JP7161854B2 - 検査装置 - Google Patents

検査装置 Download PDF

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Publication number
JP7161854B2
JP7161854B2 JP2018038843A JP2018038843A JP7161854B2 JP 7161854 B2 JP7161854 B2 JP 7161854B2 JP 2018038843 A JP2018038843 A JP 2018038843A JP 2018038843 A JP2018038843 A JP 2018038843A JP 7161854 B2 JP7161854 B2 JP 7161854B2
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JP
Japan
Prior art keywords
electronic device
temperature
led
inspected
coolant
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Active
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JP2018038843A
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English (en)
Japanese (ja)
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JP2019153717A (ja
JP2019153717A5 (https=
Inventor
繁 河西
将人 小林
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Tokyo Electron Ltd
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Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority to JP2018038843A priority Critical patent/JP7161854B2/ja
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to CN201980015484.8A priority patent/CN111788666B/zh
Priority to KR1020207027249A priority patent/KR102492491B1/ko
Priority to DE112019001139.1T priority patent/DE112019001139B4/de
Priority to PCT/JP2019/005988 priority patent/WO2019171932A1/ja
Priority to US16/976,672 priority patent/US11340283B2/en
Priority to TW108106696A priority patent/TWI797267B/zh
Publication of JP2019153717A publication Critical patent/JP2019153717A/ja
Publication of JP2019153717A5 publication Critical patent/JP2019153717A5/ja
Application granted granted Critical
Publication of JP7161854B2 publication Critical patent/JP7161854B2/ja
Active legal-status Critical Current
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • G01R31/2872Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
    • G01R31/2874Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature
    • G01R31/2877Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature related to cooling
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2607Circuits therefor
    • G01R31/2632Circuits therefor for testing diodes
    • G01R31/2635Testing light-emitting diodes, laser diodes or photodiodes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2607Circuits therefor
    • G01R31/2608Circuits therefor for testing bipolar transistors
    • G01R31/2619Circuits therefor for testing bipolar transistors for measuring thermal properties thereof
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2642Testing semiconductor operation lifetime or reliability, e.g. by accelerated life tests
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • G01R31/286External aspects, e.g. related to chambers, contacting devices or handlers
    • G01R31/2868Complete testing stations; systems; procedures; software aspects
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • G01R31/2872Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
    • G01R31/2874Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B45/00Circuit arrangements for operating light-emitting diodes [LED]
    • H05B45/10Controlling the intensity of the light
    • H05B45/18Controlling the intensity of the light using temperature feedback
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B45/00Circuit arrangements for operating light-emitting diodes [LED]
    • H05B45/50Circuit arrangements for operating light-emitting diodes [LED] responsive to malfunctions or undesirable behaviour of LEDs; responsive to LED life; Protective circuits
    • H05B45/56Circuit arrangements for operating light-emitting diodes [LED] responsive to malfunctions or undesirable behaviour of LEDs; responsive to LED life; Protective circuits involving measures to prevent abnormal temperature of the LEDs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P34/00Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Eye Examination Apparatus (AREA)
  • Molding Of Porous Articles (AREA)
  • Control Of Vending Devices And Auxiliary Devices For Vending Devices (AREA)
JP2018038843A 2018-03-05 2018-03-05 検査装置 Active JP7161854B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2018038843A JP7161854B2 (ja) 2018-03-05 2018-03-05 検査装置
KR1020207027249A KR102492491B1 (ko) 2018-03-05 2019-02-19 검사 장치
DE112019001139.1T DE112019001139B4 (de) 2018-03-05 2019-02-19 Testvorrichtung
PCT/JP2019/005988 WO2019171932A1 (ja) 2018-03-05 2019-02-19 検査装置
CN201980015484.8A CN111788666B (zh) 2018-03-05 2019-02-19 检查装置
US16/976,672 US11340283B2 (en) 2018-03-05 2019-02-19 Testing device
TW108106696A TWI797267B (zh) 2018-03-05 2019-02-27 檢查裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018038843A JP7161854B2 (ja) 2018-03-05 2018-03-05 検査装置

Publications (3)

Publication Number Publication Date
JP2019153717A JP2019153717A (ja) 2019-09-12
JP2019153717A5 JP2019153717A5 (https=) 2021-02-18
JP7161854B2 true JP7161854B2 (ja) 2022-10-27

Family

ID=67845653

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018038843A Active JP7161854B2 (ja) 2018-03-05 2018-03-05 検査装置

Country Status (7)

Country Link
US (1) US11340283B2 (https=)
JP (1) JP7161854B2 (https=)
KR (1) KR102492491B1 (https=)
CN (1) CN111788666B (https=)
DE (1) DE112019001139B4 (https=)
TW (1) TWI797267B (https=)
WO (1) WO2019171932A1 (https=)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7161854B2 (ja) * 2018-03-05 2022-10-27 東京エレクトロン株式会社 検査装置
JP7153556B2 (ja) * 2018-12-28 2022-10-14 東京エレクトロン株式会社 温度測定部材、検査装置及び温度測定方法
JP7398935B2 (ja) * 2019-11-25 2023-12-15 東京エレクトロン株式会社 載置台、及び、検査装置
JP7365923B2 (ja) * 2020-02-12 2023-10-20 東京エレクトロン株式会社 温度制御装置、温度制御方法、および検査装置
JP7393986B2 (ja) * 2020-03-17 2023-12-07 東京エレクトロン株式会社 載置台及び検査装置
JP7433147B2 (ja) * 2020-06-26 2024-02-19 東京エレクトロン株式会社 載置台及び検査装置
JP7455015B2 (ja) * 2020-07-14 2024-03-25 東京エレクトロン株式会社 検査装置
JP7500312B2 (ja) * 2020-07-16 2024-06-17 東京エレクトロン株式会社 検査装置及び検査装置の制御方法
JP7568360B2 (ja) * 2020-08-07 2024-10-16 東京エレクトロン株式会社 検査装置の制御方法及び検査装置
JP7449814B2 (ja) * 2020-08-12 2024-03-14 東京エレクトロン株式会社 検査方法及び検査装置
JP7479266B2 (ja) * 2020-09-25 2024-05-08 東京エレクトロン株式会社 検査装置の制御方法、及び、検査装置
JP7474678B2 (ja) * 2020-10-28 2024-04-25 東京エレクトロン株式会社 載置台、検査装置及び検査方法
JP7680303B2 (ja) * 2021-08-04 2025-05-20 株式会社ディスコ チャックテーブル
TW202534335A (zh) 2022-10-21 2025-09-01 新加坡商永科控股有限公司 用於獨立控制若干區域的熱能頭
US11796589B1 (en) 2022-10-21 2023-10-24 AEM Holdings Ltd. Thermal head for independent control of zones
US11828795B1 (en) 2022-10-21 2023-11-28 AEM Holdings Ltd. Test system with a thermal head comprising a plurality of adapters for independent thermal control of zones
US11828796B1 (en) 2023-05-02 2023-11-28 AEM Holdings Ltd. Integrated heater and temperature measurement
US12013432B1 (en) 2023-08-23 2024-06-18 Aem Singapore Pte. Ltd. Thermal control wafer with integrated heating-sensing elements
US12085609B1 (en) 2023-08-23 2024-09-10 Aem Singapore Pte. Ltd. Thermal control wafer with integrated heating-sensing elements
US12000885B1 (en) 2023-12-20 2024-06-04 Aem Singapore Pte. Ltd. Multiplexed thermal control wafer and coldplate
KR102901865B1 (ko) * 2024-12-13 2025-12-18 청주대학교 산학협력단 넓은 에너지갭을 가지는 반도체용 고온 용량-전압(c-v) 및 누설전류 측정 시스템

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004140296A (ja) 2002-10-21 2004-05-13 Tokyo Electron Ltd 被検査体を温度制御するプローブ装置及びプローブ検査方法
JP2008227435A (ja) 2006-09-05 2008-09-25 Tokyo Electron Ltd アニール装置
JP2010014421A (ja) 2008-07-01 2010-01-21 Nippon Eng Kk バーンイン装置及びその制御方法
JP2012191158A (ja) 2011-02-23 2012-10-04 Tokyo Electron Ltd マイクロ波照射装置
JP2013008752A (ja) 2011-06-22 2013-01-10 Tokyo Electron Ltd 熱処理装置及び熱処理方法
JP2015056624A (ja) 2013-09-13 2015-03-23 東京エレクトロン株式会社 基板温調装置およびそれを用いた基板処理装置
WO2017003868A1 (en) 2015-06-29 2017-01-05 Varian Semiconductor Equipment Associates, Inc. Electrostatic chuck with led heating

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2649836B2 (ja) * 1989-02-17 1997-09-03 東京エレクトロン株式会社 温調方法
JPH10135315A (ja) 1996-10-29 1998-05-22 Tokyo Electron Ltd 試料載置台の温度制御装置及び検査装置
US6891627B1 (en) * 2000-09-20 2005-05-10 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension and overlay of a specimen
US7364839B2 (en) * 2002-07-24 2008-04-29 Kabushiki Kaisha Toshiba Method for forming a pattern and substrate-processing apparatus
JP2004134674A (ja) * 2002-10-11 2004-04-30 Toshiba Corp 基板処理方法、加熱処理装置、パターン形成方法
TW200506375A (en) * 2003-05-16 2005-02-16 Tokyo Electron Ltd Inspection apparatus
KR100543754B1 (ko) * 2003-09-15 2006-01-23 현대모비스 주식회사 동력 조향장치의 조향변위 천이상태 판단방법
JP2007003409A (ja) * 2005-06-24 2007-01-11 Ushio Inc マイクロチップ検査装置
JP2007040926A (ja) * 2005-08-05 2007-02-15 Tokyo Seimitsu Co Ltd プローバ
JP4667158B2 (ja) * 2005-08-09 2011-04-06 パナソニック株式会社 ウェーハレベルバーンイン方法
JP5055756B2 (ja) * 2005-09-21 2012-10-24 東京エレクトロン株式会社 熱処理装置及び記憶媒体
JP4902986B2 (ja) * 2005-12-01 2012-03-21 株式会社東京精密 プローバ、及び、プローバのウェハステージ加熱、又は、冷却方法
US20070164426A1 (en) * 2006-01-18 2007-07-19 International Business Machines Corporation Apparatus and method for integrated circuit cooling during testing and image based analysis
JP2007315986A (ja) * 2006-05-29 2007-12-06 Sony Corp 回路検査装置および回路検査方法
JP2008060560A (ja) 2006-08-04 2008-03-13 Tokyo Electron Ltd アニール装置およびアニール方法
US8222574B2 (en) * 2007-01-15 2012-07-17 Applied Materials, Inc. Temperature measurement and control of wafer support in thermal processing chamber
US7860379B2 (en) * 2007-01-15 2010-12-28 Applied Materials, Inc. Temperature measurement and control of wafer support in thermal processing chamber
JP4949091B2 (ja) * 2007-03-16 2012-06-06 東京エレクトロン株式会社 基板処理装置、基板処理方法および記録媒体
JP4999615B2 (ja) * 2007-08-31 2012-08-15 東京エレクトロン株式会社 検査装置及び検査方法
JP5351479B2 (ja) * 2008-01-28 2013-11-27 東京エレクトロン株式会社 加熱源の冷却構造
US8404499B2 (en) * 2009-04-20 2013-03-26 Applied Materials, Inc. LED substrate processing
CN102947922B (zh) * 2010-06-23 2015-07-29 浜松光子学株式会社 使用吸附固浸透镜的吸附器的半导体器件的观察方法
TWI454722B (zh) * 2010-12-03 2014-10-01 Lextar Electronics Corp 檢測機台、檢測方法與檢測系統
JP5732941B2 (ja) * 2011-03-16 2015-06-10 東京エレクトロン株式会社 プラズマエッチング装置及びプラズマエッチング方法
MX344664B (es) 2011-05-24 2017-01-04 Deka Products Lp Sistemas y metodos de tratamiento de la sangre.
KR101783079B1 (ko) * 2011-08-26 2017-09-28 도쿄엘렉트론가부시키가이샤 액처리 장치 및 액처리 방법
JP5536136B2 (ja) * 2012-04-19 2014-07-02 株式会社九州日昌 恒温装置
JP2013257189A (ja) * 2012-06-12 2013-12-26 Tokyo Electron Ltd 温度測定装置及び処理装置
US20140270731A1 (en) * 2013-03-12 2014-09-18 Applied Materials, Inc. Thermal management apparatus for solid state light source arrays
TWI615503B (zh) * 2013-11-26 2018-02-21 Applied Materials, Inc. 用於減少快速熱處理的污染之影響的設備
JP6452449B2 (ja) * 2015-01-06 2019-01-16 東京エレクトロン株式会社 載置台及び基板処理装置
JP6655996B2 (ja) * 2016-01-19 2020-03-04 東京エレクトロン株式会社 基板温調装置及び基板処理装置
US11221358B2 (en) * 2017-03-21 2022-01-11 Tokyo Electron Limited Placement stand and electronic device inspecting apparatus
JP6955989B2 (ja) * 2017-12-13 2021-10-27 東京エレクトロン株式会社 検査装置
JP7161854B2 (ja) * 2018-03-05 2022-10-27 東京エレクトロン株式会社 検査装置
JP7361624B2 (ja) * 2020-02-12 2023-10-16 東京エレクトロン株式会社 加熱源の寿命推定システム、寿命推定方法、および検査装置
JP7365923B2 (ja) * 2020-02-12 2023-10-20 東京エレクトロン株式会社 温度制御装置、温度制御方法、および検査装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004140296A (ja) 2002-10-21 2004-05-13 Tokyo Electron Ltd 被検査体を温度制御するプローブ装置及びプローブ検査方法
JP2008227435A (ja) 2006-09-05 2008-09-25 Tokyo Electron Ltd アニール装置
JP2010014421A (ja) 2008-07-01 2010-01-21 Nippon Eng Kk バーンイン装置及びその制御方法
JP2012191158A (ja) 2011-02-23 2012-10-04 Tokyo Electron Ltd マイクロ波照射装置
JP2013008752A (ja) 2011-06-22 2013-01-10 Tokyo Electron Ltd 熱処理装置及び熱処理方法
JP2015056624A (ja) 2013-09-13 2015-03-23 東京エレクトロン株式会社 基板温調装置およびそれを用いた基板処理装置
WO2017003868A1 (en) 2015-06-29 2017-01-05 Varian Semiconductor Equipment Associates, Inc. Electrostatic chuck with led heating

Also Published As

Publication number Publication date
DE112019001139B4 (de) 2024-10-31
KR102492491B1 (ko) 2023-01-30
DE112019001139T5 (de) 2020-11-19
WO2019171932A1 (ja) 2019-09-12
US11340283B2 (en) 2022-05-24
CN111788666A (zh) 2020-10-16
TW201942993A (zh) 2019-11-01
JP2019153717A (ja) 2019-09-12
US20200408828A1 (en) 2020-12-31
CN111788666B (zh) 2024-03-15
TWI797267B (zh) 2023-04-01
KR20200123213A (ko) 2020-10-28

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