JP7168356B2 - 有機発光表示装置及びこの製造方法 - Google Patents
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Description
前記第1の有機機能層上に配置される有機発光層と、前記有機発光層上に配置される第2の有機機能層と、前記第2の有機機能層上に配置される共通電極を含み得る。
その際、アクティブパターン(431、図9参照)は、材料によって様々な方法により形成できる。例えば、アクティブパターン)が、非晶質シリコン、酸化物半導体などから形成される場合は、プラズマ化学気相蒸着法、常圧化学気相蒸着法、低圧化学気相蒸着法などを用いる。一方、アクティブパターンが多結晶シリコンから形成される場合は、非晶質シリコンを、急速加熱アニーリング法、固相結晶化法、エキシマレーザアニーリング法、金属誘導アニーリング法などの結晶化方法により結晶化して形成する。
下部構造に属する各膜(421乃至426)の形成については周知の方法が使えるので、画素電極425を除き、説明を省略する。
図20を参照すると、封止部材550上に、上部保護フィルム581を取り付ける。
110、 210、 310、 410、 510 フレキシブル基板
111、 211、 311、 411、 511 第1のプラスチック層
112、 212、 312、 412、 512 第1のバリア層
213、 313、 413、 513 第2のプラスチック層
214、 314、 414、 514 第2のバリア層
140a、 240a、 340a、 440a、540a 共通層の第1部分
140b、 240b、 340b、 440b、540b 共通層の第2部分
320、 420 下部構造
421 バッファ膜
422 ゲート絶縁膜
423 層間絶縁膜
424 平坦化膜
425 画素電極
426 画素定義膜
430 薄膜トランジスタ
431 アクティブパターン
432 ゲート電極
433 ソース電極
434 ドレイン電極
140、240、340、440、540 共通層
441 第1の有機機能層
442 有機発光層
443 第2の有機機能層
444 共通電極
445 キャッピング層
150、250、350、450、550 封止部材
451、551 第1の無機膜
452、552 有機膜
453、553 第2の無機膜
470、570 キャリア基板
581 上部保護フィルム
582 下部保護フィルム
590 偏光部材
DA 表示領域
ES1、ES2、ES3 第1、第2、第3エッチングソース
GR、GR’、GR” 溝、予備溝、仮溝
TA 貫通領域
PA 周辺領域
TH 貫通孔
Claims (24)
- アンダカットされた溝が形成されたフレキシブル基板と、
前記フレキシブル基板上に配置され、有機発光層を含み、前記溝によって断絶された共通層と、
前記共通層上に配置され、前記共通層を覆う封止部材とを含み、
前記フレキシブル基板は、第1のプラスチック層と、前記第1のプラスチック層上に配置された第1のバリア層とを含み、
前記溝における前記第1のプラスチック層は、前記第1のバリア層に対してアンダカットされていることを特徴とする有機発光表示装置。 - 前記溝は、前記第1のバリア層の厚さ、及び前記第1のプラスチック層の厚さの一部に対応するように形成されていることを特徴とする請求項1に記載の有機発光表示装置。
- 更に、前記フレキシブル基板は、前記第1のバリア層上に配置された第2のプラスチック層と、前記第2のプラスチック層上に配置された第2のバリア層とを含み、
前記溝における前記第2のプラスチック層は、前記第2のバリア層に対してアンダカットされていることを特徴とする請求項1に記載の有機発光表示装置。 - 前記第2のバリア層における前記溝の幅は、前記第1のバリア層における前記溝の幅よりも大きいことを特徴とする請求項3に記載の有機発光表示装置。
- 前記共通層は、前記溝の外部に配置された第1の部分と、前記溝の内部に配置された第2の部分とを含み、
前記第1の部分と前記第2の部分は、互いに断絶されていることを特徴とする請求項1に記載の有機発光表示装置。 - 前記封止部材は、前記共通層の前記第1の部分、前記共通層の前記第2の部分、及び前記溝によって露出された前記フレキシブル基板の表面を覆うことを特徴とする請求項5に記載の有機発光表示装置。
- 前記封止部材は、少なくとも1つの無機膜、及び少なくとも1つの有機膜を含むことを特徴とする請求項1に記載の有機発光表示装置。
- 前記少なくとも1つの無機膜は、前記溝によって露出された前記フレキシブル基板の表面を覆うことを特徴とする請求項7に記載の有機発光表示装置。
- 前記少なくとも1つの有機膜は、前記溝の外部に配置されていることを特徴とする請求項7に記載の有機発光表示装置。
- 表示領域、貫通領域、及び周辺領域を含み、前記周辺領域にアンダカットされた溝が形成された基板と、
前記基板の前記表示領域上に配置された有機発光素子と、
前記基板の前記周辺領域上に配置され、前記溝により断絶された共通層と、
前記有機発光素子及び前記共通層上に配置された封止部材とを含み、
前記基板は、第1のプラスチック層と、前記第1のプラスチック層上に配置された第1のバリア層とを含み、
前記溝における前記第1のプラスチック層は、前記第1のバリア層に対してアンダカットされていることを特徴とする有機発光表示装置。 - 前記周辺領域は、前記表示領域と前記貫通領域との間に位置することを特徴とする請求項10に記載の有機発光表示装置。
- 前記周辺領域は、前記貫通領域を取り囲み、
前記表示領域は、前記周辺領域を取り囲むことを特徴とする請求項11に記載の有機発光表示装置。 - 前記有機発光素子は、
画素電極と、
前記画素電極上に配置された第1の有機機能層と、
前記第1の有機機能層上に配置された有機発光層と、
前記有機発光層上に配置された第2の有機機能層と、
前記第2の有機機能層上に配置された共通電極を含むことを特徴とする請求項10に記載の有機発光表示装置。 - 前記共通層は、前記第1の有機機能層、前記第2の有機機能層、及び前記共通電極の少なくとも1つが延在して形成されていることを特徴とする請求項13に記載の有機発光表示装置。
- 更に、前記有機発光素子と前記封止部材との間に配置されたキャッピング層を含み、
前記共通層は、前記第1の有機機能層、前記第2の有機機能層、前記共通電極、及び前記キャッピング層の少なくとも1つが延在して形成されていることを特徴とする請求項13に記載の有機発光表示装置。 - キャリア基板を準備するステップと、
前記キャリア基板上に、フレキシブル基板を形成するステップと、
前記フレキシブル基板に、アンダカットされた溝を形成するステップと、
前記フレキシブル基板上に有機発光層を含み、前記溝によって断絶される共通層を形成するステップと、
前記共通層上に、前記共通層を覆う封止部材を形成するステップとを含み、
前記フレキシブル基板を形成するステップは、
前記キャリア基板上に、第1のプラスチック層を形成するステップと、
前記第1のプラスチック層上に、第1のバリア層を形成するステップとを含み、
前記溝は、前記第1のプラスチック層、及び前記第1のバリア層に一体に形成されることを特徴とする有機発光表示装置の製造方法。 - 前記溝は、前記フレキシブル基板にレーザを照射して形成されることを特徴とする請求項16に記載の有機発光表示装置の製造方法。
- 前記第1のプラスチック層のレーザ吸収率は、前記第1のバリア層のレーザ吸収率よりも大きいことを特徴とする請求項16に記載の有機発光表示装置の製造方法。
- 更に、前記フレキシブル基板を形成するステップは、
前記第1のバリア層上に、第2のプラスチック層を形成するステップと、
前記第2のプラスチック層上に、第2のバリア層を形成するステップとを含み、
前記溝は、前記第1のプラスチック層、前記第1のバリア層、前記第2のプラスチック層、及び前記第2のバリア層に一体に形成されることを特徴とする請求項16に記載の有機発光表示装置の製造方法。 - 前記溝は、前記フレキシブル基板にレーザを照射して形成されることを特徴とする請求項19に記載の有機発光表示装置の製造方法。
- 前記第2のプラスチック層のレーザ吸収率は、前記第2のバリア層のレーザ吸収率よりも大きいことを特徴とする請求項19に記載の有機発光表示装置の製造方法。
- 更に、前記フレキシブル基板から前記キャリア基板を分離するステップと、
前記キャリア基板が分離された前記フレキシブル基板の一面に、下部保護フィルムを取り付けるステップと、
前記封止部材上に偏光部材を形成するステップと、を含むことを特徴とする請求項16に記載の有機発光表示装置の製造方法。 - 更に、前記下部保護フィルム、前記フレキシブル基板、前記共通層、前記封止部材、及び前記偏光部材を貫通する貫通孔を形成するステップを含むことを特徴とする請求項22に記載の有機発光表示装置の製造方法。
- 前記貫通孔により、前記溝の少なくとも一部が露出されることを特徴とする請求項23に記載の有機発光表示装置の製造方法。
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US20220158131A1 (en) | 2022-05-19 |
US20190081273A1 (en) | 2019-03-14 |
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JP2019050180A (ja) | 2019-03-28 |
KR102083315B1 (ko) | 2020-03-03 |
CN109509769B (zh) | 2023-10-17 |
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US11245093B2 (en) | 2022-02-08 |
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