが第２実施形態の半導体装置１０１と異なる。第１実施形態から第２実施形態と第３実施形態において、共通する内容についてはその説明を省略する。
第２金属部４２に凸部を設けることができ、例えば、位置決めがし易くなるという利点がある。また、第１導電性接合シート３１の側面や第２金属部４２の半導体チップ２０と対向する面に絶縁性樹脂６１を設けることができる。絶縁性樹脂６１は半導体チップ２０を第２金属板４２に接合した後に形成することで第１導電性シート３１周りの絶縁性及び耐湿性を強化することができる。
また、第３実施形態においては、第２金属部４２と金属膜１２の間に金属柱５３などの配線を設けて第２金属部４２と金属膜１２間を接続することができる。金属柱５３を用いることで、配線の電流容量を増やすことができる。金属柱５３と第２金属部４２間も導電性接合シートで接合することが好ましい。また、金属柱５３と金属膜１２の間も導電性接合シートで接合することが好ましい。
（第４実施形態）
第４実施形態は半導体装置に関する。図１３に第４実施形態の半導体装置１０３の断面図を示す。図１３に示す半導体装置１０２は、配線を用いずに第２金属板４２を曲げて、基板１０の金属面１２と第２金属板４２を接続していることと、第２金属板４２に凹部を設け、凹部において第１導電性シート３１を介して半導体チップ２０と接続していることが第２実施形態の半導体装置１０１と異なる。第１実施形態から第３実施形態と第４実施形態において、共通する内容についてはその説明を省略する。
第２金属部４２に凹部を設けることができ、例えば、位置決めがし易くなるという利点がある。半導体チップ２０の貼り付けのしやすさ等を考慮すると、凹部の深さは第１導電性シート３１の厚さより深くなることが好ましい。また、図示はしていないが、第１導電性接合シート３１の側面や第２金属部４２の半導体チップ２０と対向する面に絶縁性樹脂を設けることも好ましい。
また、第４実施形態においては、第２金属板４２が配線を介さずに金属膜１２と接続している。第２金属板４２と金属膜１２は、導電性接合シートを用いて接合してもよいし、超音波接合するなどして、直接接合してもよい。超音波接合することで、接合の信頼性が高まり、半導体装置１０３の信頼性が向上する。
本発明のいくつかの実施形態を説明したが、これらの実施形態は、例として提示したものであり、発明の範囲を限定することは意図していない。これら新規な実施形態は、その他の様々な形態で実施されることが可能であり、発明の要旨を逸脱しない範囲で、種々の省略、置き換え、変更を行うことができる。これら実施形態やその変形は、発明の範囲や要旨に含まれるとともに、特許請求の範囲に記載された発明とその均等の範囲に含まれる。
１００、１０１、１０２、１０３…半導体装置、１０…基板、１１…支持体、１２…金属膜、２０…半導体チップ、２１…半導体素子、２２…第１電極、２３…第２電極、３１…第１導電性接合シート、３２…第２導電性接合シート、３３…シート状の導電性ダイアタッチ接合材料、３４…シート状の導電性ダイアタッチ接合材料、４１…第１金属部、４２…第２金属部、５１…配線、５２…配線、５３…金属柱、６１…絶縁性樹脂

Claims (7)

  1. 第１面に第１電極を有する半導体チップと、
    金属板と、
    前記半導体チップの第１面と前記金属板の間に位置し、前記第１電極と前記金属板を接合する第１導電性接合シートと、
    を有し、
    前記第１導電性接合シートは、Ａｇ粒子を含み、
    前記半導体チップから前記金属板方向に前記第１電極の外周辺と前記第１導電性接合シートの外周辺を重ねた際の距離の最大値は０．１ｍｍ以下である半導体装置。
  2. 前記第１導電性接合シートは、一次粒子径が１０ｎｍ以上５μｍ以下のＣｕ粒子及び一次粒子径が１０ｎｍ以上５μｍ以下のＮｉ粒子からなる群から選ばれる１種以上の金属粒子をさらに含み、
    前記Ａｇ粒子の一次粒子径は１０ｎｍ以上５μｍ以下である請求項１に記載の半導体装置。
  3. 前記第１導電性接合シートは角錐台形形状を有し、前記半導体チップ側の面の第１導電性接合シートの面積は、前記金属板側の面の第１導電性接合シートの面積の９０％以上９９％以下である請求項１又は２に記載の半導体装置。
  4. 前記半導体チップから前記金属板方向に前記第１電極の外周辺と前記第１導電性接合シートの外周辺を重ねた際の距離の平均値は０．１ｍｍ以下である請求項１ないし３のいずれか１項に記載の半導体装置。
  5. 前記半導体チップから前記金属板方向に前記の第１電極の外周辺と前記第１導電性接合シートの外周辺を重ねた場合において、前記第１電極の外周辺に対して、前記第１導電性接合シートの外周辺が外側に出ている部分の面積と、前記第１電極の外周辺に対して、前記第１導電性接合シートの外周辺が内側に入り込んでいる部分の面積の和は、前記第１電極の面積の５％以下である請求項１ないし４のいずれか１項に記載の半導体装置。
  6. 金属膜を有する基板と、
    第２導電性接合シートをさらに有し、
    前記半導体チップの第１面とは反対側の第２面に第２電極を有し、
    前記第２電極と前記金属膜はＡｇ粒子を含む前記第２導電性接合シートで接合されている請求項１ないし５のいずれか１項に記載の半導体装置。
  7. 前記半導体装置には前記半導体チップが複数含まれ、
    前記複数の半導体チップが前記金属板と前記第１導電性接合シートを介して接合している請求項１ないし６のいずれか１項に記載の半導体装置。
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