KR102397160B1 - 화합물 및 그 화합물을 포함하는 착색 경화성 수지 조성물 - Google Patents

화합물 및 그 화합물을 포함하는 착색 경화성 수지 조성물 Download PDF

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Publication number
KR102397160B1
KR102397160B1 KR1020177008676A KR20177008676A KR102397160B1 KR 102397160 B1 KR102397160 B1 KR 102397160B1 KR 1020177008676 A KR1020177008676 A KR 1020177008676A KR 20177008676 A KR20177008676 A KR 20177008676A KR 102397160 B1 KR102397160 B1 KR 102397160B1
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South Korea
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group
formula
compound
preferable
carbon atoms
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KR1020177008676A
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English (en)
Korean (ko)
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KR20170054422A (ko
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도루 아시다
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스미또모 가가꾸 가부시끼가이샤
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/02—Coumarine dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00—Porphines; Azaporphines
    • C09B47/04—Phthalocyanines abbreviation: Pc
    • C09B47/08—Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex
    • C09B47/10—Obtaining compounds having halogen atoms directly bound to the phthalocyanine skeleton

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
KR1020177008676A 2014-09-12 2015-09-10 화합물 및 그 화합물을 포함하는 착색 경화성 수지 조성물 KR102397160B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2014-186017 2014-09-12
JP2014186017 2014-09-12
PCT/JP2015/075686 WO2016039405A1 (ja) 2014-09-12 2015-09-10 化合物及び該化合物を含む着色硬化性樹脂組成物

Publications (2)

Publication Number Publication Date
KR20170054422A KR20170054422A (ko) 2017-05-17
KR102397160B1 true KR102397160B1 (ko) 2022-05-11

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177008676A KR102397160B1 (ko) 2014-09-12 2015-09-10 화합물 및 그 화합물을 포함하는 착색 경화성 수지 조성물

Country Status (5)

Country Link
JP (2) JP6749242B2 (zh)
KR (1) KR102397160B1 (zh)
CN (1) CN106795376B (zh)
TW (1) TWI663164B (zh)
WO (1) WO2016039405A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI778975B (zh) * 2016-09-06 2022-10-01 日商住友化學股份有限公司 著色組成物
JP7382281B2 (ja) 2020-05-25 2023-11-16 株式会社東海理化電機製作所 制御装置および制御方法
JP7382280B2 (ja) * 2020-05-25 2023-11-16 株式会社東海理化電機製作所 制御装置および制御方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1594441A (zh) * 2004-06-17 2005-03-16 上海交通大学 香豆素荧光染料

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JPH0743896A (ja) * 1993-07-28 1995-02-14 Toyobo Co Ltd 光重合性組成物
JP3505761B2 (ja) * 1993-12-27 2004-03-15 チッソ株式会社 共重合体、その製造法及びそれを用いた電界発光素子
JPH0829973A (ja) * 1994-07-11 1996-02-02 Toyobo Co Ltd 光重合性組成物
JPH11130817A (ja) * 1997-08-28 1999-05-18 Junji Kido ビニル系重合体及びそれを用いたエレクトロルミネッセンス素子
JP2000044822A (ja) * 1998-08-03 2000-02-15 Toppan Printing Co Ltd 着色組成物及びそれを用いたカラーフィルター並びにその製造方法
US6727372B2 (en) * 2000-08-07 2004-04-27 Eastman Chemical Company Colorant compounds containing copolymerizable vinyl groups
JP2006154740A (ja) 2004-07-14 2006-06-15 Fuji Photo Film Co Ltd 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
JP5221859B2 (ja) * 2006-03-09 2013-06-26 株式会社Ａｄｅｋａ クマリン化合物を含有してなるフィルム、クマリン化合物とマトリクスを含む色変換層、該色変換層を含む色変換フィルタ、補色層、補色フィルタならびに多色発光デバイス
CN101161763B (zh) * 2006-12-13 2012-06-06 东莞宏威数码机械有限公司 一种含有烯酸酯侧基的香豆素系绿光有机电致发光材料
KR20110115241A (ko) * 2010-04-15 2011-10-21 동우 화인켐 주식회사 열경화성 수지 조성물, 이를 이용하여 제조된 보호막을 구비한 컬러 필터 및 액정표시장치
EP2695886A4 (en) * 2011-04-05 2014-12-03 Adeka Corp NEW COMPOUND AND PHOTOELECTRIC CONVERSION ELEMENT
JP5742439B2 (ja) * 2011-05-02 2015-07-01 信越化学工業株式会社 蛍光性化合物及び蛍光性樹脂組成物
JP6155076B2 (ja) * 2012-04-10 2017-06-28 住友化学株式会社 着色剤分散液

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1594441A (zh) * 2004-06-17 2005-03-16 上海交通大学 香豆素荧光染料

Also Published As

Publication number Publication date
JP2020090676A (ja) 2020-06-11
JP6749242B2 (ja) 2020-09-02
JP7046997B2 (ja) 2022-04-04
WO2016039405A1 (ja) 2016-03-17
TW201615638A (zh) 2016-05-01
CN106795376B (zh) 2019-04-19
JPWO2016039405A1 (ja) 2017-06-29
TWI663164B (zh) 2019-06-21
KR20170054422A (ko) 2017-05-17
CN106795376A (zh) 2017-05-31

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