JP7282794B2 - 小型電子アセンブリ - Google Patents
小型電子アセンブリ Download PDFInfo
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- JP7282794B2 JP7282794B2 JP2020545627A JP2020545627A JP7282794B2 JP 7282794 B2 JP7282794 B2 JP 7282794B2 JP 2020545627 A JP2020545627 A JP 2020545627A JP 2020545627 A JP2020545627 A JP 2020545627A JP 7282794 B2 JP7282794 B2 JP 7282794B2
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- conductive
- dies
- miniature electronic
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L25/0652—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next and on each other, i.e. mixed assemblies
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- General Physics & Mathematics (AREA)
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- Geometry (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
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Description
Claims (9)
- 小型電子アセンブリであって、
(i)複数の再分配層を有する再分配構造を含み、(ii)ダイを支持するパッケージ基板と、
前記再分配構造の表面に導電的に結合された第1のダイと、
前記再分配構造の前記表面に導電的に結合された第2のダイと、
前記再分配構造の前記表面に導電的に結合された銅ピラーと、
経路構造と、
前記経路構造に導電的に結合された第3のダイと、
を有し、
前記第3のダイの部分が、前記第1のダイの一端を超えて延びており、
前記銅ピラーは、少なくとも一部が前記第1のダイおよび前記第2のダイと同一表面上にあり、
前記銅ピラーは、前記再分配構造と前記経路構造の間にあり、少なくとも1つの前記銅ピラー全体が、前記再分配構造から前記第3のダイの前記部分に導電的に結合され、
前記第1のダイは、少なくとも一部が前記第3のダイと前記再分配構造の間にあり、
前記第3のダイは、はんだにより、前記経路構造に結合される、小型電子アセンブリ。 - 当該小型電子アセンブリの厚さは、100μmと2000μmの間である、請求項1に記載の小型電子アセンブリ。
- さらに、
前記銅ピラーの周囲にモールド材料を有する、請求項1または2に記載の小型電子アセンブリ。 - 前記第1のダイ、前記第2のダイ、および前記第3のダイの少なくとも一つは、メモリーダイである、請求項1乃至3のいずれか一項に記載の小型電子アセンブリ。
- 前記第1のダイ、前記第2のダイ、および前記第3のダイの少なくとも一つは、入力/出力ダイである、請求項1乃至4のいずれか一項に記載の小型電子アセンブリ。
- 前記銅ピラーは、100μmから300μmの間のピッチを有する、請求項1乃至5のいずれか一項に記載の小型電子アセンブリ。
- 前記経路構造は、積層されている、請求項1乃至6のいずれか一項に記載の小型電子アセンブリ。
- 前記経路構造は、複数の経路層を有する、請求項1乃至7のいずれか一項に記載の小型電子アセンブリ。
- 前記第2のダイは、前記第1のダイとは異なる厚さを有する、請求項1乃至8のいずれか一項に記載の小型電子アセンブリ。
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US16/008,879 US11469206B2 (en) | 2018-06-14 | 2018-06-14 | Microelectronic assemblies |
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PCT/US2019/032159 WO2019240901A1 (en) | 2018-06-14 | 2019-05-14 | Microelectronic assemblies |
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JP2023059898A Pending JP2023098916A (ja) | 2018-06-14 | 2023-04-03 | 小型電子アセンブリ |
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Families Citing this family (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10366968B2 (en) * | 2016-09-30 | 2019-07-30 | Intel IP Corporation | Interconnect structure for a microelectronic device |
US10757800B1 (en) | 2017-06-22 | 2020-08-25 | Flex Ltd. | Stripline transmission lines with cross-hatched pattern return plane, where the striplines do not overlap any intersections in the cross-hatched pattern |
WO2019066998A1 (en) * | 2017-09-30 | 2019-04-04 | Intel Corporation | STACKED HOUSING WITH ELECTRICAL CONNECTIONS CREATED BY HIGH-FLOW ADDITIVE MANUFACTURE |
WO2019132967A1 (en) | 2017-12-29 | 2019-07-04 | Intel Corporation | Microelectronic assemblies |
US11494682B2 (en) | 2017-12-29 | 2022-11-08 | Intel Corporation | Quantum computing assemblies |
EP4235784A3 (en) | 2017-12-29 | 2023-10-04 | INTEL Corporation | Microelectronic assemblies with communication networks |
US11342320B2 (en) | 2017-12-29 | 2022-05-24 | Intel Corporation | Microelectronic assemblies |
CN111164751A (zh) | 2017-12-29 | 2020-05-15 | 英特尔公司 | 微电子组件 |
US10361162B1 (en) * | 2018-01-23 | 2019-07-23 | Globalfoundries Singapore Pte. Ltd. | Magnetic shielding of STT-MRAM in multichip packaging and method of manufacturing the same |
US11039531B1 (en) | 2018-02-05 | 2021-06-15 | Flex Ltd. | System and method for in-molded electronic unit using stretchable substrates to create deep drawn cavities and features |
US11735570B2 (en) * | 2018-04-04 | 2023-08-22 | Intel Corporation | Fan out packaging pop mechanical attach method |
US11469206B2 (en) | 2018-06-14 | 2022-10-11 | Intel Corporation | Microelectronic assemblies |
JP2020013877A (ja) * | 2018-07-18 | 2020-01-23 | 太陽誘電株式会社 | 半導体モジュール |
WO2020033632A2 (en) * | 2018-08-08 | 2020-02-13 | Kuprion Inc. | Electronic assemblies employing copper in multiple locations |
US20200051956A1 (en) * | 2018-08-09 | 2020-02-13 | Intel Corporation | Fine pitch z connections for flip chip memory architectures with interposer |
US11114311B2 (en) * | 2018-08-30 | 2021-09-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Chip package structure and method for forming the same |
US10964660B1 (en) | 2018-11-20 | 2021-03-30 | Flex Ltd. | Use of adhesive films for 3D pick and place assembly of electronic components |
US10896877B1 (en) * | 2018-12-14 | 2021-01-19 | Flex Ltd. | System in package with double side mounted board |
US11476200B2 (en) * | 2018-12-20 | 2022-10-18 | Nanya Technology Corporation | Semiconductor package structure having stacked die structure |
US11562982B2 (en) * | 2019-04-29 | 2023-01-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Integrated circuit packages and methods of forming the same |
US11352252B2 (en) | 2019-06-21 | 2022-06-07 | Amkor Technology Singapore Holding Pte. Ltd. | Semiconductor device and method of manufacturing semiconductor device |
US11257776B2 (en) * | 2019-09-17 | 2022-02-22 | Advanced Semiconductor Engineering, Inc. | Semiconductor package structure and method for manufacturing the same |
US11211371B2 (en) * | 2019-10-18 | 2021-12-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Integrated circuit package and method |
DE102020114141B4 (de) | 2019-10-18 | 2024-03-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Integriertes schaltungspackage und verfahren |
US11387222B2 (en) * | 2019-10-18 | 2022-07-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | Integrated circuit package and method |
US20210134690A1 (en) * | 2019-11-01 | 2021-05-06 | Advanced Semiconductor Engineering, Inc. | Semiconductor device packages and methods of manufacturing the same |
US11062947B1 (en) * | 2019-12-19 | 2021-07-13 | Intel Corporation | Inorganic dies with organic interconnect layers and related structures |
US11049791B1 (en) * | 2019-12-26 | 2021-06-29 | Intel Corporation | Heat spreading layer integrated within a composite IC die structure and methods of forming the same |
US11239174B2 (en) * | 2019-12-27 | 2022-02-01 | Advanced Semiconductor Engineering, Inc. | Semiconductor package structure and method for manufacturing the same |
TWI768294B (zh) * | 2019-12-31 | 2022-06-21 | 力成科技股份有限公司 | 封裝結構及其製造方法 |
KR20210087299A (ko) * | 2020-01-02 | 2021-07-12 | 삼성전기주식회사 | 고주파 모듈 및 이를 포함하는 전자기기 |
US11557568B2 (en) * | 2020-02-26 | 2023-01-17 | Taiwan Semiconductor Manufacturing Company. Ltd. | Package and manufacturing method thereof |
KR20210110008A (ko) * | 2020-02-28 | 2021-09-07 | 삼성전자주식회사 | 반도체 패키지 |
DE102021104688A1 (de) * | 2020-04-30 | 2021-11-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Stromverteilungsstruktur und verfahren |
US20210407903A1 (en) * | 2020-06-26 | 2021-12-30 | Intel Corporation | High-throughput additively manufactured power delivery vias and traces |
US11830817B2 (en) | 2020-08-12 | 2023-11-28 | Advanced Micro Devices, Inc. | Creating interconnects between dies using a cross-over die and through-die vias |
TWI722959B (zh) | 2020-08-20 | 2021-03-21 | 欣興電子股份有限公司 | 晶片封裝結構 |
US11990448B2 (en) | 2020-09-18 | 2024-05-21 | Intel Corporation | Direct bonding in microelectronic assemblies |
KR20220042028A (ko) * | 2020-09-25 | 2022-04-04 | 삼성전자주식회사 | 반도체 패키지 |
US11552055B2 (en) * | 2020-11-20 | 2023-01-10 | Qualcomm Incorporated | Integrated circuit (IC) packages employing front side back-end-of-line (FS-BEOL) to back side back-end-of-line (BS-BEOL) stacking for three-dimensional (3D) die stacking, and related fabrication methods |
TWI762046B (zh) * | 2020-11-24 | 2022-04-21 | 恆勁科技股份有限公司 | 半導體封裝結構及其製造方法 |
US11616019B2 (en) * | 2020-12-21 | 2023-03-28 | Nvidia Corp. | Semiconductor assembly |
US11769731B2 (en) | 2021-01-14 | 2023-09-26 | Taiwan Semiconductor Manufacturing Co., Ltd | Architecture for computing system package |
US20220256722A1 (en) * | 2021-02-05 | 2022-08-11 | Advanced Semiconductor Engineering, Inc. | Electronic device package and method of manufacturing the same |
JP2022135735A (ja) * | 2021-03-05 | 2022-09-15 | キオクシア株式会社 | 半導体装置およびその製造方法 |
JP7410898B2 (ja) * | 2021-03-11 | 2024-01-10 | アオイ電子株式会社 | 半導体装置の製造方法および半導体装置 |
US20220367413A1 (en) * | 2021-05-13 | 2022-11-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Packages With Multiple Types of Underfill and Method Forming The Same |
US11823980B2 (en) * | 2021-07-29 | 2023-11-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Package structure and manufacturing method thereof |
US20230060265A1 (en) * | 2021-08-28 | 2023-03-02 | Taiwan Semiconductor Manufacturing Company Limited | Three-dimensional integrated circuit |
TWI798805B (zh) * | 2021-09-01 | 2023-04-11 | 恆勁科技股份有限公司 | 半導體封裝載板及其製造方法 |
US20230170328A1 (en) * | 2021-11-30 | 2023-06-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Shared pad/bridge layout for a 3d ic |
US20230187407A1 (en) * | 2021-12-10 | 2023-06-15 | Intel Corporation | Fine-grained disaggregated server architecture |
WO2024011603A1 (zh) * | 2022-07-15 | 2024-01-18 | 华为技术有限公司 | 芯片封装结构、电子设备及芯片封装结构的封装方法 |
WO2024029138A1 (ja) * | 2022-08-01 | 2024-02-08 | 株式会社村田製作所 | 複合部品デバイスおよびその製造方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007287803A (ja) | 2006-04-13 | 2007-11-01 | Sony Corp | 三次元半導体パッケージ製造方法 |
US20100290191A1 (en) | 2009-05-14 | 2010-11-18 | Megica Corporation | System-in packages |
CN103168358A (zh) | 2010-07-20 | 2013-06-19 | 马维尔国际贸易有限公司 | 嵌入式结构及其制造方法 |
US20160315071A1 (en) | 2015-04-23 | 2016-10-27 | Apple Inc. | Three layer stack structure |
US20170365587A1 (en) | 2016-06-17 | 2017-12-21 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor package and manufacturing method of the same |
Family Cites Families (57)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6150724A (en) | 1998-03-02 | 2000-11-21 | Motorola, Inc. | Multi-chip semiconductor device and method for making the device by using multiple flip chip interfaces |
US6084308A (en) | 1998-06-30 | 2000-07-04 | National Semiconductor Corporation | Chip-on-chip integrated circuit package and method for making the same |
US6659512B1 (en) | 2002-07-18 | 2003-12-09 | Hewlett-Packard Development Company, L.P. | Integrated circuit package employing flip-chip technology and method of assembly |
JP4581768B2 (ja) | 2005-03-16 | 2010-11-17 | ソニー株式会社 | 半導体装置の製造方法 |
TWI429066B (zh) | 2005-06-02 | 2014-03-01 | Sony Corp | Semiconductor image sensor module and manufacturing method thereof |
US8335084B2 (en) | 2005-08-01 | 2012-12-18 | Georgia Tech Research Corporation | Embedded actives and discrete passives in a cavity within build-up layers |
JP3942190B1 (ja) | 2006-04-25 | 2007-07-11 | 国立大学法人九州工業大学 | 両面電極構造の半導体装置及びその製造方法 |
US8227904B2 (en) | 2009-06-24 | 2012-07-24 | Intel Corporation | Multi-chip package and method of providing die-to-die interconnects in same |
US8354297B2 (en) * | 2010-09-03 | 2013-01-15 | Stats Chippac, Ltd. | Semiconductor device and method of forming different height conductive pillars to electrically interconnect stacked laterally offset semiconductor die |
US9337116B2 (en) | 2010-10-28 | 2016-05-10 | Stats Chippac, Ltd. | Semiconductor device and method of forming stepped interposer for stacking and electrically connecting semiconductor die |
TWI538071B (zh) | 2010-11-16 | 2016-06-11 | 星科金朋有限公司 | 具連接結構之積體電路封裝系統及其製造方法 |
KR20120110451A (ko) * | 2011-03-29 | 2012-10-10 | 삼성전자주식회사 | 반도체 패키지 |
US9087701B2 (en) | 2011-04-30 | 2015-07-21 | Stats Chippac, Ltd. | Semiconductor device and method of embedding TSV semiconductor die within substrate for vertical interconnect in POP |
US9978656B2 (en) | 2011-11-22 | 2018-05-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mechanisms for forming fine-pitch copper bump structures |
US8686570B2 (en) | 2012-01-20 | 2014-04-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multi-dimensional integrated circuit structures and methods of forming the same |
US8981511B2 (en) | 2012-02-29 | 2015-03-17 | Semiconductor Components Industries, Llc | Multi-chip package for imaging systems |
CN102593087B (zh) | 2012-03-01 | 2014-09-03 | 华进半导体封装先导技术研发中心有限公司 | 一种用于三维集成混合键合结构及其键合方法 |
US9526175B2 (en) | 2012-04-24 | 2016-12-20 | Intel Corporation | Suspended inductor microelectronic structures |
US9136236B2 (en) | 2012-09-28 | 2015-09-15 | Intel Corporation | Localized high density substrate routing |
US9349703B2 (en) | 2013-09-25 | 2016-05-24 | Intel Corporation | Method for making high density substrate interconnect using inkjet printing |
US9379074B2 (en) | 2013-11-22 | 2016-06-28 | Invensas Corporation | Die stacks with one or more bond via arrays of wire bond wires and with one or more arrays of bump interconnects |
US9805997B2 (en) | 2014-01-27 | 2017-10-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Packaging methods for semiconductor devices with encapsulant ring |
US9653443B2 (en) | 2014-02-14 | 2017-05-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Thermal performance structure for semiconductor packages and method of forming same |
KR102167599B1 (ko) * | 2014-03-04 | 2020-10-19 | 에스케이하이닉스 주식회사 | 칩 스택 임베디드 패키지 |
US9418924B2 (en) | 2014-03-20 | 2016-08-16 | Invensas Corporation | Stacked die integrated circuit |
US9318452B2 (en) | 2014-03-21 | 2016-04-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor packages and methods of forming the same |
US9859265B2 (en) | 2014-06-06 | 2018-01-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Package structure and methods of forming the same |
KR102245003B1 (ko) | 2014-06-27 | 2021-04-28 | 삼성전자주식회사 | 오버행을 극복할 수 있는 반도체 패키지 및 그 제조방법 |
US9704735B2 (en) | 2014-08-19 | 2017-07-11 | Intel Corporation | Dual side solder resist layers for coreless packages and packages with an embedded interconnect bridge and their methods of fabrication |
US9406799B2 (en) | 2014-10-21 | 2016-08-02 | Globalfoundries Inc. | High mobility PMOS and NMOS devices having Si—Ge quantum wells |
US9812429B2 (en) | 2014-11-05 | 2017-11-07 | Massachusetts Institute Of Technology | Interconnect structures for assembly of multi-layer semiconductor devices |
KR102203669B1 (ko) | 2014-11-24 | 2021-01-14 | 에스케이하이닉스 주식회사 | NoC 구조의 반도체 장치 및 그의 라우팅 방법 |
US20160155723A1 (en) | 2014-11-27 | 2016-06-02 | Chengwei Wu | Semiconductor package |
US9634053B2 (en) | 2014-12-09 | 2017-04-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Image sensor chip sidewall interconnection |
US10181410B2 (en) | 2015-02-27 | 2019-01-15 | Qualcomm Incorporated | Integrated circuit package comprising surface capacitor and ground plane |
US10134972B2 (en) | 2015-07-23 | 2018-11-20 | Massachusetts Institute Of Technology | Qubit and coupler circuit structures and coupling techniques |
US9917072B2 (en) | 2015-09-21 | 2018-03-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of manufacturing an integrated stacked package with a fan-out redistribution layer (RDL) and a same encapsulating process |
US9842813B2 (en) | 2015-09-21 | 2017-12-12 | Altera Corporation | Tranmission line bridge interconnects |
WO2017052653A1 (en) | 2015-09-25 | 2017-03-30 | Intel Corporation | Selective die transfer using controlled de-bonding from a carrier wafer |
US9761533B2 (en) | 2015-10-16 | 2017-09-12 | Xilinx, Inc. | Interposer-less stack die interconnect |
KR102399465B1 (ko) | 2015-10-23 | 2022-05-18 | 삼성전자주식회사 | 로직 반도체 소자 |
US10396269B2 (en) | 2015-11-05 | 2019-08-27 | Massachusetts Institute Of Technology | Interconnect structures for assembly of semiconductor structures including superconducting integrated circuits |
US9984998B2 (en) * | 2016-01-06 | 2018-05-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Devices employing thermal and mechanical enhanced layers and methods of forming same |
JP6449798B2 (ja) | 2016-01-26 | 2019-01-09 | 太陽誘電株式会社 | 積層セラミック電子部品及びその製造方法、並びにセラミック素体 |
WO2017213649A1 (en) | 2016-06-09 | 2017-12-14 | Intel Corporation | Quantum dot devices with double quantum well structures |
US10340206B2 (en) * | 2016-08-05 | 2019-07-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Dense redistribution layers in semiconductor packages and methods of forming the same |
US10748872B2 (en) | 2017-08-22 | 2020-08-18 | Micron Technology, Inc. | Integrated semiconductor assemblies and methods of manufacturing the same |
WO2019132965A1 (en) | 2017-12-29 | 2019-07-04 | Intel Corporation | Microelectronic assemblies |
WO2019132961A1 (en) | 2017-12-29 | 2019-07-04 | Intel Corporation | Microelectronic assemblies |
US11342320B2 (en) | 2017-12-29 | 2022-05-24 | Intel Corporation | Microelectronic assemblies |
WO2019132967A1 (en) | 2017-12-29 | 2019-07-04 | Intel Corporation | Microelectronic assemblies |
EP4235784A3 (en) | 2017-12-29 | 2023-10-04 | INTEL Corporation | Microelectronic assemblies with communication networks |
US11494682B2 (en) | 2017-12-29 | 2022-11-08 | Intel Corporation | Quantum computing assemblies |
CN111164751A (zh) | 2017-12-29 | 2020-05-15 | 英特尔公司 | 微电子组件 |
US11469206B2 (en) | 2018-06-14 | 2022-10-11 | Intel Corporation | Microelectronic assemblies |
US10826492B2 (en) | 2018-08-31 | 2020-11-03 | Xilinx, Inc. | Power gating in stacked die structures |
US11056453B2 (en) | 2019-06-18 | 2021-07-06 | Deca Technologies Usa, Inc. | Stackable fully molded semiconductor structure with vertical interconnects |
-
2018
- 2018-06-14 US US16/008,879 patent/US11469206B2/en active Active
-
2019
- 2019-05-06 TW TW108115558A patent/TWI829688B/zh active
- 2019-05-06 TW TW111150597A patent/TW202318610A/zh unknown
- 2019-05-14 CN CN201980021409.2A patent/CN111902933A/zh active Pending
- 2019-05-14 EP EP19819772.5A patent/EP3807932A4/en active Pending
- 2019-05-14 KR KR1020207025378A patent/KR102552325B1/ko active IP Right Grant
- 2019-05-14 CN CN202211736597.7A patent/CN115954352A/zh active Pending
- 2019-05-14 JP JP2020545627A patent/JP7282794B2/ja active Active
- 2019-05-14 WO PCT/US2019/032159 patent/WO2019240901A1/en active Application Filing
- 2019-05-14 KR KR1020237036277A patent/KR20230151075A/ko not_active Application Discontinuation
- 2019-05-14 EP EP22217283.5A patent/EP4181191A3/en active Pending
- 2019-05-14 KR KR1020227046430A patent/KR102594483B1/ko active IP Right Grant
-
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- 2020-12-21 US US17/129,221 patent/US11616047B2/en active Active
-
2022
- 2022-12-29 US US18/090,801 patent/US20230133235A1/en active Pending
-
2023
- 2023-04-03 JP JP2023059898A patent/JP2023098916A/ja active Pending
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007287803A (ja) | 2006-04-13 | 2007-11-01 | Sony Corp | 三次元半導体パッケージ製造方法 |
US20100290191A1 (en) | 2009-05-14 | 2010-11-18 | Megica Corporation | System-in packages |
CN102439719A (zh) | 2009-05-14 | 2012-05-02 | 米辑电子股份有限公司 | 系统级封装 |
JP2012527127A (ja) | 2009-05-14 | 2012-11-01 | メギカ・コーポレイション | システムインパッケージ |
US20140106508A1 (en) | 2010-03-18 | 2014-04-17 | Marvell World Trade Ltd. | Structures embedded within core material and methods of manufacturing thereof |
CN103168358A (zh) | 2010-07-20 | 2013-06-19 | 马维尔国际贸易有限公司 | 嵌入式结构及其制造方法 |
JP2013538445A (ja) | 2010-07-20 | 2013-10-10 | マーベル ワールド トレード リミテッド | 埋め込み構造およびその製造方法 |
US20160315071A1 (en) | 2015-04-23 | 2016-10-27 | Apple Inc. | Three layer stack structure |
CN107533985A (zh) | 2015-04-23 | 2018-01-02 | 苹果公司 | 包括第一级裸片、背对背堆叠的第二级裸片和第三级裸片以及对应的第一再分配层、第二再分配层和第三再分配层的竖直堆叠系统级封装及其制造方法 |
JP2018514088A (ja) | 2015-04-23 | 2018-05-31 | アップル インコーポレイテッド | 第1のレベルのダイと、背中合わせに積み重ねられた第2のレベルのダイと、第3のレベルのダイとを備え、対応する第1、第2、及び第3の再配線層を有する垂直スタックシステムインパッケージ、並びにその製造方法 |
US20170365587A1 (en) | 2016-06-17 | 2017-12-21 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor package and manufacturing method of the same |
CN107527882A (zh) | 2016-06-17 | 2017-12-29 | 台湾积体电路制造股份有限公司 | 半导体封装和其制造方法 |
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US11469206B2 (en) | 2022-10-11 |
KR20230011436A (ko) | 2023-01-20 |
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