JP7093354B2 - 超接合(Super-Junction:SJ)デバイスのエッジ終端のためのシステムおよび方法 - Google Patents
超接合(Super-Junction:SJ)デバイスのエッジ終端のためのシステムおよび方法 Download PDFInfo
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Description
Claims (14)
- 第1導電型を有する基板層と、
前記基板層上に配置され、活性領域に隣接して配置された終端領域を含む1つ以上のエピタキシャル(エピ)層と、を含み、前記活性領域は、それぞれ第1の幅を有する前記第1導電型の垂直電荷バランスピラーと、それぞれが第2の幅を有する第2導電型の電荷バランスピラーと、を含み、前記終端領域は、
前記第1導電型および前記第2導電型の複数の垂直ピラーであって、前記活性領域から外側に向かって移動するにつれて、各々の連続する垂直ピラーのそれぞれの幅が同じかまたはそれより小さい前記複数の垂直ピラーと、
前記第1導電型の各垂直ピラーの第1側面と前記第2導電型の各垂直ピラーの第1側面との間に直接配置された複数の補償領域と、を含み、前記活性領域から外側に向かって移動するにつれて、前記複数の補償領域の各々の連続する補償領域のそれぞれの幅は同じかそれ以上であり、
前記終端領域において、複数のエピドープ領域が前記第1導電型の各垂直ピラーの第2側面と前記第2導電型の各垂直ピラーの第2側面とを分離するとともに、前記活性領域から外側に移動するにつれて、前記複数のエピドープ領域のそれぞれの幅が大きくなる、
半導体超接合(SJ)デバイス。 - 前記第1の幅および前記第2の幅は実質的に等しく、約2マイクロメートル(μm)から10μmの間である、請求項1に記載の半導体超接合デバイス。
- 前記1つ以上のエピ層の各々は、約4μmから12μmの間の厚さを有する、請求項1に記載の半導体超接合デバイス。
- 前記活性領域内の前記第1導電型の前記複数の垂直電荷バランスピラーと前記終端領域内の前記第1導電型の前記複数の垂直ピラーとのドーピング濃度は、前記1つ以上のエピ層のエピドーピング濃度よりも5倍(5×)高い、請求項1に記載の半導体超接合デバイス。
- 前記活性領域内の前記第1導電型の前記垂直電荷バランスピラーの各々の幅は、約2μmから10μmの間である、請求項1に記載の半導体超接合デバイス。
- 前記活性領域内の前記第2導電型の前記垂直電荷バランスピラーの各々の幅は、約2μmから10μmの間である、請求項1に記載の半導体超接合デバイス。
- 前記活性領域内における前記第1導電型の前記垂直電荷バランスピラーおよび前記終端領域内における前記第1導電型の前記垂直ピラーのドーピング濃度の、前記活性領域内における前記第2導電型の前記垂直電荷バランスピラーおよび前記終端領域内における前記第2導電型の前記垂直ピラーのドーピング濃度に対する比は、0.8以上1.2以下である、請求項1に記載の半導体超接合デバイス。
- 前記1つ以上のエピ層が前記第1導電型を有するとともに、前記複数の補償領域におけるドーピング濃度が、前記1つ以上のエピ層のエピドーピング濃度に前記第1導電型の前記垂直電荷バランスピラーにおけるドーピング濃度を加えるとともに、前記第2導電型の前記垂直電荷バランスピラーにおけるドーピング濃度を引いたものに等しい、請求項1に記載の半導体超接合デバイス。
- 前記1つ以上のエピ層が前記第2導電型を有するとともに、前記複数の補償領域におけるドーピング濃度が、前記1つ以上のエピ層のエピドーピング濃度から前記第1導電型の前記垂直電荷バランスピラーにおけるドーピング濃度を引くとともに、前記第2導電型の前記垂直電荷バランスピラーにおけるドーピング濃度を加えたものに等しい、請求項1に記載の半導体超接合デバイス。
- 前記第1導電型の前記垂直電荷バランスピラーのドーパント濃度と前記第1の幅との乗算積は、約2×10-13cm-2 未満であり、前記第2導電型の前記垂直電荷バランスピラーのドーパント濃度と前記第2の幅との乗算積は、約2×10-13cm-2 未満である、請求項1に記載の半導体超接合デバイス。
- 前記1つ以上のエピ層が前記基板層上に配置されるとともに、前記1つ以上のエピ層上にエピデバイス層が配置されており、前記エピデバイス層は前記第2導電型の複数の注入ブロックまたは連続層を含む傾斜型またはマルチゾーン接合終端拡張(JTE)を含む、請求項1に記載の半導体超接合デバイス。
- 前記半導体超接合デバイスは、超接合金属酸化膜半導体電界効果トランジスタ(SJ-MOSFET)、超接合接合電界効果トランジスタ(SJ-JFET)、超接合バイポーラ接合トランジスタ(SJ-BJT)、または超接合ダイオードである、請求項1に記載の半導体超接合デバイス。
- 前記1つ以上のエピ層が単一のエピ層を含むとともに前記半導体超接合デバイスの定格が600ボルト(V)から1700Vの間である、または、前記1つ以上のエピ層が2つのエピ層を含むとともに前記半導体超接合デバイスの定格が1.5キロボルト(kV)から3kVの間である、または前記1つ以上のエピ層が3つのエピ層を含むとともに前記半導体超接合デバイスの定格が2kVから5kVの間である、または前記1つ以上のエピ層が4つのエピ層を含むとともに前記半導体超接合デバイスの定格が3kVから10kVである、請求項1に記載の半導体超接合デバイス。
- 前記半導体超接合デバイスは、炭化ケイ素(SiC)、窒化ガリウム(GaN)、窒化アルミニウム(AlN)、または窒化ホウ素(BN)を含むワイドバンドギャップ半導体デバイスである、請求項1に記載の半導体超接合デバイス。
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