JP2018507301A5 - - Google Patents
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- JP2018507301A5 JP2018507301A5 JP2017543930A JP2017543930A JP2018507301A5 JP 2018507301 A5 JP2018507301 A5 JP 2018507301A5 JP 2017543930 A JP2017543930 A JP 2017543930A JP 2017543930 A JP2017543930 A JP 2017543930A JP 2018507301 A5 JP2018507301 A5 JP 2018507301A5
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- group
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- 125000000217 alkyl group Chemical group 0.000 claims 11
- 229920001400 block copolymer Polymers 0.000 claims 8
- 150000005676 cyclic carbonates Chemical class 0.000 claims 7
- 150000002118 epoxides Chemical class 0.000 claims 7
- 150000002596 lactones Chemical class 0.000 claims 7
- 125000005647 linker group Chemical group 0.000 claims 7
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims 6
- 239000001257 hydrogen Substances 0.000 claims 6
- 229910052739 hydrogen Inorganic materials 0.000 claims 6
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims 6
- 150000002431 hydrogen Chemical class 0.000 claims 5
- 150000003951 lactams Chemical class 0.000 claims 5
- 125000002947 alkylene group Chemical group 0.000 claims 4
- 125000006736 (C6-C20) aryl group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 2
- 229910052801 chlorine Inorganic materials 0.000 claims 2
- 239000000460 chlorine Substances 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 2
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 2
- 239000011630 iodine Substances 0.000 claims 2
- 229910052740 iodine Inorganic materials 0.000 claims 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims 2
- 125000005702 oxyalkylene group Chemical group 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
Claims (1)
- 連結基を有するブロックコポリマーが構造(7)を有し、
R2’は水素、C1〜C8アルキル基、またはC6〜C20アリール基であり、
R3’及びR4’は、独立して、C1〜C8アルキル基、水素、臭素、塩素、またはヨウ素であり、
xaは1〜6の整数であり、
yaは2〜16の整数であり、そしてw及びw’は独立して1〜4の整数であり;
ブロックAは、ラクトン、エポキシドまたは環状カーボネートから誘導され、そして
ブロックBは、ビニルアリールモノマーから誘導され、ここでアリール基は、トリ(C1〜C8アルキル)シリル基、トリ(C1〜C8アルキル)シリル(C1〜C8アルキレン)基、及びトリ(C1〜C8アルキル)シリル(C2〜C8オキシアルキレン)基からなる群から選択されるケイ素含有部分で置換されており、更にここでブロックA及びBは相分離可能である]
あるいは、連結基を持つブロックコポリマーが構造(9)を有し、
ブロックAは、ラクトン、エポキシドまたは環状カーボネートから誘導され、そしてブロックBは、ビニルアリールモノマーから誘導され、ここでアリール基は、トリ(C1〜C8アルキル)シリル基、トリ(C1〜C8アルキル)シリル(C1〜C8アルキレン)基、及びトリ(C1〜C8アルキル)シリル(C2〜C8オキシアルキレン)基からなる群から選択されるケイ素含有部分で置換されており、更にここでブロックA及びBは相分離可能である]
あるいは、連結基を持つブロックコポリマーが構造(10)を有し、
あるいは、連結基を持つブロックコポリマーが構造(11)を有し、
あるいは、連結基を持つブロックコポリマーが構造(12)を有し、
及びb’及びb’’は独立して1〜5の整数であり、更にブロックAはビニルアリールから誘導され、及びブロックBはラクトン、ラクタム、エポキシドまたは環状カーボネートから誘導され、またはX’は直接原子価結合またはエチレン性不飽和モノマーであり、更にブロックA及びBは相分離可能である]
あるいは、連結基を持つブロックコポリマーが構造(14)を有し、
あるいは、連結基を持つブロックコポリマーが構造(23)を有し、
請求項1〜4のいずれか一つに記載のブロックコポリマー。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021076132A JP7089618B2 (ja) | 2015-02-20 | 2021-04-28 | 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/628,002 US10259907B2 (en) | 2015-02-20 | 2015-02-20 | Block copolymers with surface-active junction groups, compositions and processes thereof |
US14/628,002 | 2015-02-20 | ||
PCT/EP2016/053415 WO2016131900A1 (en) | 2015-02-20 | 2016-02-18 | Block copolymers with surface-active junction groups, compositions and processes thereof |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021076132A Division JP7089618B2 (ja) | 2015-02-20 | 2021-04-28 | 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2018507301A JP2018507301A (ja) | 2018-03-15 |
JP2018507301A5 true JP2018507301A5 (ja) | 2020-10-15 |
JP6978318B2 JP6978318B2 (ja) | 2021-12-08 |
Family
ID=55443232
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017543930A Active JP6978318B2 (ja) | 2015-02-20 | 2016-02-18 | 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 |
JP2021076132A Active JP7089618B2 (ja) | 2015-02-20 | 2021-04-28 | 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021076132A Active JP7089618B2 (ja) | 2015-02-20 | 2021-04-28 | 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US10259907B2 (ja) |
EP (1) | EP3259292B1 (ja) |
JP (2) | JP6978318B2 (ja) |
KR (1) | KR102327569B1 (ja) |
CN (1) | CN107257813B (ja) |
IL (1) | IL253371A0 (ja) |
SG (1) | SG11201705648TA (ja) |
TW (1) | TWI713494B (ja) |
WO (1) | WO2016131900A1 (ja) |
Families Citing this family (17)
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WO2017014145A1 (ja) * | 2015-07-23 | 2017-01-26 | Dic株式会社 | 含フッ素化合物、リビング重合開始剤、含フッ素重合体、含フッ素重合体の製造方法及びレジスト組成物 |
US9982097B2 (en) * | 2016-02-11 | 2018-05-29 | International Business Machines Corporation | Thin film self assembly of topcoat-free silicon-containing diblock copolymers |
WO2017144385A1 (en) * | 2016-02-22 | 2017-08-31 | AZ Electronic Materials (Luxembourg) S.à.r.l. | Block copolymers with linear surface-active junction groups, compositions and processes thereof |
US9768059B1 (en) * | 2016-04-07 | 2017-09-19 | International Business Machines Corporation | High-chi block copolymers for interconnect structures by directed self-assembly |
JP2018082033A (ja) | 2016-11-16 | 2018-05-24 | 東芝メモリ株式会社 | パターン形成方法 |
US11078337B2 (en) * | 2016-12-14 | 2021-08-03 | Brewer Science, Inc. | High-χ block copolymers for directed self-assembly |
CN108227412A (zh) * | 2016-12-15 | 2018-06-29 | Imec 非营利协会 | 光刻掩模层 |
US10082736B2 (en) * | 2017-01-13 | 2018-09-25 | International Business Machines Corporation | Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning |
TWI805617B (zh) * | 2017-09-15 | 2023-06-21 | 南韓商Lg化學股份有限公司 | 層壓板 |
JP2019099749A (ja) | 2017-12-06 | 2019-06-24 | 東芝メモリ株式会社 | パターン形成方法、ブロックコポリマー、及びパターン形成材料 |
US10656527B2 (en) | 2017-12-21 | 2020-05-19 | International Business Machines Corporation | Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer |
JPWO2019131953A1 (ja) * | 2017-12-27 | 2020-12-24 | Jsr株式会社 | パターン形成方法及び感放射線性組成物 |
KR102136470B1 (ko) * | 2018-12-24 | 2020-07-22 | (주)서영 | 기판과 평행방향으로 자기조립된 실린더 블록공중합체를 이용한 대면적 나노패턴 제조 방법 |
WO2020179918A1 (ja) * | 2019-03-06 | 2020-09-10 | Jsr株式会社 | 基板の製造方法及びブロック共重合体 |
FR3105786A1 (fr) * | 2019-12-31 | 2021-07-02 | Arkema France | Procédé de nanostructuration d’un substrat |
KR20230119186A (ko) * | 2020-12-17 | 2023-08-16 | 메르크 파텐트 게엠베하 | 지향성 자기 조립을 위한 교호 공중합체 세그먼트로이루어진 조정 가능한 하이 카이 디블록 공중합체 및 그의 적용 |
EP4326791A1 (en) * | 2021-04-23 | 2024-02-28 | Merck Patent GmbH | Multi-pitch tolerable block copolymers with enhanced kinetics for directed self-assembly applications |
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-
2015
- 2015-02-20 US US14/628,002 patent/US10259907B2/en active Active
-
2016
- 2016-02-18 EP EP16706819.6A patent/EP3259292B1/en active Active
- 2016-02-18 SG SG11201705648TA patent/SG11201705648TA/en unknown
- 2016-02-18 WO PCT/EP2016/053415 patent/WO2016131900A1/en active Application Filing
- 2016-02-18 JP JP2017543930A patent/JP6978318B2/ja active Active
- 2016-02-18 KR KR1020177026238A patent/KR102327569B1/ko active IP Right Grant
- 2016-02-18 CN CN201680010655.4A patent/CN107257813B/zh active Active
- 2016-02-19 TW TW105104994A patent/TWI713494B/zh active
-
2017
- 2017-07-09 IL IL253371A patent/IL253371A0/en unknown
-
2021
- 2021-04-28 JP JP2021076132A patent/JP7089618B2/ja active Active
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