JP6828959B2 - リードフレームおよびその製造方法 - Google Patents
リードフレームおよびその製造方法 Download PDFInfo
- Publication number
- JP6828959B2 JP6828959B2 JP2017006178A JP2017006178A JP6828959B2 JP 6828959 B2 JP6828959 B2 JP 6828959B2 JP 2017006178 A JP2017006178 A JP 2017006178A JP 2017006178 A JP2017006178 A JP 2017006178A JP 6828959 B2 JP6828959 B2 JP 6828959B2
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- Prior art keywords
- recess
- lead frame
- shape
- etching
- plating layer
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
- H01L23/49548—Cross section geometry
- H01L23/49551—Cross section geometry characterised by bent parts
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- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
- H01L21/4814—Conductive parts
- H01L21/4821—Flat leads, e.g. lead frames with or without insulating supports
- H01L21/4828—Etching
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- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
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- H01L21/4832—Etching a temporary substrate after encapsulation process to form leads
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- H01L23/49579—Lead-frames or other flat leads characterised by the materials of the lead frames or layers thereon
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- H01L24/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L24/80 - H01L24/90
- H01L24/92—Specific sequence of method steps
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Geometry (AREA)
- Lead Frames For Integrated Circuits (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017006178A JP6828959B2 (ja) | 2017-01-17 | 2017-01-17 | リードフレームおよびその製造方法 |
| TW107100604A TW201841323A (zh) | 2017-01-17 | 2018-01-08 | 導線框及其製造方法 |
| CN201810044232.5A CN108461469A (zh) | 2017-01-17 | 2018-01-17 | 引线框及其制造方法 |
| US15/873,226 US10622286B2 (en) | 2017-01-17 | 2018-01-17 | Lead frame and method for manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017006178A JP6828959B2 (ja) | 2017-01-17 | 2017-01-17 | リードフレームおよびその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018117020A JP2018117020A (ja) | 2018-07-26 |
| JP2018117020A5 JP2018117020A5 (enExample) | 2019-09-05 |
| JP6828959B2 true JP6828959B2 (ja) | 2021-02-10 |
Family
ID=62841139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017006178A Active JP6828959B2 (ja) | 2017-01-17 | 2017-01-17 | リードフレームおよびその製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10622286B2 (enExample) |
| JP (1) | JP6828959B2 (enExample) |
| CN (1) | CN108461469A (enExample) |
| TW (1) | TW201841323A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6741356B1 (ja) * | 2019-03-22 | 2020-08-19 | 大口マテリアル株式会社 | リードフレーム |
| EP3879569A1 (en) * | 2020-03-11 | 2021-09-15 | Nexperia B.V. | A leadless semiconductor package and method of manufacture |
| JP7617812B2 (ja) * | 2021-05-24 | 2025-01-20 | 新光電気工業株式会社 | リードフレーム、半導体装置及びリードフレームの製造方法 |
| JP7677579B2 (ja) * | 2021-12-22 | 2025-05-15 | 新光電気工業株式会社 | リードフレーム、リードフレームの製造方法及び半導体装置の製造方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52122960A (en) | 1976-04-07 | 1977-10-15 | Shionogi Seiyaku Kk | Freeze drying method and apparatus |
| JP3780122B2 (ja) | 1999-07-07 | 2006-05-31 | 株式会社三井ハイテック | 半導体装置の製造方法 |
| US20040080025A1 (en) * | 2002-09-17 | 2004-04-29 | Shinko Electric Industries Co., Ltd. | Lead frame, method of manufacturing the same, and semiconductor device manufactured with the same |
| JP2007051336A (ja) * | 2005-08-18 | 2007-03-01 | Shinko Electric Ind Co Ltd | 金属板パターン及び回路基板の形成方法 |
| JP2009164232A (ja) | 2007-12-28 | 2009-07-23 | Mitsui High Tec Inc | 半導体装置及びその製造方法並びにリードフレーム及びその製造方法 |
| US7821113B2 (en) * | 2008-06-03 | 2010-10-26 | Texas Instruments Incorporated | Leadframe having delamination resistant die pad |
| JP2009302209A (ja) * | 2008-06-11 | 2009-12-24 | Nec Electronics Corp | リードフレーム、半導体装置、リードフレームの製造方法および半導体装置の製造方法 |
| WO2010052973A1 (ja) * | 2008-11-05 | 2010-05-14 | 株式会社三井ハイテック | 半導体装置及びその製造方法 |
| JP5195647B2 (ja) * | 2009-06-01 | 2013-05-08 | セイコーエプソン株式会社 | リードフレームの製造方法及び半導体装置の製造方法 |
| JP5626785B2 (ja) | 2010-09-27 | 2014-11-19 | Shマテリアル株式会社 | 半導体素子搭載用リードフレームおよびその製造方法 |
| JP2012146782A (ja) | 2011-01-11 | 2012-08-02 | Sumitomo Metal Mining Co Ltd | 半導体素子搭載用リードフレームの製造方法 |
| JP2017103365A (ja) * | 2015-12-02 | 2017-06-08 | 新光電気工業株式会社 | リードフレーム及び電子部品装置とそれらの製造方法 |
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2017
- 2017-01-17 JP JP2017006178A patent/JP6828959B2/ja active Active
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2018
- 2018-01-08 TW TW107100604A patent/TW201841323A/zh unknown
- 2018-01-17 US US15/873,226 patent/US10622286B2/en active Active
- 2018-01-17 CN CN201810044232.5A patent/CN108461469A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US20180204787A1 (en) | 2018-07-19 |
| CN108461469A (zh) | 2018-08-28 |
| US10622286B2 (en) | 2020-04-14 |
| TW201841323A (zh) | 2018-11-16 |
| JP2018117020A (ja) | 2018-07-26 |
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