JP7160510B2 - Nd-Fe-B系焼結磁性体の製造方法 - Google Patents
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Description
(ステップa)Nd-Fe-B系合金原料を溶錬し、ストリップキャスト法によってNd-Fe-B系合金薄片を作成し、これを水素処理炉内に置き、水素吸着処理及び高温脱水素化処理を行い、その後ジェットミルによってNd-Fe-B系合金粉末を製造し、
(ステップb)Nd-Fe-B系合金粉末の表面に、蒸着めっき法により、R金属層を堆積させ、次にM金属層を堆積させ、最後にH-L金属層又はH-H金属層を堆積させてRx+My+(H-L)z/(H-H)zからなる三金属層を形成し、前記RはTb/Dyの少なくとも一つであり、前記MはW/Mo/Ti/Zr/Nbの少なくとも一つであり、前記HはPr/Nd/La/Ceの少なくとも一つであり、前記LはCu/Al/Gaのいずれか一つであり、
前記R金属層の厚さxは1~50nm、前記M金属層の厚さyは1~20nm、前記H-H金属層又は前記H-L金属層の厚さzは1~100nmであり、
(ステップc)前記三金属層を堆積した前記Nd-Fe-B系合金粉末を、所定の金型を用いて成形し、磁場配向圧縮、冷間等方圧プレス、真空焼結、時効処理を行う、ことを特徴とする。
溶錬する成分は、Nd:24.5質量%、Pr:6.15質量%、AL:0.2質量%、Co:1.48質量%、Cu:0.15質量%、Ga:0.2質量%、B:0.94質量%、残りの成分はFeである。マスター合金のストリップキャスト薄片を水素粉砕した後、紛体材料に合金の総重量の1%の専用酸化防止剤及び0.2%の潤滑剤を添加し、十分に混合し、ジェットミルに入れて更に粉砕する。
平均粒子径2μmのNd-Fe-B系合金粉末を用い、比較例1-1、比較例1-2、実施例1の3つのNd-Fe-B系磁性体を作成した。
平均粒子径3μmのNd-Fe-B系合金粉末を用い、比較例2-1、比較例2-2、実施例2の3つのNd-Fe-B系合金粉末を作成した。
平均粒子径4.1μmのNd-Fe-B系合金粉末を用い、比較例3-1、比較例3-2、実施例3の3つのNd-Fe-B系合金粉末を作成した。
平均粒子径5μmのNd-Fe-B系合金粉末を用い、比較例4-1、比較例4-2、実施例4に係るNd-Fe-B系合金粉末を作成した。
平均粒子径5.3μmのNd-Fe-B系合金粉末を用い、比較例5-1、比較例5-2、実施例5に係るNd-Fe-B系合金粉末を作成した。
平均粒子径6μmのNd-Fe-B系合金粉末を用い、比較例6-1、比較例6-2、実施例6に係るNd-Fe-B系合金粉末を作成した。
2 R金属層
3 M金属層
4 H-L金属層又はH-H金属層
Claims (6)
- Nd-Fe-B系焼結磁性体の製造方法であって、
(ステップa)Nd-Fe-B系合金原料を溶錬し、ストリップキャスト法によってNd-Fe-B系合金薄片を作成し、これを水素処理炉内に置き、水素吸着処理及び高温脱水素化処理を行い、その後ジェットミルによってNd-Fe-B系合金粉末を製造し、
(ステップb)Nd-Fe-B系合金粉末の表面に、蒸着めっき法により、R金属層を堆積させ、次にM金属層を堆積させ、最後にH-L金属層又はH-H金属層を堆積させてRx+My+(H-L)z/(H-H)zからなる三金属層を形成し、前記RはTb/Dyの少なくとも一つであり、前記MはW/Mo/Ti/Zr/Nbの少なくとも一つであり、前記HはPr/Nd/La/Ceの少なくとも一つであり、前記LはCu/Al/Gaのいずれか一つであり、
前記R金属層の厚さxは1~50nm、前記M金属層の厚さyは1~20nm、前記H-H金属層又は前記H-L金属層の厚さzは1~100nmであり、
(ステップc)前記三金属層を堆積した前記Nd-Fe-B系合金粉末を、所定の金型を用いて成形し、磁場配向圧縮、冷間等方圧プレス、真空焼結、時効処理を行う、
ことを特徴とするNd-Fe-B系焼結磁性体の製造方法 - 前記Nd-Fe-B系合金粉末の粒子径は2~6μmである、
ことを特徴とする請求項1に記載のNd-Fe-B系焼結磁性体の製造方法。 - より好ましくは前記R金属層の厚さxは5~30nm、前記M金属層の厚さyは5~15nm、前記H-H金属層又は前記H-L金属層の厚さzは10~40nmである、
ことを特徴とする請求項1又は2に記載のNd-Fe-B系焼結磁性体の製造方法。 - 前記H-H金属層又は前記H-L金属層の厚さz≧前記M金属層の厚さyである、
ことを特徴とする請求項1ないし3のいずれか1項に記載のd-Fe-B系焼結磁性体の製造方法。 - 前記蒸着めっき法はマグネトロンスパッタリング法である、
ことを特徴とする請求項1ないし4のいずれか1項に記載のNd-Fe-B系焼結磁性体の製造方法。 - 前記真空焼結における焼結温度は1000℃~1150℃、焼結時間は2~10時間である、
ことを特徴とする請求項1ないし5のいずれか1項に記載のNd-Fe-B系焼結磁性体の製造方法。
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