JP7392155B2 - 荷電粒子線装置、およびスキャン波形生成方法 - Google Patents

荷電粒子線装置、およびスキャン波形生成方法 Download PDF

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Publication number
JP7392155B2
JP7392155B2 JP2022535998A JP2022535998A JP7392155B2 JP 7392155 B2 JP7392155 B2 JP 7392155B2 JP 2022535998 A JP2022535998 A JP 2022535998A JP 2022535998 A JP2022535998 A JP 2022535998A JP 7392155 B2 JP7392155 B2 JP 7392155B2
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distortion
correction
scan
scan waveform
mode signal
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JP2022535998A
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Japanese (ja)
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JPWO2022013918A1 (https=
JPWO2022013918A5 (https=
Inventor
圭亮 田沼
誠人 神尾
洋憲 板橋
弘樹 神波
勇介 関
巧 上薗
光宏 中村
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Hitachi High Tech Corp
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Hitachi High Tech Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1536—Image distortions due to scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2022535998A 2020-07-13 2020-07-13 荷電粒子線装置、およびスキャン波形生成方法 Active JP7392155B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/027252 WO2022013918A1 (ja) 2020-07-13 2020-07-13 荷電粒子線装置、およびスキャン波形生成方法

Publications (3)

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JPWO2022013918A1 JPWO2022013918A1 (https=) 2022-01-20
JPWO2022013918A5 JPWO2022013918A5 (https=) 2023-03-07
JP7392155B2 true JP7392155B2 (ja) 2023-12-05

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JP2022535998A Active JP7392155B2 (ja) 2020-07-13 2020-07-13 荷電粒子線装置、およびスキャン波形生成方法

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US (1) US12476070B2 (https=)
JP (1) JP7392155B2 (https=)
WO (1) WO2022013918A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080315112A1 (en) 2007-06-25 2008-12-25 Wiesner John C Charged particle beam deflection method with separate stage tracking and stage positional error signals
JP2015133267A (ja) 2014-01-15 2015-07-23 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
JP2018195545A (ja) 2017-05-22 2018-12-06 日本電子株式会社 荷電粒子線装置および走査像の歪み補正方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0756787B2 (ja) * 1988-03-17 1995-06-14 日本電子テクニクス株式会社 走査電子顕微鏡の自動焦点制御装置
JPH02236936A (ja) * 1989-03-08 1990-09-19 Mitsubishi Electric Corp 荷電ビーム装置
US6703623B1 (en) * 2000-09-27 2004-03-09 Leepl Corporation Electron beam proximity exposure apparatus
JP2003151484A (ja) * 2001-11-15 2003-05-23 Jeol Ltd 走査型荷電粒子ビーム装置
JP4801518B2 (ja) 2006-07-07 2011-10-26 株式会社日立ハイテクノロジーズ 荷電粒子線顕微方法および荷電粒子線装置
US9793091B1 (en) * 2016-06-28 2017-10-17 Ngr Inc. Image generation apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080315112A1 (en) 2007-06-25 2008-12-25 Wiesner John C Charged particle beam deflection method with separate stage tracking and stage positional error signals
JP2015133267A (ja) 2014-01-15 2015-07-23 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
JP2018195545A (ja) 2017-05-22 2018-12-06 日本電子株式会社 荷電粒子線装置および走査像の歪み補正方法

Also Published As

Publication number Publication date
US20230260739A1 (en) 2023-08-17
WO2022013918A1 (ja) 2022-01-20
JPWO2022013918A1 (https=) 2022-01-20
US12476070B2 (en) 2025-11-18

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