JP7154860B2 - ウエーハの加工方法 - Google Patents
ウエーハの加工方法 Download PDFInfo
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- JP7154860B2 JP7154860B2 JP2018143321A JP2018143321A JP7154860B2 JP 7154860 B2 JP7154860 B2 JP 7154860B2 JP 2018143321 A JP2018143321 A JP 2018143321A JP 2018143321 A JP2018143321 A JP 2018143321A JP 7154860 B2 JP7154860 B2 JP 7154860B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23D—PLANING; SLOTTING; SHEARING; BROACHING; SAWING; FILING; SCRAPING; LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOT OTHERWISE PROVIDED FOR
- B23D79/00—Methods, machines, or devices not covered elsewhere, for working metal by removal of material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
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- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
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- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
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- H01L21/76886—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
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Description
ウエーハ10に切削溝形成工程を施すべく、図1に示すダイシング装置20(一部のみ示す。)の保持テーブル21にウエーハ10を搬送し、ウエーハ10の裏面10b側を保持テーブル21の吸着チャック21aに向けて載置する。保持テーブル21には、図示しない吸引手段が接続されており、該吸引手段を作動させることにより通気性を有する吸着チャック21aを介してウエーハ10を吸引保持する。
切削溝形成工程が施され、分割予定ライン14に沿って切削溝100が形成されたウエーハ10に対し、図3に示すように、ウエーハ10の表面10a側に形成されたデバイス層12を保護する保護部材として保護テープ30を配設する。保護テープ30は、ウエーハ10と同一形状のポリ塩化ビニル(PVC)からなるシート状基材の表面にアクリル樹脂系の糊剤が塗布されているものを使用することができる。保護部材配設工程は、切削溝形成工程が実施されたダイシング装置20の保持テーブル21上において実施される。このようにして、保護部材配設工程が完了したならば、改質層形成工程を実施する次工程に搬送する。
保護部材配設工程が施されたウエーハ10を保持テーブル21から搬出し、図4に示すレーザー加工装置40(一部のみ示す。)に搬送し、レーザー加工装置40に配設された保持テーブル41の吸着チャック41a上に保護テープ30側を下方に向け、すなわち、ウエーハ10の裏面10b側を上方に向けて載置する。吸着チャック41a上にウエーハ10を載置したならば、保持テーブル41に接続された図示しない吸引手段を作動して、ウエーハ10を吸引保持する。
波長 :1342nmパルスレーザー
繰り返し周波数 :60kHz
平均出力 :1W
加工送り速度 :600mm/秒
上記した改質層形成工程が完了したならば、レーザー加工装置40の保持テーブル41に接続された吸引手段の作動を停止し、全ての分割予定ライン14に沿って内部に改質層110が形成されたウエーハ10を搬出する。保持テーブル41から搬出されたウエーハ10を、図6(a)に示す研削装置50に搬送する。研削装置50に搬送されたウエーハ10を、研削装置50に配設されたチャックテーブル51に、保護シート30側を下にして載置する。チャックテーブル51には、図示しない吸引手段が接続されており、該吸引手段を作動させることにより、ウエーハ10がチャックテーブル51に吸引保持される。
上記した分割工程を経て、チャックテーブル51に吸引保持されたウエーハ10は、図7(a)から理解されるように、ウエーハ10の裏面10bが上方に露出している。本実施形態では、図7(a)に示すように、ウエーハ10を収容できる寸法に設定された開口を有する環状のフレームFを用意し、該開口よりも大きい円形のダイシングテープTの外周をフレームFに貼着し、さらに、開口の中央にチャックテーブル51に保持されたウエーハ10を位置付け、ダイシングテープTの中央にウエーハ10の裏面10bを貼着する。そして、チャックテーブル51に接続された図示しない吸引手段を停止して、チャックテーブル51からウエーハ10をフレームFと共に離脱させ、フレームFでダイシングテープTを介してウエーハ10を支持した状態とする。そして、図7(b)に示すように、フレームF、及びダイシングテープTと共にウエーハ10を反転させ、ウエーハ10の表面10aに貼着されていた保護テープ30を剥離し、フレーム支持工程が完了する。このようにすることで、切削溝100、及び分割線112によって個々のデバイスチップ13’に分割された後も、ウエーハ10の形態を維持したまま、図示しないカセットケースに収容したり、後述するピックアップ工程等を実施するピックアップ装置等に搬送したりすることができる。
上記したフレーム支持工程を実施したならば、図8に示すピックアップ装置60に搬送する。ピックアップ装置60は、昇降可能に構成されたフレーム保持部材61と、その上面部にフレームFを載置してフレームFを保持するクランプ62と、クランプ62により保持されたフレームFに装着されたウエーハ10のデバイスチップ13’どうしの間隔を拡張するための少なくとも上方が開口した円筒形状からなる拡張ドラム63と、拡張ドラム63を囲むように設置された複数のエアシリンダ64a及びエアシリンダ64aから延びるピストンロッド64bから構成される支持手段64と、ピックアップコレット65と、を備えている。ピックアップコレット65には図示しない吸引手段が接続されている。
11:半導体基板
12:デバイス層
13:デバイス
14:分割予定ライン
20:ダイシング装置
21:保持テーブル
22:スピンドルユニット
23:回転スピンドル
24:切削ブレード
25:切削水供給手段
30:保護テープ(保護部材)
40:レーザー加工装置
41:保持テーブル
42:レーザー光線照射手段
50:研削装置
51:チャックテーブル
52:研削手段
521:回転スピンドル
523:研削ホイール
524:研削砥石
60:ピックアップ装置
100:切削溝
110:改質層
112:分割線
Claims (3)
- 半導体基板の表面にデバイス層が積層され複数のデバイスが分割予定ラインによって区画されて形成された表面を有するウエーハを個々のデバイスチップに分割するウエーハの加工方法であって、
ウエーハの表面に切削ブレードを位置付けて分割予定ラインに積層されたデバイス層の一部を残す切込み深さで切削して切削溝を形成する切削溝形成工程と、
ウエーハの裏面から半導体基板に対して透過性を有する波長のレーザー光線の集光点を分割予定ラインに対応する半導体基板の内部に位置付けて照射し、分割予定ラインに沿って改質層を連続して形成する改質層形成工程と、
該改質層形成工程の前、又は後にウエーハの表面に保護部材を配設する保護部材配設工程と、
該ウエーハの保護部材側をチャックテーブルに保持し、ウエーハの裏面を研削してウエーハを薄化すると共に、分割予定ラインの内部に形成された改質層からクラックを表面側に成長させてウエーハを個々のデバイスチップに分割する分割工程と、
から少なくとも構成されるウエーハの加工方法。 - 該分割工程の後、ウエーハの裏面にダイシングテープを貼着すると共に、ウエーハを収容する開口を有するフレームでダイシングテープを介してウエーハを支持すると共に、ウエーハの表面から保護部材を剥離するフレーム支持工程が含まれる請求項1に記載のウエーハの加工方法。
- 該フレーム支持工程の後、該ダイシングテープを拡張し、デバイスチップの間隔を広げデバイスチップをピックアップするピックアップ工程が含まれる、請求項2に記載のウエーハの加工方法。
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