JP7045360B2 - プラズマ原子層蒸着法を用いたシリコン窒化薄膜の製造方法 - Google Patents
プラズマ原子層蒸着法を用いたシリコン窒化薄膜の製造方法 Download PDFInfo
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Description
(前記化学式1、2、および3中、
R1~R3、R11~R17、およびR21~R24は、それぞれ独立して、水素、(C1‐C5)アルキルまたは(C2‐C5)アルケニルであり;
nおよびmは、それぞれ独立して、0~3の整数であり、
pは1~3の整数である。)
(前記化学式1、2、および3中、
R1~R3、R11~R17、およびR21~R24は、それぞれ独立して、水素、(C1‐C5)アルキルまたは(C2‐C5)アルケニルであり;
nおよびmは、それぞれ独立して、0~3の整数であり、
pは1~3の整数である。)
プラズマ強化原子層蒸着法(PEALD)を用いる通常のプラズマ強化原子層蒸着(PEALD)装置で、シリコンウエハ基板(Si wafer)に窒素(N2)を5sccmの流量とし、94℃に加熱されたビス(ジメチルアミノメチルシリル)トリメチルシリルアミンを15秒間注入して基板上に吸着させることで、化学吸着された層を形成した後、窒素(N2)を6000sccmの流量で32秒間注入してパージした。前記基板に、窒素(N2)とアンモニア(NH3)が120:1の流量比(sccm:sccm)で混合されたガスを30秒間注入しながら、75Wパワーのプラズマを発生させて化学吸着された層と反応させた後、窒素(N2)を6000sccmの流量で10秒間注入してパージした。前記基板に、窒素(N2)を6000sccmの流量で60秒間注入しながら、75Wパワーのプラズマを発生させて1つ以上の反応サイトを形成させた後、窒素(N2)を6000sccmの流量で20秒間注入してパージした。
前記実施例1の方法と同様に行い、この際、下記表1に記載の具体的な蒸着条件に従って、単位サイクルを240回繰り返して行うことでシリコン窒化薄膜を製造した。
プラズマ強化原子層蒸着法(PEALD)を用いる通常のプラズマ強化原子層蒸着(PEALD)装置で、シリコンウエハ基板(Si wafer)を用いて、下記表2の蒸着条件を単位サイクル(1 cycle)として240回繰り返して行うことで、シリコン窒化薄膜を製造した。
Claims (12)
- 基板上に、シリコン‐窒素結合を含む有機シリコン前駆体を吸着させるステップと、
第1反応ガスを注入しながら第1プラズマを励起させた後、第2反応ガスを注入しながら第2プラズマを励起させることで、1つ以上の反応性サイトを提供するステップと、を含む単位サイクルを少なくとも1回以上行う、プラズマ強化原子層蒸着によるシリコン窒化薄膜の製造方法であって、
前記シリコン窒化薄膜は、赤外線分光法によるシリコン‐窒素結合/シリコン‐水素結合の吸収面積比(Si‐N結合/Si‐H結合)が90以上である、プラズマ強化原子層蒸着によるシリコン窒化薄膜の製造方法。 - 前記第1反応ガスが、窒素ガスおよび水素化ガスを混合したものである、請求項1に記載のプラズマ強化原子層蒸着によるシリコン窒化薄膜の製造方法。
- 前記水素化ガスが、水素、アンモニア、およびヒドラジンから選択されるものである、請求項2に記載のプラズマ強化原子層蒸着によるシリコン窒化薄膜の製造方法。
- 前記第1反応ガスが、窒素ガスと水素化ガスを300:1~1:1の流量比で混合したものである、請求項3に記載のプラズマ強化原子層蒸着によるシリコン窒化薄膜の製造方法。
- 前記第2反応ガスが窒素ガスである、請求項1に記載のプラズマ強化原子層蒸着によるシリコン窒化薄膜の製造方法。
- 前記第1プラズマおよび前記第2プラズマが500W以下のパワーで励起される、請求項1に記載のプラズマ強化原子層蒸着によるシリコン窒化薄膜の製造方法。
- 前記基板の温度が50~400℃の範囲である、請求項6に記載のプラズマ強化原子層蒸着によるシリコン窒化薄膜の製造方法。
- 前記シリコン窒化薄膜は、酸素元素の含量が10原子%以下である、請求項1に記載のプラズマ強化原子層蒸着によるシリコン窒化薄膜の製造方法。
- 酸素元素の含量が10原子%以下であり、赤外線分光法によるシリコン‐窒素結合/シリコン‐水素結合の吸収面積比(Si‐N結合/Si‐H結合)が90以上である、シリコン窒化薄膜。
- ステップカバレッジが80%以上である、請求項11に記載のシリコン窒化薄膜。
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CN114245832A (zh) * | 2019-06-07 | 2022-03-25 | 朗姆研究公司 | 原子层沉积期间的膜特性的原位控制 |
CN112626501A (zh) * | 2019-10-09 | 2021-04-09 | 长鑫存储技术有限公司 | 等离子体沉积薄膜杂质含量的改善方法及控制装置 |
WO2021153986A1 (ko) * | 2020-01-31 | 2021-08-05 | 주식회사 유피케미칼 | 실리콘 전구체 화합물, 이를 포함하는 실리콘-함유 막 형성용 조성물 및 실리콘-함유 막 형성 방법 |
CN113517170B (zh) * | 2021-07-09 | 2024-02-09 | 长鑫存储技术有限公司 | 半导体结构的制造方法、半导体结构与存储器 |
WO2023287192A1 (ko) * | 2021-07-16 | 2023-01-19 | 주식회사 유피케미칼 | 실리콘 전구체 화합물, 이를 포함하는 실리콘-함유 막 형성용 조성물, 및 실리콘-함유 막 형성용 조성물을 이용한 막 형성 방법 |
CN113818010A (zh) * | 2021-10-26 | 2021-12-21 | 华中科技大学 | 有机聚合物材料的改性方法和改性有机聚合物材料 |
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JP2015165549A (ja) | 2014-02-10 | 2015-09-17 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
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US20190249296A1 (en) | 2019-08-15 |
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