JP6749242B2 - 化合物及び該化合物を含む着色硬化性樹脂組成物 - Google Patents

化合物及び該化合物を含む着色硬化性樹脂組成物 Download PDF

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JP6749242B2
JP6749242B2 JP2016547495A JP2016547495A JP6749242B2 JP 6749242 B2 JP6749242 B2 JP 6749242B2 JP 2016547495 A JP2016547495 A JP 2016547495A JP 2016547495 A JP2016547495 A JP 2016547495A JP 6749242 B2 JP6749242 B2 JP 6749242B2
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group
formula
carbon atoms
meth
compound
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JPWO2016039405A1 (ja
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芦田　徹
徹 芦田
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/02—Coumarine dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00—Porphines; Azaporphines
    • C09B47/04—Phthalocyanines abbreviation: Pc
    • C09B47/08—Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex
    • C09B47/10—Obtaining compounds having halogen atoms directly bound to the phthalocyanine skeleton
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
JP2016547495A 2014-09-12 2015-09-10 化合物及び該化合物を含む着色硬化性樹脂組成物 Active JP6749242B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014186017 2014-09-12
JP2014186017 2014-09-12
PCT/JP2015/075686 WO2016039405A1 (ja) 2014-09-12 2015-09-10 化合物及び該化合物を含む着色硬化性樹脂組成物

Related Child Applications (1)

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JP2020007718A Division JP7046997B2 (ja) 2014-09-12 2020-01-21 化合物及び該化合物を含む着色硬化性樹脂組成物

Publications (2)

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JPWO2016039405A1 JPWO2016039405A1 (ja) 2017-06-29
JP6749242B2 true JP6749242B2 (ja) 2020-09-02

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JP2016547495A Active JP6749242B2 (ja) 2014-09-12 2015-09-10 化合物及び該化合物を含む着色硬化性樹脂組成物
JP2020007718A Active JP7046997B2 (ja) 2014-09-12 2020-01-21 化合物及び該化合物を含む着色硬化性樹脂組成物

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JP (2) JP6749242B2 (zh)
KR (1) KR102397160B1 (zh)
CN (1) CN106795376B (zh)
TW (1) TWI663164B (zh)
WO (1) WO2016039405A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI778975B (zh) * 2016-09-06 2022-10-01 日商住友化學股份有限公司 著色組成物
JP7382280B2 (ja) * 2020-05-25 2023-11-16 株式会社東海理化電機製作所 制御装置および制御方法
JP7382281B2 (ja) 2020-05-25 2023-11-16 株式会社東海理化電機製作所 制御装置および制御方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0743896A (ja) * 1993-07-28 1995-02-14 Toyobo Co Ltd 光重合性組成物
JP3505761B2 (ja) * 1993-12-27 2004-03-15 チッソ株式会社 共重合体、その製造法及びそれを用いた電界発光素子
JPH0829973A (ja) * 1994-07-11 1996-02-02 Toyobo Co Ltd 光重合性組成物
JPH11130817A (ja) * 1997-08-28 1999-05-18 Junji Kido ビニル系重合体及びそれを用いたエレクトロルミネッセンス素子
JP2000044822A (ja) * 1998-08-03 2000-02-15 Toppan Printing Co Ltd 着色組成物及びそれを用いたカラーフィルター並びにその製造方法
US6727372B2 (en) * 2000-08-07 2004-04-27 Eastman Chemical Company Colorant compounds containing copolymerizable vinyl groups
CN1279121C (zh) * 2004-06-17 2006-10-11 上海交通大学 香豆素荧光染料
JP2006154740A (ja) 2004-07-14 2006-06-15 Fuji Photo Film Co Ltd 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
JP5221859B2 (ja) * 2006-03-09 2013-06-26 株式会社Ａｄｅｋａ クマリン化合物を含有してなるフィルム、クマリン化合物とマトリクスを含む色変換層、該色変換層を含む色変換フィルタ、補色層、補色フィルタならびに多色発光デバイス
CN101161763B (zh) * 2006-12-13 2012-06-06 东莞宏威数码机械有限公司 一种含有烯酸酯侧基的香豆素系绿光有机电致发光材料
KR20110115241A (ko) * 2010-04-15 2011-10-21 동우 화인켐 주식회사 열경화성 수지 조성물, 이를 이용하여 제조된 보호막을 구비한 컬러 필터 및 액정표시장치
KR101874496B1 (ko) * 2011-04-05 2018-07-04 가부시키가이샤 아데카 신규 화합물 및 광전변환 소자
JP5742439B2 (ja) * 2011-05-02 2015-07-01 信越化学工業株式会社 蛍光性化合物及び蛍光性樹脂組成物
JP6155076B2 (ja) * 2012-04-10 2017-06-28 住友化学株式会社 着色剤分散液

Also Published As

Publication number Publication date
JP2020090676A (ja) 2020-06-11
JPWO2016039405A1 (ja) 2017-06-29
CN106795376B (zh) 2019-04-19
TWI663164B (zh) 2019-06-21
KR102397160B1 (ko) 2022-05-11
KR20170054422A (ko) 2017-05-17
JP7046997B2 (ja) 2022-04-04
WO2016039405A1 (ja) 2016-03-17
CN106795376A (zh) 2017-05-31
TW201615638A (zh) 2016-05-01

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