JP7261298B2 - ミラー装着部材、これを使用した位置計測用ミラー、および露光装置 - Google Patents

ミラー装着部材、これを使用した位置計測用ミラー、および露光装置 Download PDF

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Publication number
JP7261298B2
JP7261298B2 JP2021528283A JP2021528283A JP7261298B2 JP 7261298 B2 JP7261298 B2 JP 7261298B2 JP 2021528283 A JP2021528283 A JP 2021528283A JP 2021528283 A JP2021528283 A JP 2021528283A JP 7261298 B2 JP7261298 B2 JP 7261298B2
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Prior art keywords
mirror
mounting member
grooves
member according
mirror mounting
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JP2021528283A
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Japanese (ja)
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JPWO2020262674A1 (https=
JPWO2020262674A5 (https=
Inventor
徹彌 井上
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Kyocera Corp
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Kyocera Corp
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2021528283A 2019-06-28 2020-06-26 ミラー装着部材、これを使用した位置計測用ミラー、および露光装置 Active JP7261298B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019122425 2019-06-28
JP2019122425 2019-06-28
PCT/JP2020/025391 WO2020262674A1 (ja) 2019-06-28 2020-06-26 ミラー装着部材、これを使用した位置計測用ミラー、および露光装置

Publications (3)

Publication Number Publication Date
JPWO2020262674A1 JPWO2020262674A1 (https=) 2020-12-30
JPWO2020262674A5 JPWO2020262674A5 (https=) 2022-03-11
JP7261298B2 true JP7261298B2 (ja) 2023-04-19

Family

ID=74061283

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JP2021528283A Active JP7261298B2 (ja) 2019-06-28 2020-06-26 ミラー装着部材、これを使用した位置計測用ミラー、および露光装置

Country Status (6)

Country Link
US (1) US20220269040A1 (https=)
EP (1) EP3992716A4 (https=)
JP (1) JP7261298B2 (https=)
KR (1) KR20220011153A (https=)
CN (1) CN113994267B (https=)
WO (1) WO2020262674A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022145470A1 (ja) * 2020-12-28 2022-07-07 京セラ株式会社 構造体、これを使用した位置計測用ミラーおよび露光装置
JP7589112B2 (ja) 2021-06-30 2024-11-25 京セラ株式会社 セラミック接合体およびその製造方法

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002182103A (ja) 2000-12-14 2002-06-26 Alps Electric Co Ltd 樹脂成形光学部品及びそれを備えた光ピックアップ装置
JP2002277782A (ja) 2001-03-16 2002-09-25 Sharp Corp 光学部品の取付構造
JP2004163491A (ja) 2002-11-11 2004-06-10 Nippon Sheet Glass Co Ltd 光学素子及びその製造方法
JP2004177331A (ja) 2002-11-28 2004-06-24 Taiheiyo Cement Corp 位置測定用ミラーおよびミラー用部材
JP2004309733A (ja) 2003-04-04 2004-11-04 Seiko Epson Corp 凹部付き基材の製造方法、凹部付き基材、マイクロレンズ用凹部付き基材、マイクロレンズ基板、透過型スクリーンおよびリア型プロジェクタ
JP2008124219A (ja) 2006-11-10 2008-05-29 Canon Inc 液浸露光装置
JP2008191592A (ja) 2007-02-07 2008-08-21 Hitachi Ltd 光学部材
CN105589170A (zh) 2016-01-28 2016-05-18 中国华能集团清洁能源技术研究院有限公司 一种桁架式线性菲涅尔太阳能反射镜框架
JP2018004956A (ja) 2016-07-01 2018-01-11 恵和株式会社 光学ユニット及び光学ユニットの製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE458482B (sv) * 1987-11-19 1989-04-03 Misomex Ab Utbraenningsram vid kopieringsmaskin
JPH0373906U (https=) * 1989-11-22 1991-07-25
US6864963B2 (en) * 2002-03-19 2005-03-08 Chi Mei Optoelectronics Corporation Position measuring system with multiple bar mirrors
JP3795869B2 (ja) * 2003-02-18 2006-07-12 株式会社東芝 光モジュール
JP2012203371A (ja) * 2011-03-28 2012-10-22 Nippon Shokubai Co Ltd 金属膜を用いた光導波路のミラー部の製造方法、及び光導波路
JP6301067B2 (ja) * 2013-04-26 2018-03-28 富士通コンポーネント株式会社 光学部材、光モジュール
CN105652393B (zh) * 2016-03-18 2018-01-05 武汉华工正源光子技术有限公司 基于光学基座的单纤双向器件的封装结构及封装方法
CN108231974B (zh) * 2016-12-21 2022-09-02 日亚化学工业株式会社 发光装置的制造方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002182103A (ja) 2000-12-14 2002-06-26 Alps Electric Co Ltd 樹脂成形光学部品及びそれを備えた光ピックアップ装置
JP2002277782A (ja) 2001-03-16 2002-09-25 Sharp Corp 光学部品の取付構造
JP2004163491A (ja) 2002-11-11 2004-06-10 Nippon Sheet Glass Co Ltd 光学素子及びその製造方法
JP2004177331A (ja) 2002-11-28 2004-06-24 Taiheiyo Cement Corp 位置測定用ミラーおよびミラー用部材
JP2004309733A (ja) 2003-04-04 2004-11-04 Seiko Epson Corp 凹部付き基材の製造方法、凹部付き基材、マイクロレンズ用凹部付き基材、マイクロレンズ基板、透過型スクリーンおよびリア型プロジェクタ
JP2008124219A (ja) 2006-11-10 2008-05-29 Canon Inc 液浸露光装置
JP2008191592A (ja) 2007-02-07 2008-08-21 Hitachi Ltd 光学部材
CN105589170A (zh) 2016-01-28 2016-05-18 中国华能集团清洁能源技术研究院有限公司 一种桁架式线性菲涅尔太阳能反射镜框架
JP2018004956A (ja) 2016-07-01 2018-01-11 恵和株式会社 光学ユニット及び光学ユニットの製造方法

Also Published As

Publication number Publication date
EP3992716A4 (en) 2023-08-09
EP3992716A1 (en) 2022-05-04
CN113994267B (zh) 2024-01-19
JPWO2020262674A1 (https=) 2020-12-30
WO2020262674A1 (ja) 2020-12-30
CN113994267A (zh) 2022-01-28
KR20220011153A (ko) 2022-01-27
US20220269040A1 (en) 2022-08-25

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