JP6738976B2 - 基板処理装置および基板処理方法 - Google Patents
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
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Description
発明は上記実施形態に制限されるものではなく、発明の精神及び範囲から離脱することなく、様々な変更及び変形が可能である。従って、発明の範囲を公にするために請求項を添付する。
Claims (20)
- 粒子を使って基板を処理する基板処理装置であって、
前記基板を搬送面に沿って所定の搬送方向に搬送する搬送機構と、
粒子を放出する粒子源と、
前記粒子源を前記搬送方向に直交する自転軸の周りで回動させる自転機構と、
前記粒子源と前記搬送面との距離が変更されるように前記粒子源を移動させる移動機構と、
を備えることを特徴とする基板処理装置。 - 前記基板の被処理箇所は、前記搬送機構による前記基板の搬送に伴って変化し、
前記自転機構および前記移動機構は、前記基板の前記被処理箇所の法線と前記粒子源の法線との角度が一定になるように前記粒子源の姿勢および位置を制御する、
ことを特徴とする請求項1に記載の基板処理装置。 - 前記基板の被処理箇所は、前記搬送機構による前記基板の搬送に伴って変化し、
前記自転機構および前記移動機構は、前記基板の前記被処理箇所の法線と前記粒子源の法線とが平行になるように前記粒子源の姿勢および位置を制御する、
ことを特徴とする請求項1に記載の基板処理装置。 - 前記自転機構および前記移動機構は、前記被処理箇所と前記粒子源との距離が一定になるように、前記粒子源の姿勢および位置を制御する、
ことを特徴とする請求項2又は3に記載の基板処理装置。 - 前記移動機構は、前記粒子源を公転軌道に沿って回動させることによって前記粒子源と前記搬送面との距離が変更されるように前記粒子源を移動させる、
ことを特徴とする請求項1乃至4のいずれか1項に記載の基板処理装置。 - 前記公転軌道の公転軸は、前記自転軸と平行である、
ことを特徴とする請求項5に記載の基板処理装置。 - 前記基板が前記搬送機構によって前記搬送方向に搬送されながら前記基板の前記搬送方向における一端から前記基板の前記搬送方向における他端までの領域に膜が形成される間に、前記移動機構は、前記粒子源を第1公転方向に前記公転軌道に沿って回動させた後に、前記粒子源を前記第1公転方向とは反対の第2公転方向に前記公転軌道に沿って回動させる、
ことを特徴とする請求項6に記載の基板処理装置。 - 前記基板が前記搬送機構によって前記搬送方向に搬送されながら前記基板の前記搬送方向における一端から前記基板の前記搬送方向における他端までの領域に膜が形成される間に、前記自転機構は、前記粒子源を前記自転軸の周りで1つの自転方向にのみ回動させる、
ことを特徴とする請求項6又は7に記載の基板処理装置。 - 前記移動機構は、前記粒子源を昇降させることによって前記粒子源と前記搬送面との距離が変更されるように前記粒子源を移動させる、
ことを特徴とする請求項1乃至3のいずれか1項に記載の基板処理装置。 - 前記基板の表面の形状を示す表面形状情報に基づいて、前記自転機構および前記移動機構を制御するための制御情報を生成する制御部を更に備える、
ことを特徴とする請求項1乃至9のいずれか1項に記載の基板処理装置。 - 前記基板の形状を計測して前記表面形状情報を生成する計測器を更に備える、
ことを特徴とする請求項10に記載の基板処理装置。 - 前記粒子源は、カソードによって保持されたターゲットであり、
前記基板処理装置は、前記カソードのスパッタリングによって放出される粒子を使って前記基板に膜を形成する、
ことを特徴とする請求項1乃至11のいずれか1項に記載の基板処理装置。 - 前記粒子源は、イオンビーム源である、
ことを特徴とする請求項1乃至11のいずれか1項に記載の基板処理装置。 - 基板を処理する基板処理方法であって、
前記基板を搬送面に沿って所定の搬送方向に搬送するとともに、粒子を放出する粒子源の姿勢および位置を制御しながら、前記粒子源から放出される粒子を使って前記基板を処理する処理工程を含み、
前記基板の被処理箇所は、前記基板の搬送に伴って変化し、
前記処理工程は、前記基板の前記被処理箇所の変化に応じて、前記粒子源を前記搬送方向に直交する自転軸の周りで回動させるとともに、前記粒子源と前記搬送面との距離が変更されるように前記粒子源を移動させる駆動工程を含む、
ことを特徴とする基板処理方法。 - 前記駆動工程では、前記基板の前記被処理箇所の法線と前記粒子源の法線との角度が一定になるように前記粒子源の姿勢および位置を制御する、
ことを特徴とする請求項14に記載の基板処理方法。 - 前記駆動工程では、前記基板の前記被処理箇所の法線と前記粒子源の法線とが平行になるように前記粒子源の姿勢および位置を制御する、
ことを特徴とする請求項14に記載の基板処理方法。 - 前記駆動工程では、前記被処理箇所と前記粒子源との距離が一定になるように、前記粒子源の姿勢および位置を制御する、
ことを特徴とする請求項15又は16に記載の基板処理方法。 - 前記粒子源は、カソードによって保持されたターゲットであり、
前記カソードのスパッタリングによって放出される粒子を使って前記基板に膜が形成される、
ことを特徴とする請求項14乃至17のいずれか1項に記載の基板処理方法。 - 前記粒子源は、イオンビーム源である、
ことを特徴とする請求項14乃至17のいずれか1項に記載の基板処理方法。 - 前記駆動工程では、前記自転軸と平行な公転軸の周りで公転軌道に沿って前記粒子源を回動させることによって前記粒子源と前記搬送面との距離が変更されるように前記粒子源を移動させる、
ことを特徴とする請求項14乃至19のいずれか1項に記載の基板処理方法。
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PCT/JP2019/003362 WO2019155978A1 (ja) | 2018-02-06 | 2019-01-31 | 基板処理装置および基板処理方法 |
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US3537973A (en) * | 1967-09-15 | 1970-11-03 | Varian Associates | Sequential sputtering with movable targets |
JPS5019681A (ja) * | 1973-06-25 | 1975-03-01 | ||
JPH0347964A (ja) | 1989-07-17 | 1991-02-28 | Nikon Corp | イオンビームスパッタ装置 |
US5733418A (en) * | 1996-05-07 | 1998-03-31 | Pld Advanced Automation Systems, Inc. | Sputtering method and apparatus |
US6338781B1 (en) * | 1996-12-21 | 2002-01-15 | Singulus Technologies Ag | Magnetron sputtering cathode with magnet disposed between two yoke plates |
KR19990047679A (ko) * | 1997-12-05 | 1999-07-05 | 박호군 | 이온 빔을 이용한 재료의 표면 처리 장치 |
US6224718B1 (en) * | 1999-07-14 | 2001-05-01 | Veeco Instruments, Inc. | Target assembly for ion beam sputter deposition with multiple paddles each having targets on both sides |
EP1218145B1 (de) * | 1999-09-01 | 2004-10-20 | Siemens Aktiengesellschaft | Verfahren und vorrichtung zur oberflächenbehandlung eines bauteils |
JP2003147519A (ja) * | 2001-11-05 | 2003-05-21 | Anelva Corp | スパッタリング装置 |
JP2005336535A (ja) | 2004-05-26 | 2005-12-08 | Canon Inc | 成膜装置及び成膜方法 |
JP4562493B2 (ja) * | 2004-11-01 | 2010-10-13 | 株式会社奈良機械製作所 | レーザーアブレーション装置 |
JP2007182617A (ja) * | 2006-01-10 | 2007-07-19 | Ulvac Japan Ltd | スパッタ成膜方法及び装置 |
CN101765677B (zh) | 2007-08-29 | 2012-01-25 | 佳能安内华股份有限公司 | 通过溅射的成膜方法及其溅射设备 |
JP5004931B2 (ja) * | 2008-11-25 | 2012-08-22 | 株式会社アルバック | スパッタ源、スパッタリング装置、及びスパッタリング方法 |
CN104409307B (zh) * | 2014-11-12 | 2017-03-15 | 中国电子科技集团公司第四十八研究所 | 一种离子注入机扫描装置及扫描方法 |
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DE112019000682B4 (de) | 2023-06-29 |
US11694882B2 (en) | 2023-07-04 |
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