JPWO2022013918A5 - - Google Patents
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- Publication number
- JPWO2022013918A5 JPWO2022013918A5 JP2022535998A JP2022535998A JPWO2022013918A5 JP WO2022013918 A5 JPWO2022013918 A5 JP WO2022013918A5 JP 2022535998 A JP2022535998 A JP 2022535998A JP 2022535998 A JP2022535998 A JP 2022535998A JP WO2022013918 A5 JPWO2022013918 A5 JP WO2022013918A5
- Authority
- JP
- Japan
- Prior art keywords
- mode
- sample
- charged particle
- particle beam
- beam device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2020/027252 WO2022013918A1 (ja) | 2020-07-13 | 2020-07-13 | 荷電粒子線装置、およびスキャン波形生成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022013918A1 JPWO2022013918A1 (https=) | 2022-01-20 |
| JPWO2022013918A5 true JPWO2022013918A5 (https=) | 2023-03-07 |
| JP7392155B2 JP7392155B2 (ja) | 2023-12-05 |
Family
ID=79555267
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022535998A Active JP7392155B2 (ja) | 2020-07-13 | 2020-07-13 | 荷電粒子線装置、およびスキャン波形生成方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US12476070B2 (https=) |
| JP (1) | JP7392155B2 (https=) |
| WO (1) | WO2022013918A1 (https=) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0756787B2 (ja) * | 1988-03-17 | 1995-06-14 | 日本電子テクニクス株式会社 | 走査電子顕微鏡の自動焦点制御装置 |
| JPH02236936A (ja) * | 1989-03-08 | 1990-09-19 | Mitsubishi Electric Corp | 荷電ビーム装置 |
| US6703623B1 (en) * | 2000-09-27 | 2004-03-09 | Leepl Corporation | Electron beam proximity exposure apparatus |
| JP2003151484A (ja) * | 2001-11-15 | 2003-05-23 | Jeol Ltd | 走査型荷電粒子ビーム装置 |
| JP4801518B2 (ja) | 2006-07-07 | 2011-10-26 | 株式会社日立ハイテクノロジーズ | 荷電粒子線顕微方法および荷電粒子線装置 |
| US8384048B2 (en) * | 2007-06-25 | 2013-02-26 | Multibeam Corporation | Charged particle beam deflection method with separate stage tracking and stage positional error signals |
| JP2015133267A (ja) * | 2014-01-15 | 2015-07-23 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム装置 |
| US9793091B1 (en) * | 2016-06-28 | 2017-10-17 | Ngr Inc. | Image generation apparatus |
| JP6770482B2 (ja) | 2017-05-22 | 2020-10-14 | 日本電子株式会社 | 荷電粒子線装置および走査像の歪み補正方法 |
-
2020
- 2020-07-13 US US18/012,478 patent/US12476070B2/en active Active
- 2020-07-13 WO PCT/JP2020/027252 patent/WO2022013918A1/ja not_active Ceased
- 2020-07-13 JP JP2022535998A patent/JP7392155B2/ja active Active
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