JP7086080B2 - 酸化物焼結体およびスパッタリングターゲット - Google Patents

酸化物焼結体およびスパッタリングターゲット Download PDF

Info

Publication number
JP7086080B2
JP7086080B2 JP2019535024A JP2019535024A JP7086080B2 JP 7086080 B2 JP7086080 B2 JP 7086080B2 JP 2019535024 A JP2019535024 A JP 2019535024A JP 2019535024 A JP2019535024 A JP 2019535024A JP 7086080 B2 JP7086080 B2 JP 7086080B2
Authority
JP
Japan
Prior art keywords
mass
sintered body
oxide sintered
transparent conductive
sputtering target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2019535024A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2019031105A1 (ja
Inventor
謙士 松元
雅樹 井上
信一郎 中村
智泰 矢野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Mining and Smelting Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Publication of JPWO2019031105A1 publication Critical patent/JPWO2019031105A1/ja
Application granted granted Critical
Publication of JP7086080B2 publication Critical patent/JP7086080B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/46—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/74—Physical characteristics
    • C04B2235/77—Density

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Structural Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
JP2019535024A 2017-08-08 2018-07-02 酸化物焼結体およびスパッタリングターゲット Active JP7086080B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017153043 2017-08-08
JP2017153043 2017-08-08
PCT/JP2018/025106 WO2019031105A1 (ja) 2017-08-08 2018-07-02 酸化物焼結体およびスパッタリングターゲット

Publications (2)

Publication Number Publication Date
JPWO2019031105A1 JPWO2019031105A1 (ja) 2020-07-09
JP7086080B2 true JP7086080B2 (ja) 2022-06-17

Family

ID=65271197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019535024A Active JP7086080B2 (ja) 2017-08-08 2018-07-02 酸化物焼結体およびスパッタリングターゲット

Country Status (5)

Country Link
JP (1) JP7086080B2 (zh)
KR (1) KR102375637B1 (zh)
CN (1) CN110741106A (zh)
TW (1) TWI778100B (zh)
WO (1) WO2019031105A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7214063B1 (ja) * 2021-12-28 2023-01-27 三井金属鉱業株式会社 酸化物焼結体及びその製造方法、並びにスパッタリングターゲット材
CN114620996A (zh) * 2022-02-23 2022-06-14 洛阳晶联光电材料有限责任公司 一种高效太阳能电池用旋转陶瓷靶材

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012246570A (ja) 2012-07-06 2012-12-13 Nitto Denko Corp 透明導電性フィルム、その製造方法及びそれを備えたタッチパネル
JP2017071850A (ja) 2014-05-20 2017-04-13 日東電工株式会社 透明導電性フィルム

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5726752B2 (zh) 1974-09-17 1982-06-07
JPH04277408A (ja) 1991-03-01 1992-10-02 Kojundo Chem Lab Co Ltd 透明電極
JP3827334B2 (ja) * 1993-08-11 2006-09-27 東ソー株式会社 Ｉｔｏ焼結体及びスパッタリングターゲット
JPH09262926A (ja) * 1996-03-27 1997-10-07 Teijin Ltd タッチパネル用透明導電積層体及びその製造方法
JP3629333B2 (ja) * 1996-03-27 2005-03-16 帝人株式会社 タッチパネル用透明導電積層体及びその製造方法
JP2000238178A (ja) * 1999-02-24 2000-09-05 Teijin Ltd 透明導電積層体
KR100744017B1 (ko) * 2001-06-26 2007-07-30 미츠이 긴조쿠 고교 가부시키가이샤 고저항 투명 도전막용 스퍼터링 타겟 및 고저항 투명도전막의 제조방법
JP3785109B2 (ja) * 2002-04-08 2006-06-14 日東電工株式会社 透明導電積層体の製造方法
CN102666909B (zh) * 2009-11-19 2016-06-22 株式会社爱发科 透明导电膜的制造方法、透明导电膜的制造装置、溅射靶及透明导电膜
JP5301021B2 (ja) * 2011-09-06 2013-09-25 出光興産株式会社 スパッタリングターゲット
JP6261987B2 (ja) * 2013-01-16 2018-01-17 日東電工株式会社 透明導電フィルムおよびその製造方法
CN103510047A (zh) * 2013-10-21 2014-01-15 研创应用材料（赣州）有限公司 一种制备新型导电氧化铟锡材料及其薄膜的方法
CN105659198B (zh) * 2014-04-30 2019-06-18 日东电工株式会社 透明导电性薄膜
JP5876172B1 (ja) * 2014-10-06 2016-03-02 Ｊｘ金属株式会社 酸化物焼結体、酸化物スパッタリングターゲット及び導電性酸化物薄膜並びに酸化物焼結体の製造方法
JP5735190B1 (ja) * 2015-01-22 2015-06-17 Jx日鉱日石金属株式会社 酸化物焼結体、スパッタリングターゲット及び酸化物薄膜

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012246570A (ja) 2012-07-06 2012-12-13 Nitto Denko Corp 透明導電性フィルム、その製造方法及びそれを備えたタッチパネル
JP2017071850A (ja) 2014-05-20 2017-04-13 日東電工株式会社 透明導電性フィルム

Also Published As

Publication number Publication date
WO2019031105A1 (ja) 2019-02-14
KR102375637B1 (ko) 2022-03-17
TW201910539A (zh) 2019-03-16
JPWO2019031105A1 (ja) 2020-07-09
KR20200008583A (ko) 2020-01-28
CN110741106A (zh) 2020-01-31
TWI778100B (zh) 2022-09-21

Similar Documents

Publication Publication Date Title
JP6278229B2 (ja) 透明酸化物膜形成用スパッタリングターゲット及びその製造方法
JP6621422B2 (ja) 透明アルミナ焼結体の製法
JP7086080B2 (ja) 酸化物焼結体およびスパッタリングターゲット
JP2006022373A (ja) 透明導電性薄膜作製用スパッタリングターゲットの製造方法
TWI592383B (zh) 氧化銦系氧化物燒結體及其製造方法
JP6267297B1 (ja) 焼結体、スパッタリングターゲット及びその製造方法
JP6677058B2 (ja) Ｓｎ−Ｚｎ−Ｏ系酸化物焼結体とその製造方法
JP6453528B1 (ja) 透明導電膜用スパッタリングターゲット
JP6582698B2 (ja) 酸化物焼結体及びスパッタリングターゲット
WO2020044798A1 (ja) 酸化物スパッタリングターゲット、及び、酸化物スパッタリングターゲットの製造方法
JP6453990B2 (ja) 焼結体、スパッタリングターゲット及びその製造方法
JP6885038B2 (ja) 酸化物焼結体、その製造方法及びスパッタリングターゲット
JP7203088B2 (ja) 酸化物焼結体、スパッタリングターゲットおよび透明導電膜
WO2021111970A1 (ja) 酸化物スパッタリングターゲット、及び、酸化物スパッタリングターゲットの製造方法
JP6520523B2 (ja) 酸化物焼結体、その製造方法及びスパッタリングターゲット
JP6722736B2 (ja) 焼結体および、スパッタリングターゲット
JP6155919B2 (ja) 複合酸化物焼結体及び酸化物透明導電膜
KR20170142169A (ko) Ito 스퍼터링 타깃재
WO2015020029A1 (ja) スパッタリングターゲット及びその製造方法
WO2021112006A1 (ja) 酸化物スパッタリングターゲット、及び、酸化物スパッタリングターゲットの製造方法
JP2021091963A (ja) 酸化物スパッタリングターゲット、及び、酸化物スパッタリングターゲットの製造方法
JP2007238365A (ja) 酸化物焼結体及びその製造方法並びにスパッタリングターゲット及び透明導電膜
JP2023124649A (ja) スパッタリングターゲット部材及びスパッタリングターゲット部材の製造方法
WO2017183263A1 (ja) 酸化物焼結体およびスパッタリングターゲット、並びにそれらの製造方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20210415

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220118

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220318

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20220531

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20220607

R150 Certificate of patent or registration of utility model

Ref document number: 7086080

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150