JP7343314B2 - ステージ、物性測定装置および測定方法 - Google Patents

ステージ、物性測定装置および測定方法 Download PDF

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Publication number
JP7343314B2
JP7343314B2 JP2019124424A JP2019124424A JP7343314B2 JP 7343314 B2 JP7343314 B2 JP 7343314B2 JP 2019124424 A JP2019124424 A JP 2019124424A JP 2019124424 A JP2019124424 A JP 2019124424A JP 7343314 B2 JP7343314 B2 JP 7343314B2
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optical film
film
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protrusion
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JP2020016645A (ja
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徹 長谷川
哲史 越野
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/04—Optical benches therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0228—Testing optical properties by measuring refractive power
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/025—Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0278—Detecting defects of the object to be tested, e.g. scratches or dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0285—Testing optical properties by measuring material or chromatic transmission properties
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geometry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Polarising Elements (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2019124424A 2018-07-12 2019-07-03 ステージ、物性測定装置および測定方法 Active JP7343314B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018132392 2018-07-12
JP2018132392 2018-07-12

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JP2020016645A JP2020016645A (ja) 2020-01-30
JP7343314B2 true JP7343314B2 (ja) 2023-09-12

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JP (1) JP7343314B2 (zh)
KR (1) KR20200007690A (zh)
CN (1) CN110715793B (zh)
TW (1) TW202022360A (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116465826B (zh) * 2023-03-15 2023-10-24 东阳市诰源闪光材料有限公司 一种用于光学膜偏光率测试装置及测试方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008151714A (ja) 2006-12-19 2008-07-03 Horiba Ltd 板状部材検査装置
JP2011196708A (ja) 2010-03-17 2011-10-06 Mitsubishi Electric Corp 外形検出装置および外形検出方法
JP2011209078A (ja) 2010-03-29 2011-10-20 Sumitomo Chemical Co Ltd 目視検査方法および目視検査装置
CN202216828U (zh) 2011-08-17 2012-05-09 奥普镀膜技术（广州）有限公司 光学膜片光学性能测试台
JP2013228363A (ja) 2012-03-29 2013-11-07 Dainippon Screen Mfg Co Ltd 基板検査装置および基板検査方法
WO2017150222A1 (ja) 2016-02-29 2017-09-08 旭硝子株式会社 形状測定装置
CN107390307A (zh) 2016-05-16 2017-11-24 惠和株式会社 液晶显示装置用光学片、液晶显示装置用背光单元及液晶显示装置用光学片的制造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0961319A (ja) * 1995-08-29 1997-03-07 Shimadzu Corp 吸引式試料台
JP3110707B2 (ja) * 1997-08-25 2000-11-20 株式会社日本マクシス 水晶基板用載置台及び水晶基板の傷検査装置
JP4469659B2 (ja) * 2004-06-11 2010-05-26 株式会社ミツトヨ 載物台装置、画像測定装置
JP2008189494A (ja) * 2007-02-02 2008-08-21 Tosoh Corp 石英ガラス部品及びその製造方法
JP2010107902A (ja) * 2008-10-31 2010-05-13 Nippon Zeon Co Ltd 光学部材及び液晶表示装置
JP2011008195A (ja) * 2009-06-29 2011-01-13 Nitto Denko Corp 光学シート部材の巻回体および液晶表示装置の連続製造方法
JP5570900B2 (ja) * 2010-07-26 2014-08-13 東京エレクトロン株式会社 基板載置面に樹脂突起物層を形成する方法及び樹脂突起物層転写部材
JP2012037683A (ja) * 2010-08-06 2012-02-23 Sumitomo Chemical Co Ltd 光学部材及びこれを備えた液晶パネル並びに液晶表示装置
JP2013088438A (ja) * 2011-10-13 2013-05-13 Konica Minolta Advanced Layers Inc 光学フィルム、その製造方法及び画像表示装置
JP2014002322A (ja) * 2012-06-20 2014-01-09 Asahi Kasei E-Materials Corp 光学素子及び導電性光学素子
JP2017191190A (ja) * 2016-04-13 2017-10-19 三菱ケミカル株式会社 光学フィルムの製造方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008151714A (ja) 2006-12-19 2008-07-03 Horiba Ltd 板状部材検査装置
JP2011196708A (ja) 2010-03-17 2011-10-06 Mitsubishi Electric Corp 外形検出装置および外形検出方法
JP2011209078A (ja) 2010-03-29 2011-10-20 Sumitomo Chemical Co Ltd 目視検査方法および目視検査装置
CN202216828U (zh) 2011-08-17 2012-05-09 奥普镀膜技术（广州）有限公司 光学膜片光学性能测试台
JP2013228363A (ja) 2012-03-29 2013-11-07 Dainippon Screen Mfg Co Ltd 基板検査装置および基板検査方法
WO2017150222A1 (ja) 2016-02-29 2017-09-08 旭硝子株式会社 形状測定装置
CN107390307A (zh) 2016-05-16 2017-11-24 惠和株式会社 液晶显示装置用光学片、液晶显示装置用背光单元及液晶显示装置用光学片的制造方法

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Publication number Publication date
CN110715793A (zh) 2020-01-21
TW202022360A (zh) 2020-06-16
CN110715793B (zh) 2023-11-28
JP2020016645A (ja) 2020-01-30
KR20200007690A (ko) 2020-01-22

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