JP2018507301A5 - - Google Patents
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- JP2018507301A5 JP2018507301A5 JP2017543930A JP2017543930A JP2018507301A5 JP 2018507301 A5 JP2018507301 A5 JP 2018507301A5 JP 2017543930 A JP2017543930 A JP 2017543930A JP 2017543930 A JP2017543930 A JP 2017543930A JP 2018507301 A5 JP2018507301 A5 JP 2018507301A5
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- JP
- Japan
- Prior art keywords
- integer
- alkyl
- block
- derived
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229920001400 block copolymer Polymers 0.000 claims 8
- 239000001257 hydrogen Substances 0.000 claims 8
- 229910052739 hydrogen Inorganic materials 0.000 claims 8
- 150000005676 cyclic carbonates Chemical class 0.000 claims 7
- 150000002118 epoxides Chemical class 0.000 claims 7
- 150000002596 lactones Chemical class 0.000 claims 7
- 125000005647 linker group Chemical group 0.000 claims 7
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 6
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims 6
- 150000002431 hydrogen Chemical class 0.000 claims 5
- 150000003951 lactams Chemical class 0.000 claims 5
- 239000000178 monomer Substances 0.000 claims 5
- 125000002947 alkylene group Chemical group 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical class [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 3
- 125000006736 (C6-C20) aryl group Chemical group 0.000 claims 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 2
- 229910052794 bromium Inorganic materials 0.000 claims 2
- 229910052801 chlorine Inorganic materials 0.000 claims 2
- 239000000460 chlorine Substances 0.000 claims 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims 2
- 125000005702 oxyalkylene group Chemical group 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 229920002554 vinyl polymer Polymers 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021076132A JP7089618B2 (ja) | 2015-02-20 | 2021-04-28 | 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/628,002 | 2015-02-20 | ||
| US14/628,002 US10259907B2 (en) | 2015-02-20 | 2015-02-20 | Block copolymers with surface-active junction groups, compositions and processes thereof |
| PCT/EP2016/053415 WO2016131900A1 (en) | 2015-02-20 | 2016-02-18 | Block copolymers with surface-active junction groups, compositions and processes thereof |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021076132A Division JP7089618B2 (ja) | 2015-02-20 | 2021-04-28 | 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018507301A JP2018507301A (ja) | 2018-03-15 |
| JP2018507301A5 true JP2018507301A5 (https=) | 2020-10-15 |
| JP6978318B2 JP6978318B2 (ja) | 2021-12-08 |
Family
ID=55443232
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017543930A Active JP6978318B2 (ja) | 2015-02-20 | 2016-02-18 | 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 |
| JP2021076132A Active JP7089618B2 (ja) | 2015-02-20 | 2021-04-28 | 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021076132A Active JP7089618B2 (ja) | 2015-02-20 | 2021-04-28 | 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10259907B2 (https=) |
| EP (1) | EP3259292B1 (https=) |
| JP (2) | JP6978318B2 (https=) |
| KR (1) | KR102327569B1 (https=) |
| CN (1) | CN107257813B (https=) |
| IL (1) | IL253371A0 (https=) |
| SG (1) | SG11201705648TA (https=) |
| TW (1) | TWI713494B (https=) |
| WO (1) | WO2016131900A1 (https=) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017014145A1 (ja) * | 2015-07-23 | 2017-01-26 | Dic株式会社 | 含フッ素化合物、リビング重合開始剤、含フッ素重合体、含フッ素重合体の製造方法及びレジスト組成物 |
| US9982097B2 (en) * | 2016-02-11 | 2018-05-29 | International Business Machines Corporation | Thin film self assembly of topcoat-free silicon-containing diblock copolymers |
| TW201800434A (zh) * | 2016-02-22 | 2018-01-01 | Ａｚ電子材料（盧森堡）股份有限公司 | 具有線性表面活性接合基團之嵌段共聚物及其組合物與製法 |
| US9768059B1 (en) * | 2016-04-07 | 2017-09-19 | International Business Machines Corporation | High-chi block copolymers for interconnect structures by directed self-assembly |
| JP2018082033A (ja) | 2016-11-16 | 2018-05-24 | 東芝メモリ株式会社 | パターン形成方法 |
| WO2018112121A1 (en) * | 2016-12-14 | 2018-06-21 | Brewer Science Inc. | High-chi block copolymers for directed self-assembly |
| CN108227412A (zh) * | 2016-12-15 | 2018-06-29 | Imec 非营利协会 | 光刻掩模层 |
| US10082736B2 (en) * | 2017-01-13 | 2018-09-25 | International Business Machines Corporation | Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning |
| TWI805617B (zh) | 2017-09-15 | 2023-06-21 | 南韓商Ｌｇ化學股份有限公司 | 層壓板 |
| JP2019099749A (ja) | 2017-12-06 | 2019-06-24 | 東芝メモリ株式会社 | パターン形成方法、ブロックコポリマー、及びパターン形成材料 |
| US10656527B2 (en) * | 2017-12-21 | 2020-05-19 | International Business Machines Corporation | Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer |
| WO2019131953A1 (ja) * | 2017-12-27 | 2019-07-04 | Jsr株式会社 | パターン形成方法及び感放射線性組成物 |
| KR102136470B1 (ko) * | 2018-12-24 | 2020-07-22 | (주)서영 | 기판과 평행방향으로 자기조립된 실린더 블록공중합체를 이용한 대면적 나노패턴 제조 방법 |
| WO2020179918A1 (ja) * | 2019-03-06 | 2020-09-10 | Jsr株式会社 | 基板の製造方法及びブロック共重合体 |
| FR3105786A1 (fr) * | 2019-12-31 | 2021-07-02 | Arkema France | Procédé de nanostructuration d’un substrat |
| EP4263643A1 (en) | 2020-12-17 | 2023-10-25 | Merck Patent GmbH | Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof |
| TW202302684A (zh) * | 2021-04-23 | 2023-01-16 | 德商馬克專利公司 | 用於定向自組裝應用之具有強化動力的可容許多間距之嵌段共聚物 |
| KR20240064273A (ko) * | 2022-11-04 | 2024-05-13 | 주식회사 엘지화학 | 불소계 화합물, 광중합성 조성물, 홀로그램 기록 매체, 이의 제조 방법 및 이를 포함하는 광학 소자 |
| US12582017B2 (en) | 2023-01-31 | 2026-03-17 | Tokyo Electron Limited | Bonding layer and process |
| JP2025002574A (ja) * | 2023-06-22 | 2025-01-09 | 東京応化工業株式会社 | ブロックコポリマー、下地剤、相分離構造形成用組成物成用樹脂組成物、及び相分離構造を含む構造体の製造方法 |
| WO2026041747A1 (en) | 2024-08-22 | 2026-02-26 | Merck Patent Gmbh | Carbon and silicone enriched new high-chi block copolymers of novel architectures for thin-film self-assembly applications |
Family Cites Families (31)
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|---|---|---|---|---|
| US5187244A (en) * | 1988-07-22 | 1993-02-16 | Mitsubishi Rayon Co., Ltd. | Preparation process of block copolymers and resulting block copolymers |
| WO1993006184A1 (en) | 1991-09-23 | 1993-04-01 | Minnesota Mining And Manufacturing Company | PRESSURE SENSITIVE ADHESIVE COMPOSITION WHICH IS REPULPABLE UNDER ACIDIC pH CONDITIONS |
| US5622764A (en) | 1995-06-07 | 1997-04-22 | Minnesota Mining And Manufacturing Company | Sterilization indicators and methods |
| JPH11322869A (ja) * | 1998-05-19 | 1999-11-26 | Jsr Corp | ブロック共重合体の製造方法 |
| NO990119D0 (no) | 1999-01-12 | 1999-01-12 | Jotun As | Blokk-kopolymerer med blokker med perfluorerte sidekjeder, og fremgangsmÕte for fremstilling derav |
| US8133534B2 (en) | 2004-11-22 | 2012-03-13 | Wisconsin Alumni Research Foundation | Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials |
| US8080615B2 (en) | 2007-06-19 | 2011-12-20 | Micron Technology, Inc. | Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide |
| WO2009058180A2 (en) | 2007-09-27 | 2009-05-07 | Massachusetts Institute Of Technology | Self-assembly technique applicable to large areas and nanofabrication |
| US7763319B2 (en) | 2008-01-11 | 2010-07-27 | International Business Machines Corporation | Method of controlling orientation of domains in block copolymer films |
| US7989026B2 (en) | 2008-01-12 | 2011-08-02 | International Business Machines Corporation | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films |
| US8999492B2 (en) * | 2008-02-05 | 2015-04-07 | Micron Technology, Inc. | Method to produce nanometer-sized features with directed assembly of block copolymers |
| US8425982B2 (en) | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Methods of improving long range order in self-assembly of block copolymer films with ionic liquids |
| US8119017B2 (en) | 2008-06-17 | 2012-02-21 | Hitachi Global Storage Technologies Netherlands B.V. | Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks |
| US9045601B2 (en) * | 2009-09-10 | 2015-06-02 | National University Corporation Gunma University | Method for producing stereo complex crystals of polylactic acid, polylactic acid, and molded body, synthetic fiber, porous body and ion conductor comprising same |
| US8623458B2 (en) | 2009-12-18 | 2014-01-07 | International Business Machines Corporation | Methods of directed self-assembly, and layered structures formed therefrom |
| NL2007161A (en) | 2010-09-09 | 2012-03-12 | Asml Netherlands Bv | Lithography using self-assembled polymers. |
| US9299381B2 (en) | 2011-02-07 | 2016-03-29 | Wisconsin Alumni Research Foundation | Solvent annealing block copolymers on patterned substrates |
| US8642086B2 (en) | 2011-03-31 | 2014-02-04 | International Business Machines Corporation | Antimicrobial compositions, methods of preparation thereof, and uses thereof |
| WO2012144735A2 (en) * | 2011-04-22 | 2012-10-26 | Lg Chem, Ltd. | Novel diblock copolymer, preparation method thereof, and method of forming nano pattern using the same |
| US9182673B2 (en) | 2011-07-18 | 2015-11-10 | Asml Netherlands B.V. | Method for providing a template for a self-assemblable polymer for use in device lithography |
| JP2014531615A (ja) * | 2011-09-06 | 2014-11-27 | コーネル ユニバーシティー | ブロックコポリマー及び該ブロックコポリマーを用いたリソグラフィーパターニング |
| NL2010004A (en) | 2012-01-13 | 2013-07-16 | Asml Netherlands Bv | Self-assemblable polymer and methods for use in lithography. |
| US9314819B2 (en) | 2012-02-10 | 2016-04-19 | Board Of Regents, The University Of Texas System | Anhydride copolymer top coats for orientation control of thin film block copolymers |
| WO2013119820A1 (en) | 2012-02-10 | 2013-08-15 | Board Of Regents, The University Of Texas System | Polyactide/silicon-containing block copolymers for nanolithography |
| WO2013126238A1 (en) * | 2012-02-21 | 2013-08-29 | Dow Global Technologies Llc | Composite membrane |
| US9127113B2 (en) | 2012-05-16 | 2015-09-08 | Rohm And Haas Electronic Materials Llc | Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same |
| US9012545B2 (en) | 2012-08-31 | 2015-04-21 | Rohm And Haas Electronic Materials Llc | Composition and method for preparing pattern on a substrate |
| US9382444B2 (en) | 2013-06-24 | 2016-07-05 | Dow Global Technologies Llc | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
| US9802400B2 (en) | 2013-06-24 | 2017-10-31 | Dow Global Technologies Llc | Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers |
| US20140377465A1 (en) | 2013-06-24 | 2014-12-25 | Rohm And Haas Electronic Materials Llc | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
| US9574107B2 (en) * | 2015-02-16 | 2017-02-21 | International Business Machines Corporation | Fluoro-alcohol additives for orientation control of block copolymers |
-
2015
- 2015-02-20 US US14/628,002 patent/US10259907B2/en active Active
-
2016
- 2016-02-18 SG SG11201705648TA patent/SG11201705648TA/en unknown
- 2016-02-18 WO PCT/EP2016/053415 patent/WO2016131900A1/en not_active Ceased
- 2016-02-18 EP EP16706819.6A patent/EP3259292B1/en active Active
- 2016-02-18 JP JP2017543930A patent/JP6978318B2/ja active Active
- 2016-02-18 KR KR1020177026238A patent/KR102327569B1/ko active Active
- 2016-02-18 CN CN201680010655.4A patent/CN107257813B/zh active Active
- 2016-02-19 TW TW105104994A patent/TWI713494B/zh active
-
2017
- 2017-07-09 IL IL253371A patent/IL253371A0/en unknown
-
2021
- 2021-04-28 JP JP2021076132A patent/JP7089618B2/ja active Active
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