JP6978318B2 - 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 - Google Patents

表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 Download PDF

Info

Publication number
JP6978318B2
JP6978318B2 JP2017543930A JP2017543930A JP6978318B2 JP 6978318 B2 JP6978318 B2 JP 6978318B2 JP 2017543930 A JP2017543930 A JP 2017543930A JP 2017543930 A JP2017543930 A JP 2017543930A JP 6978318 B2 JP6978318 B2 JP 6978318B2
Authority
JP
Japan
Prior art keywords
integer
group
block copolymer
block
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017543930A
Other languages
English (en)
Japanese (ja)
Other versions
JP2018507301A (ja
JP2018507301A5 (https=
Inventor
ヴォラ・アンキット
衣梨 平原
チェン・ジョイ
バスカラン・ドゥライラジュ
ポリッシュチャック・オレスト
ティジョー・メリア
ポーネシュ・マーガレッタ
サンダーズ・ダニエル
リン・グァンヤン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Merck Patent GmbH
International Business Machines Corp
Original Assignee
Merck Patent GmbH
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent GmbH, International Business Machines Corp filed Critical Merck Patent GmbH
Publication of JP2018507301A publication Critical patent/JP2018507301A/ja
Publication of JP2018507301A5 publication Critical patent/JP2018507301A5/ja
Priority to JP2021076132A priority Critical patent/JP7089618B2/ja
Application granted granted Critical
Publication of JP6978318B2 publication Critical patent/JP6978318B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/0427—Coating with only one layer of a composition containing a polymer binder
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/06—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from hydroxycarboxylic acids
    • C08G63/08—Lactones or lactides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/64—Polyesters containing both carboxylic ester groups and carbonate groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
    • C08G64/02—Aliphatic polycarbonates
    • C08G64/0208—Aliphatic polycarbonates saturated
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D167/04—Polyesters derived from hydroxycarboxylic acids, e.g. lactones
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D169/00—Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D169/00—Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates
    • C09D169/005—Polyester-carbonates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D187/00—Coating compositions based on unspecified macromolecular compounds, obtained otherwise than by polymerisation reactions only involving unsaturated carbon-to-carbon bonds
    • C09D187/005—Block or graft polymers not provided for in groups C09D101/00 - C09D185/04
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/04—Polyesters derived from hydroxy carboxylic acids, e.g. lactones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2369/00—Characterised by the use of polycarbonates; Derivatives of polycarbonates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Inorganic Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Laminated Bodies (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polyethers (AREA)
  • Polyesters Or Polycarbonates (AREA)
JP2017543930A 2015-02-20 2016-02-18 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 Active JP6978318B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2021076132A JP7089618B2 (ja) 2015-02-20 2021-04-28 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/628,002 2015-02-20
US14/628,002 US10259907B2 (en) 2015-02-20 2015-02-20 Block copolymers with surface-active junction groups, compositions and processes thereof
PCT/EP2016/053415 WO2016131900A1 (en) 2015-02-20 2016-02-18 Block copolymers with surface-active junction groups, compositions and processes thereof

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2021076132A Division JP7089618B2 (ja) 2015-02-20 2021-04-28 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法

Publications (3)

Publication Number Publication Date
JP2018507301A JP2018507301A (ja) 2018-03-15
JP2018507301A5 JP2018507301A5 (https=) 2020-10-15
JP6978318B2 true JP6978318B2 (ja) 2021-12-08

Family

ID=55443232

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2017543930A Active JP6978318B2 (ja) 2015-02-20 2016-02-18 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法
JP2021076132A Active JP7089618B2 (ja) 2015-02-20 2021-04-28 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2021076132A Active JP7089618B2 (ja) 2015-02-20 2021-04-28 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法

Country Status (9)

Country Link
US (1) US10259907B2 (https=)
EP (1) EP3259292B1 (https=)
JP (2) JP6978318B2 (https=)
KR (1) KR102327569B1 (https=)
CN (1) CN107257813B (https=)
IL (1) IL253371A0 (https=)
SG (1) SG11201705648TA (https=)
TW (1) TWI713494B (https=)
WO (1) WO2016131900A1 (https=)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017014145A1 (ja) * 2015-07-23 2017-01-26 Dic株式会社 含フッ素化合物、リビング重合開始剤、含フッ素重合体、含フッ素重合体の製造方法及びレジスト組成物
US9982097B2 (en) * 2016-02-11 2018-05-29 International Business Machines Corporation Thin film self assembly of topcoat-free silicon-containing diblock copolymers
TW201800434A (zh) * 2016-02-22 2018-01-01 Ａｚ電子材料（盧森堡）股份有限公司 具有線性表面活性接合基團之嵌段共聚物及其組合物與製法
US9768059B1 (en) * 2016-04-07 2017-09-19 International Business Machines Corporation High-chi block copolymers for interconnect structures by directed self-assembly
JP2018082033A (ja) 2016-11-16 2018-05-24 東芝メモリ株式会社 パターン形成方法
WO2018112121A1 (en) * 2016-12-14 2018-06-21 Brewer Science Inc. High-chi block copolymers for directed self-assembly
CN108227412A (zh) * 2016-12-15 2018-06-29 Imec 非营利协会 光刻掩模层
US10082736B2 (en) * 2017-01-13 2018-09-25 International Business Machines Corporation Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning
TWI805617B (zh) 2017-09-15 2023-06-21 南韓商Ｌｇ化學股份有限公司 層壓板
JP2019099749A (ja) 2017-12-06 2019-06-24 東芝メモリ株式会社 パターン形成方法、ブロックコポリマー、及びパターン形成材料
US10656527B2 (en) * 2017-12-21 2020-05-19 International Business Machines Corporation Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer
WO2019131953A1 (ja) * 2017-12-27 2019-07-04 Jsr株式会社 パターン形成方法及び感放射線性組成物
KR102136470B1 (ko) * 2018-12-24 2020-07-22 (주)서영 기판과 평행방향으로 자기조립된 실린더 블록공중합체를 이용한 대면적 나노패턴 제조 방법
WO2020179918A1 (ja) * 2019-03-06 2020-09-10 Jsr株式会社 基板の製造方法及びブロック共重合体
FR3105786A1 (fr) * 2019-12-31 2021-07-02 Arkema France Procédé de nanostructuration d’un substrat
EP4263643A1 (en) 2020-12-17 2023-10-25 Merck Patent GmbH Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof
TW202302684A (zh) * 2021-04-23 2023-01-16 德商馬克專利公司 用於定向自組裝應用之具有強化動力的可容許多間距之嵌段共聚物
KR20240064273A (ko) * 2022-11-04 2024-05-13 주식회사 엘지화학 불소계 화합물, 광중합성 조성물, 홀로그램 기록 매체, 이의 제조 방법 및 이를 포함하는 광학 소자
US12582017B2 (en) 2023-01-31 2026-03-17 Tokyo Electron Limited Bonding layer and process
JP2025002574A (ja) * 2023-06-22 2025-01-09 東京応化工業株式会社 ブロックコポリマー、下地剤、相分離構造形成用組成物成用樹脂組成物、及び相分離構造を含む構造体の製造方法
WO2026041747A1 (en) 2024-08-22 2026-02-26 Merck Patent Gmbh Carbon and silicone enriched new high-chi block copolymers of novel architectures for thin-film self-assembly applications

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5187244A (en) * 1988-07-22 1993-02-16 Mitsubishi Rayon Co., Ltd. Preparation process of block copolymers and resulting block copolymers
WO1993006184A1 (en) 1991-09-23 1993-04-01 Minnesota Mining And Manufacturing Company PRESSURE SENSITIVE ADHESIVE COMPOSITION WHICH IS REPULPABLE UNDER ACIDIC pH CONDITIONS
US5622764A (en) 1995-06-07 1997-04-22 Minnesota Mining And Manufacturing Company Sterilization indicators and methods
JPH11322869A (ja) * 1998-05-19 1999-11-26 Jsr Corp ブロック共重合体の製造方法
NO990119D0 (no) 1999-01-12 1999-01-12 Jotun As Blokk-kopolymerer med blokker med perfluorerte sidekjeder, og fremgangsmÕte for fremstilling derav
US8133534B2 (en) 2004-11-22 2012-03-13 Wisconsin Alumni Research Foundation Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials
US8080615B2 (en) 2007-06-19 2011-12-20 Micron Technology, Inc. Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
WO2009058180A2 (en) 2007-09-27 2009-05-07 Massachusetts Institute Of Technology Self-assembly technique applicable to large areas and nanofabrication
US7763319B2 (en) 2008-01-11 2010-07-27 International Business Machines Corporation Method of controlling orientation of domains in block copolymer films
US7989026B2 (en) 2008-01-12 2011-08-02 International Business Machines Corporation Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films
US8999492B2 (en) * 2008-02-05 2015-04-07 Micron Technology, Inc. Method to produce nanometer-sized features with directed assembly of block copolymers
US8425982B2 (en) 2008-03-21 2013-04-23 Micron Technology, Inc. Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
US8119017B2 (en) 2008-06-17 2012-02-21 Hitachi Global Storage Technologies Netherlands B.V. Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks
US9045601B2 (en) * 2009-09-10 2015-06-02 National University Corporation Gunma University Method for producing stereo complex crystals of polylactic acid, polylactic acid, and molded body, synthetic fiber, porous body and ion conductor comprising same
US8623458B2 (en) 2009-12-18 2014-01-07 International Business Machines Corporation Methods of directed self-assembly, and layered structures formed therefrom
NL2007161A (en) 2010-09-09 2012-03-12 Asml Netherlands Bv Lithography using self-assembled polymers.
US9299381B2 (en) 2011-02-07 2016-03-29 Wisconsin Alumni Research Foundation Solvent annealing block copolymers on patterned substrates
US8642086B2 (en) 2011-03-31 2014-02-04 International Business Machines Corporation Antimicrobial compositions, methods of preparation thereof, and uses thereof
WO2012144735A2 (en) * 2011-04-22 2012-10-26 Lg Chem, Ltd. Novel diblock copolymer, preparation method thereof, and method of forming nano pattern using the same
US9182673B2 (en) 2011-07-18 2015-11-10 Asml Netherlands B.V. Method for providing a template for a self-assemblable polymer for use in device lithography
JP2014531615A (ja) * 2011-09-06 2014-11-27 コーネル ユニバーシティー ブロックコポリマー及び該ブロックコポリマーを用いたリソグラフィーパターニング
NL2010004A (en) 2012-01-13 2013-07-16 Asml Netherlands Bv Self-assemblable polymer and methods for use in lithography.
US9314819B2 (en) 2012-02-10 2016-04-19 Board Of Regents, The University Of Texas System Anhydride copolymer top coats for orientation control of thin film block copolymers
WO2013119820A1 (en) 2012-02-10 2013-08-15 Board Of Regents, The University Of Texas System Polyactide/silicon-containing block copolymers for nanolithography
WO2013126238A1 (en) * 2012-02-21 2013-08-29 Dow Global Technologies Llc Composite membrane
US9127113B2 (en) 2012-05-16 2015-09-08 Rohm And Haas Electronic Materials Llc Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same
US9012545B2 (en) 2012-08-31 2015-04-21 Rohm And Haas Electronic Materials Llc Composition and method for preparing pattern on a substrate
US9382444B2 (en) 2013-06-24 2016-07-05 Dow Global Technologies Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same
US9802400B2 (en) 2013-06-24 2017-10-31 Dow Global Technologies Llc Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
US20140377465A1 (en) 2013-06-24 2014-12-25 Rohm And Haas Electronic Materials Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same
US9574107B2 (en) * 2015-02-16 2017-02-21 International Business Machines Corporation Fluoro-alcohol additives for orientation control of block copolymers

Also Published As

Publication number Publication date
IL253371A0 (en) 2017-09-28
KR20170140171A (ko) 2017-12-20
SG11201705648TA (en) 2017-08-30
TW201638125A (zh) 2016-11-01
CN107257813A (zh) 2017-10-17
WO2016131900A1 (en) 2016-08-25
CN107257813B (zh) 2020-08-21
US20160244557A1 (en) 2016-08-25
JP2021130821A (ja) 2021-09-09
EP3259292A1 (en) 2017-12-27
TWI713494B (zh) 2020-12-21
US10259907B2 (en) 2019-04-16
JP2018507301A (ja) 2018-03-15
JP7089618B2 (ja) 2022-06-22
KR102327569B1 (ko) 2021-11-17
EP3259292B1 (en) 2020-04-08

Similar Documents

Publication Publication Date Title
JP7089618B2 (ja) 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法
TWI579309B (zh) 用於導向自組裝之中性層聚合物組合物及其方法
KR101740276B1 (ko) 블럭 코폴리머 특성을 제어하는 방법 및 이로부터 제조된 제품
US9556353B2 (en) Orientation control materials for block copolymers used in directed self-assembly applications
US20160237307A1 (en) Fluoro-alcohol additives for orientation control of block copolymers
TWI832955B (zh) 在低玻璃轉移溫度（Ｔｇ）寡聚物存在下用於形成圖案的增強定向自組裝
US20160362513A1 (en) Additives for orientation control of block copolymers
JP7820296B2 (ja) 非チオールタイプ窒素系疎水性ポリマーブラシ材料及び基材表面の改質のためのそれの使用
EP3858872B1 (en) Compositions and processes for self-assembly of block copolymers
US12583961B2 (en) Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof
JP6474538B2 (ja) 新規組成物及び基材表面の変性のためのそれの使用
WO2017144385A1 (en) Block copolymers with linear surface-active junction groups, compositions and processes thereof
EP4430097A1 (en) Neutral brushes with tunable polarity for self-assembly of block copolymers with poly(styrene) and poly(methyl methacrylate) containing segments

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20190130

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20191205

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20191211

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20200226

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20200309

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20200416

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200417

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200907

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20200908

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20200908

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20210106

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210428

C60 Trial request (containing other claim documents, opposition documents)

Free format text: JAPANESE INTERMEDIATE CODE: C60

Effective date: 20210428

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20210511

C21 Notice of transfer of a case for reconsideration by examiners before appeal proceedings

Free format text: JAPANESE INTERMEDIATE CODE: C21

Effective date: 20210512

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20210616

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210806

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20211027

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20211111

R150 Certificate of patent or registration of utility model

Ref document number: 6978318

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250