JP7402959B2 - 高密度低バンド幅メモリと低密度高バンド幅メモリを組み合わせたメモリシステム - Google Patents
高密度低バンド幅メモリと低密度高バンド幅メモリを組み合わせたメモリシステム Download PDFInfo
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Description
以下の詳細な説明は、以下に簡単に記述する添付の図面を参照する。
Claims (20)
- 第1のタイプの第1のダイナミックランダムアクセスメモリ(DRAM)を含む1つ以上の第1の集積回路と、
前記1つ以上の第1の集積回路に結合された第2の集積回路と、を備えるメモリであって、
前記第2の集積回路は、第2のタイプの第2のDRAMを含み、前記第2のタイプは、前記第1のタイプより低密度であり、前記第2のタイプのDRAMへのアクセスは、エネルギー消費が前記第1のタイプのDRAMへのアクセスよりも小さく、前記第1のタイプのDRAM内の第1のメモリアレイは、第1のバンクサイズを有する第1の複数のバンクを含み、前記第2のタイプのDRAM内の第2のメモリアレイは、前記第1のバンクサイズより小さい第2のバンクサイズを有する第2の複数のバンクを含む、メモリ。 - 前記第2の集積回路は、前記第1のDRAM及び前記第2のDRAMのために通信を行うように構成された物理層回路をさらに含む、請求項1に記載のメモリ。
- 前記1つ以上の第1の集積回路は、積層された複数の集積回路を備え、前記複数の集積回路は、前記物理層回路に結合されている、請求項2に記載のメモリ。
- 前記複数の集積回路は、前記物理層回路に相互接続する部分を形成するシリコン貫通電極を含む、請求項3に記載のメモリ。
- 前記第2の集積回路及び第3の集積回路が、チップオンウエハパッケージング技術、ウエハオンウエハパッケージング技術、又はチップオンチップパッケージング技術の1つを使用してパッケージングされている、請求項3に記載のメモリ。
- 前記第2のタイプは前記第1のタイプよりも高いバンド幅を有し、前記第2のタイプは前記第1のタイプよりも低いレイテンシを有する、請求項1に記載のメモリ。
- 前記第2のタイプのDRAMは、前記第1のタイプのDRAMよりも多くのバンクを含む、請求項1に記載のメモリ。
- 第1のタイプの第1のダイナミックランダムアクセスメモリ(DRAM)を含む1つ以上の第1の集積回路と、前記1つ以上の第1の集積回路に結合された第2の集積回路と、を備えるメモリであって、
前記第2の集積回路は、第2のタイプの第2のDRAMを含み、前記第2のタイプは、前記第1のタイプより低密度であり、前記第2のタイプのDRAMへのアクセスは、エネルギー消費が前記第1のタイプのDRAMへのアクセスよりも小さく、前記第1のタイプのDRAM内の第1のメモリアレイは、第1のバンクサイズを有する第1の複数のバンクを含み、前記第2のタイプのDRAM内の第2のメモリアレイは、前記第1のバンクサイズより小さい第2のバンクサイズを有する第2の複数のバンクを含む、メモリと、
前記第2の集積回路とともにパッケージングされた第3の集積回路であって、前記第1の集積回路と前記第3の集積回路との間の結合と比較して、前記第3の集積回路と前記第2の集積回路との間の結合の長さ及び容量を減少させ、前記第3の集積回路が、前記第1のタイプ及び前記第2のタイプを含む前記メモリへのアクセスを制御するように構成されたメモリコントローラを含む、第3の集積回路と、を備える、システム。 - 前記第2のDRAMは、前記第2の集積回路内の物理層回路に結合されており、前記物理層回路は、前記第1のDRAMから前記第3の集積回路への通信ラインと、前記第2のDRAMから前記第3の集積回路への通信ラインを含む、請求項8に記載のシステム。
- 前記第1の集積回路は、前記第2の集積回路及び前記第3の集積回路を含む前記パッケージの側面に配置されている、請求項8に記載のシステム。
- 前記第1の集積回路は、複数の第1の集積回路のうちの1つであり、前記複数の第1の集積回路は、前記第2の集積回路及び前記第3の集積回路を含む前記パッケージの複数の側面に配置されている、請求項8に記載のシステム。
- 前記メモリコントローラは、前記第1のタイプの複数のDRAMからのデータを、前記第2のタイプの前記第2のDRAMにキャッシュするように構成されている、請求項8に記載のシステム。
- 前記第1のタイプへの所定のアクセスは、前記第1の集積回路への第1のインタフェースを介した複数のコマンドを含み、
前記第2のタイプへの所定のアクセスは、前記第2の集積回路への第2のインタフェースを介した単一のコマンドを含む、請求項8に記載のシステム。 - 前記第2の集積回路は、前記第1のDRAM及び前記第2のDRAMのために通信を行うように構成された物理層回路をさらに含む、請求項8に記載のシステム。
- 前記第3の集積回路は、第2の物理層回路を備え、
前記物理層回路は、前記第2の物理層回路に結合されている、請求項14に記載のシステム。 - 前記1つ以上の第1の集積回路は、積層された複数の集積回路を備え、前記複数の集積回路は、前記物理層回路に結合されている、請求項15に記載のシステム。
- 前記複数の集積回路は、前記物理層回路に相互接続する部分を形成するシリコン貫通電極を含む、請求項16に記載のシステム。
- 前記第2の集積回路及び第3の集積回路が、チップオンウエハパッケージング技術、ウエハオンウエハパッケージング技術、又はチップオンチップパッケージング技術の1つを使用してパッケージングされている、請求項16に記載のシステム。
- 前記第2のタイプは前記第1のタイプよりも高いバンド幅を有し、前記第2のタイプは前記第1のタイプよりも低いレイテンシを有する、請求項8に記載のシステム。
- 前記第2のタイプのDRAMは、前記第1のタイプのDRAMよりも多くのバンクを含む、請求項8に記載のシステム。
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