JP6922831B2 - シリコン単結晶の製造方法およびシリコン単結晶の引き上げ装置 - Google Patents
シリコン単結晶の製造方法およびシリコン単結晶の引き上げ装置 Download PDFInfo
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- JP6922831B2 JP6922831B2 JP2018086795A JP2018086795A JP6922831B2 JP 6922831 B2 JP6922831 B2 JP 6922831B2 JP 2018086795 A JP2018086795 A JP 2018086795A JP 2018086795 A JP2018086795 A JP 2018086795A JP 6922831 B2 JP6922831 B2 JP 6922831B2
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- Prior art keywords
- single crystal
- silicon single
- heater
- back surface
- exhaust
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018086795A JP6922831B2 (ja) | 2018-04-27 | 2018-04-27 | シリコン単結晶の製造方法およびシリコン単結晶の引き上げ装置 |
TW107144481A TWI681087B (zh) | 2018-04-27 | 2018-12-11 | 矽單結晶的製造方法及矽單結晶的提拉裝置 |
KR1020190045159A KR102315982B1 (ko) | 2018-04-27 | 2019-04-17 | 실리콘 단결정 제조 방법 및 실리콘 단결정 인상 장치 |
CN201910334491.6A CN110408991B (zh) | 2018-04-27 | 2019-04-24 | 硅单晶的制造方法及硅单晶的提拉装置 |
Applications Claiming Priority (1)
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---|---|---|---|
JP2018086795A JP6922831B2 (ja) | 2018-04-27 | 2018-04-27 | シリコン単結晶の製造方法およびシリコン単結晶の引き上げ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019189506A JP2019189506A (ja) | 2019-10-31 |
JP6922831B2 true JP6922831B2 (ja) | 2021-08-18 |
Family
ID=68358146
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2018086795A Active JP6922831B2 (ja) | 2018-04-27 | 2018-04-27 | シリコン単結晶の製造方法およびシリコン単結晶の引き上げ装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6922831B2 (ko) |
KR (1) | KR102315982B1 (ko) |
CN (1) | CN110408991B (ko) |
TW (1) | TWI681087B (ko) |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2631591B2 (ja) * | 1991-10-29 | 1997-07-16 | コマツ電子金属株式会社 | 半導体単結晶製造方法および製造装置 |
JP3750174B2 (ja) * | 1996-01-24 | 2006-03-01 | 株式会社Sumco | 単結晶の製造装置および製造方法 |
JPH09227286A (ja) * | 1996-02-24 | 1997-09-02 | Komatsu Electron Metals Co Ltd | 単結晶製造装置 |
JP3587229B2 (ja) * | 1997-10-20 | 2004-11-10 | 三菱住友シリコン株式会社 | シリコン単結晶の引上げ装置 |
KR20030055900A (ko) * | 2001-12-27 | 2003-07-04 | 주식회사 실트론 | 단결정 잉곳의 제조장치 |
JP4773340B2 (ja) * | 2004-03-31 | 2011-09-14 | Sumco Techxiv株式会社 | 半導体単結晶製造装置 |
JP4730937B2 (ja) * | 2004-12-13 | 2011-07-20 | Sumco Techxiv株式会社 | 半導体単結晶製造装置および製造方法 |
CN100415945C (zh) * | 2005-12-26 | 2008-09-03 | 北京有色金属研究总院 | 一种提高直拉硅单晶炉热场部件寿命的方法及单晶炉 |
JP2009001489A (ja) | 2008-08-28 | 2009-01-08 | Sumco Techxiv株式会社 | 単結晶の製造装置及び製造方法 |
JP6257483B2 (ja) * | 2014-09-05 | 2018-01-10 | グローバルウェーハズ・ジャパン株式会社 | シリコン単結晶製造方法 |
CN106757312A (zh) * | 2017-03-09 | 2017-05-31 | 无锡市蓝德光电科技有限公司 | 一种硅单晶提拉炉 |
-
2018
- 2018-04-27 JP JP2018086795A patent/JP6922831B2/ja active Active
- 2018-12-11 TW TW107144481A patent/TWI681087B/zh active
-
2019
- 2019-04-17 KR KR1020190045159A patent/KR102315982B1/ko active IP Right Grant
- 2019-04-24 CN CN201910334491.6A patent/CN110408991B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN110408991B (zh) | 2022-03-29 |
TW201945602A (zh) | 2019-12-01 |
KR20190125180A (ko) | 2019-11-06 |
JP2019189506A (ja) | 2019-10-31 |
KR102315982B1 (ko) | 2021-10-21 |
CN110408991A (zh) | 2019-11-05 |
TWI681087B (zh) | 2020-01-01 |
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