JP6861171B2 - 炭化ケイ素超接合パワーデバイスの活性領域設計および対応する方法 - Google Patents
炭化ケイ素超接合パワーデバイスの活性領域設計および対応する方法 Download PDFInfo
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims description 53
- 229910010271 silicon carbide Inorganic materials 0.000 title claims description 48
- 238000000034 method Methods 0.000 title claims description 20
- 238000013461 design Methods 0.000 title description 23
- 239000002019 doping agent Substances 0.000 claims description 62
- 238000004519 manufacturing process Methods 0.000 claims description 31
- 239000004065 semiconductor Substances 0.000 claims description 29
- 238000002347 injection Methods 0.000 claims description 12
- 239000007924 injection Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 5
- 230000005669 field effect Effects 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 230000000903 blocking effect Effects 0.000 description 13
- 230000015556 catabolic process Effects 0.000 description 12
- 238000005468 ion implantation Methods 0.000 description 8
- 230000008901 benefit Effects 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 5
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 208000012868 Overgrowth Diseases 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005094 computer simulation Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
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Description
10 SJデバイス
12 上部コンタクト
14 エピタキシャル層
18 下部コンタクト
20 SiC基板層
24 エピ層
24Aエピタキシャル層
24Bエピタキシャル層
24Cエピタキシャル層
26 フローティング領域
190 SJデバイス
Claims (16)
- 1以上のチャージバランス(CB)層(24A,24B,24C)を含む活性領域(8)を含む炭化ケイ素(SiC)超接合(SJ)デバイス(10)であって、各CB層(24A,24B,24C)が、
第1の導電型の半導体層と、
前記半導体層の表面に配置された第2導電型の複数のフローティング領域(26)とを備え、逆バイアスが前記SiC−SJデバイス(10)に印加されたときに、前記複数のフローティング領域(26)および前記半導体層の両方が、実質的に空乏化して、イオン化ドーパントからほぼ等しい量の電荷を提供するように構成され、
前記複数のフローティング領域(26)のドーピング濃度が約1.5×10 17 cm -3 〜約1.9×10 17 cm -3 であり、
前記フローティング領域(26)の厚さで割った前記複数のフローティング領域(26)のドーピング濃度は、5×10 12 cm -3 以上、かつ5×10 18 cm -3 以下であり、
前記1以上のCB層(24A,24B,24C)のうち、特定のCB層の前記複数のフローティング領域(26)の間隔が、前記特定のCB層の厚さの10%以上であり、前記特定のCB層の厚さ以下である、
SiC−SJデバイス(10)。 - 前記複数のフローティング領域(26)の厚さが、1μmである、請求項1に記載のSiC−SJデバイス(10)。
- 前記複数のフローティング領域(26)の幅が2μmである、請求項1に記載のSiC−SJデバイス(10)。
- 前記複数のフローティング領域(26)の間隔が、約1μm〜約6μmである、請求項1に記載のSiC−SJデバイス(10)。
- 前記複数のフローティング領域(26)が、p型ドーピングを有し、前記半導体層が、n型ドーピングを有する、請求項1に記載のSiC−SJデバイス(10)。
- 前記複数のフローティング領域(26)の有効シートドーピング濃度が1.1×1013cm-2以下である、請求項1に記載のSiC−SJデバイス(10)。
- 前記半導体層が、5×1015cm-3以上の第1導電型のドーパント濃度を有する、請求項1に記載のSiC−SJデバイス(10)。
- 前記1以上のCB層の各々が、約5μm〜約20μmの厚さを有する、請求項1に記載のSiC−SJデバイス(10)。
- 前記1以上のCB層のうち、特定のCB層に関して、前記特定のCB層の厚さと、前記特定のCB層の前記半導体層における前記第1導電型の均一なドーパント濃度との積が、1.1×1013cm-2未満である、請求項1に記載のSiC−SJデバイス(10)。
- 前記SiC−SJデバイス(10)の破壊電圧が3kVより大きく、室温でのドリフト層の特性オン抵抗が7mΩ・cm-2未満である、請求項1に記載のSiC−SJデバイス(10)。
- 前記SiC−SJデバイス(10)が、金属酸化物半導体電界効果トランジスタ(MOSFET)、接合電界効果トランジスタ(JFET)、バイポーラ接合トランジスタ(BJT)、またはダイオードである、請求項1に記載のSiC−SJデバイス(10)。
- 第1チャージバランス(CB)層を製造することを含む、炭化ケイ素(SiC)超接合(SJ)デバイスを製造する方法であって、前記第1CB層を製造することが、
SiC基板層(20)の上部に、第1導電型の第1半導体層を形成することと、
第2導電型の第1の複数のフローティング領域(26)を、前記第1半導体層に注入することであって、前記第1の複数のフローティング領域(26)のドーピング濃度が、約1.5×10 17 cm -3 〜約1.9×10 17 cm -3 であり、前記フローティング領域(26)の厚さで割った前記複数のフローティング領域(26)のドーピング濃度は、5×10 12 cm -3 以上、かつ5×10 18 cm -3 以下であり、前記第1の複数のフローティング領域(26)の間隔が、前記第1半導体層の厚さの10%以上であり、前記第1半導体層の厚さ以下である、注入することとを含むSiC−SJデバイス(10)を製造する方法。 - 前記第1の複数のフローティング領域(26)を注入することが、約1MeV未満の注入エネルギーを用いて注入することを含む、請求項12に記載の方法。
- 前記第1の複数のフローティング領域(26)の厚さが、約1μm以下である、請求項12に記載の方法。
- 前記第1半導体層の厚さと、前記第1半導体層における前記第1導電型の均一なドーパント濃度との積が、1.1×1013cm-2未満である、請求項12に記載の方法。
- 第2CB層を製造することをさらに含み、前記第2CB層を製造することが、
前記第1CB層の上部に、前記第1導電型の第2半導体層を形成することと、
前記第2導電型の第2の複数のフローティング領域(26)を前記第2半導体層に注入することであって、前記第2の複数のフローティング領域(26)のドーピング濃度が約2×1016cm-3〜約1×1018cm-3であり、前記第2の複数のフローティング領域(26)の間隔が前記第2半導体層の厚さの10%以上であり、前記第2半導体層の厚さ以下である、注入することとを含む、請求項12に記載の方法。
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US14/752,446 US9735237B2 (en) | 2015-06-26 | 2015-06-26 | Active area designs for silicon carbide super-junction power devices |
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CN107221561A (zh) * | 2017-06-29 | 2017-09-29 | 全球能源互联网研究院 | 一种叠层电场调制高压mosfet结构及其制作方法 |
US10600649B2 (en) | 2017-09-21 | 2020-03-24 | General Electric Company | Systems and method for charge balanced semiconductor power devices with fast switching capability |
JP7098906B2 (ja) * | 2017-10-11 | 2022-07-12 | 株式会社デンソー | ショットキーバリアダイオードを備えた炭化珪素半導体装置およびその製造方法 |
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JP2013219163A (ja) | 2012-04-09 | 2013-10-24 | Sumitomo Electric Ind Ltd | 炭化珪素半導体装置およびその製造方法 |
JP5812029B2 (ja) * | 2012-06-13 | 2015-11-11 | 株式会社デンソー | 炭化珪素半導体装置およびその製造方法 |
JP6103839B2 (ja) * | 2012-07-06 | 2017-03-29 | ローム株式会社 | 半導体装置および半導体装置の製造方法 |
US8642427B1 (en) | 2012-08-02 | 2014-02-04 | Vanguard International Semiconductor Corporation | Semiconductor device and method for fabricating the same |
CN103413823B (zh) | 2013-08-22 | 2017-03-01 | 上海华虹宏力半导体制造有限公司 | 超级结晶体管及其形成方法 |
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US20160380059A1 (en) | 2016-12-29 |
JP2018523301A (ja) | 2018-08-16 |
WO2016210261A1 (en) | 2016-12-29 |
CN115241270A (zh) | 2022-10-25 |
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US9735237B2 (en) | 2017-08-15 |
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