JP7171185B2 - キャパシタ及びこれを含む実装基板 - Google Patents
キャパシタ及びこれを含む実装基板 Download PDFInfo
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- 239000003990 capacitor Substances 0.000 title claims description 227
- 239000000758 substrate Substances 0.000 claims description 45
- 239000004065 semiconductor Substances 0.000 claims description 6
- 239000012535 impurity Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 207
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 16
- 239000000463 material Substances 0.000 description 16
- 229910044991 metal oxide Inorganic materials 0.000 description 16
- 150000004706 metal oxides Chemical class 0.000 description 16
- 238000000034 method Methods 0.000 description 12
- 239000010409 thin film Substances 0.000 description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 10
- 229910052593 corundum Inorganic materials 0.000 description 10
- 229910001845 yogo sapphire Inorganic materials 0.000 description 10
- 238000000231 atomic layer deposition Methods 0.000 description 9
- -1 Al2O3 Chemical class 0.000 description 8
- 239000002131 composite material Substances 0.000 description 8
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 229910052718 tin Inorganic materials 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- 150000004767 nitrides Chemical class 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 4
- 230000003213 activating effect Effects 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 229910002244 LaAlO3 Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910002370 SrTiO3 Inorganic materials 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000003985 ceramic capacitor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Description
図1は本発明の一実施形態によるキャパシタ100の斜視図を概略的に示すものであり、図2は本発明の一実施形態によるキャパシタ100の図1のI-I'による断面図を概略的に示すものである。
図22は本発明の他の実施形態によるキャパシタの実装基板の断面図を概略的に示すものである。
101 本体
105a、105b トレンチ
111、112 誘電層
120a、120b キャパシタ層
121、122、123、124 電極
181、182 絶縁層
191、192、193 端子電極
Claims (10)
- 第1キャパシタ領域及び第2キャパシタ領域を有する基板を含む本体と、前記本体の外側における前記基板の一面側に配置される第1端子電極、第2端子電極、及び第3端子電極と、を含み、
前記第1キャパシタ領域は、複数の第1トレンチと、前記第1キャパシタ領域の前記基板の一面及び前記複数の第1トレンチに配置され、且つ少なくとも一つ以上の第1誘電層、及び前記第1誘電層を間に挟んで配置される第1及び第2電極を有する第1キャパシタ層と、を含み、
前記第2キャパシタ領域は、複数の第2トレンチと、前記第2キャパシタ領域の前記基板の一面及び前記複数の第2トレンチに配置され、且つ少なくとも一つ以上の第2誘電層、及び前記第2誘電層を間に挟んで配置される第3及び第4電極を有する第2キャパシタ層と、を含み、
前記第2キャパシタ層の比表面積が前記第1キャパシタ層の比表面積よりも大きく、
前記第1電極は、前記第1端子電極と連結され、前記第2及び第4電極は、前記第3端子電極と連結され、前記第3電極は、前記第2端子電極と連結され、
前記第1キャパシタ層が配置された前記基板の一面と前記第2キャパシタ層が配置された前記基板の一面とは同じ面であるキャパシタ。 - 単位面積当たりの前記第1トレンチの数は、単位面積当たりの前記第2トレンチの数よりも少ない、請求項1に記載のキャパシタ。
- 前記複数の第1トレンチのそれぞれの幅が前記複数の第2トレンチのそれぞれの幅よりも大きいか、前記複数の第1トレンチのそれぞれの深さが前記複数の第2トレンチのそれぞれの深さよりも深い、請求項1又は2に記載のキャパシタ。
- 前記複数の第1トレンチのそれぞれの上部の形状及び前記複数の第2トレンチのそれぞれの上部の形状は一方向に長く形成された直線又は曲線の溝状、スポット状、又は十字状のうち少なくとも一つである、請求項1から3のいずれか一項に記載のキャパシタ。
- 前記第1及び第2キャパシタ領域は、前記本体の第1方向に配列されるか、前記第1方向と直交する第2方向に配列される、請求項1から4のいずれか一項に記載のキャパシタ。
- 前記第1キャパシタ領域の面積は、前記第2キャパシタ領域の面積よりも小さい、請求項1から5のいずれか一項に記載のキャパシタ。
- 前記第1~第4電極のうち最下層に配置された電極は、前記基板にn型不純物を注入して形成されたドーピング層である、請求項1から6のいずれか一項に記載のキャパシタ。
- 前記第1キャパシタ層は、前記第1キャパシタ層から外側に向かって低くなり、前記第1電極、前記第1誘電層、及び前記第2電極で構成される階段状の第1及び第2引き出し部を含み、
前記第2キャパシタ層は、前記第2キャパシタ層から外側に向かって低くなり、前記第3電極、前記第2誘電層、及び前記第4電極で構成される階段状の第3及び第4引き出し部を含む、請求項1から7のいずれか一項に記載のキャパシタ。 - 前記第1~第4引き出し部の上部には絶縁層が配置され、
前記第1及び第3引き出し部は、前記絶縁層に前記第1及び第3電極が露出する第1開口を含み、
前記第2及び第4引き出し部は、前記絶縁層に前記第2及び第4電極が露出する第2開口を含み、
前記第1及び第2開口ならびに前記絶縁層の上部には、前記第1端子電極、前記第2端子電極、及び前記第3端子電極のいずれかと連結されている導電層が配置される、請求項8に記載のキャパシタ。 - 一面に半導体チップが配置された基板と、
実装面の前記基板の他面に配置される請求項1から9のいずれか一項に記載のキャパシタと、を含む、キャパシタの実装基板。
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