JP6707412B2 - 基板液処理装置、基板液処理方法および記憶媒体 - Google Patents
基板液処理装置、基板液処理方法および記憶媒体 Download PDFInfo
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- 238000003672 processing method Methods 0.000 title claims description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 36
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- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
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- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H01L21/823431—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of transistors with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
Description
まず本発明による基板液処理装置1が組込まれた基板液処理システム1A全体について述べる。
1A 基板液処理システム
7 制御部
8 基板
34 処理槽
39 液処理部
40 リン酸水溶液供給部
41 純水供給部
42 処理液循環ライン
44 外槽
49 処理液供給ノズル
81、82、83、84 気体供給管
81a、82a、83a、84a 吐出口
81A、82A、83A、84A 流量調整装置
90 閉止板
Claims (7)
- リン酸水溶液からなる処理液と、垂直方向に配置された複数の基板とを収納するとともに、前記処理液を用いて前記基板を処理する処理槽と、
前記処理槽内に前記処理液を供給する処理液供給管と、
前記処理槽に設けられ、前記処理液に気体を供給して気泡を形成するための複数の気体供給管とを備え、
各気体供給管は前記基板の下方に設けられるとともに、前記基板の回路形成面に対して直交する水平方向に延び、
各気体供給管は一方に開口する複数の吐出口を有し、一の気体供給管を流れる気体の流れ方向は、隣接する他の気体供給管を流れる気体の流れ方向に対して反対方向を向く、ことを特徴とする基板液処理装置。 - 複数の基板が所定の配置ピッチで配置され、各気体供給管の吐出口は、基板の配置ピッチの2以上の整数倍の配置ピッチで形成されていることを特徴とする請求項1記載の基板液処理装置。
- 各気体供給管の吐出口は、各基板間の中間位置に配置されていることを特徴とする請求項2記載の基板液処理装置。
- 一の気体供給管と、隣接する他の気体供給管は、互いに独立して流量調整されることを特徴とする請求項1乃至3のいずれか記載の基板液処理装置。
- 一の気体供給管および隣接する他の気体供給管は、各々上流側から下流側に向って複数領域に区画され、各領域は独立して流量調整されることを特徴とする請求項4記載の基板液処理装置。
- リン酸水溶液からなる処理液と、垂直方向に配置された複数の基板とを収納するとともに、前記処理液を用いて前記基板を処理する処理槽と、
前記処理槽内に前記処理液を供給する処理液供給管と、
前記処理槽に設けられ、前記処理液に気体を供給して気泡を形成するための複数の気体供給管とを備え、
各気体供給管は前記基板の下方に設けられるとともに、前記基板の回路形成面に対して直交する水平方向に延び、
各気体供給管は一方に開口する複数の吐出口を有し、一の気体供給管を流れる気体の流れ方向は、隣接する他の気体供給管を流れる気体の流れ方向に対して反対方向を向く、基板液処理装置を用いた基板液処理方法において、
前記一の気体供給管および前記隣接する他の気体供給管から吐出口を介して前記処理液中へ気体を供給する工程と、
前記処理液中において前記基板間を上昇する気泡を形成する工程と、を備えたことを特徴とする基板液処理方法。 - コンピューターに基板液処理方法を実行させるためのコンピュータープログラムを格納した記憶媒体において、
前記基板液処理方法は、
リン酸水溶液からなる処理液と、垂直方向に配置された複数の基板とを収納するとともに、前記処理液を用いて前記基板を処理する処理槽と、
前記処理槽内に前記処理液を供給する処理液供給管と、
前記処理槽に設けられ、前記処理液に気体を供給して気泡を形成するための複数の気体供給管とを備え、
各気体供給管は前記基板の下方に設けられるとともに、前記基板の回路形成面に対して直交する水平方向に延び、
各気体供給管は一方に開口する複数の吐出口を有し、一の気体供給管を流れる気体の流れ方向は、隣接する他の気体供給管を流れる気体の流れ方向に対して反対方向を向く、基板液処理装置を用いた基板液処理方法において、
前記一の気体供給管および前記隣接する他の気体供給管から吐出口を介して前記処理液中へ気体を供給する工程と、
前記処理液中において前記基板間を上昇する気泡を形成する工程と、を備えたことを特徴とする記憶媒体。
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JP2016144781A JP6707412B2 (ja) | 2016-07-22 | 2016-07-22 | 基板液処理装置、基板液処理方法および記憶媒体 |
US15/649,757 US10483137B2 (en) | 2016-07-22 | 2017-07-14 | Substrate liquid processing apparatus, substrate liquid processing method, and storage medium |
CN201710579877.4A CN107644824B (zh) | 2016-07-22 | 2017-07-17 | 基板液处理装置、基板液处理方法以及存储介质 |
KR1020170090271A KR102381166B1 (ko) | 2016-07-22 | 2017-07-17 | 기판액 처리 장치, 기판액 처리 방법 및 기억 매체 |
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JP6985957B2 (ja) * | 2018-02-21 | 2021-12-22 | キオクシア株式会社 | 半導体処理装置 |
WO2019218300A1 (en) * | 2018-05-17 | 2019-11-21 | Yangtze Memory Technologies Co., Ltd. | System and method for improved chemical etching |
JP7176904B2 (ja) * | 2018-09-21 | 2022-11-22 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
JP7178261B2 (ja) * | 2018-12-27 | 2022-11-25 | 東京エレクトロン株式会社 | 基板液処理装置 |
JP7190912B2 (ja) | 2019-01-10 | 2022-12-16 | 東京エレクトロン株式会社 | 基板処理装置 |
KR102666260B1 (ko) * | 2019-12-26 | 2024-05-14 | 가부시키가이샤 스크린 홀딩스 | 기판 처리 장치 및 기판 처리 방법 |
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JPH0758078A (ja) * | 1993-08-19 | 1995-03-03 | Matsushita Electron Corp | ウエットエッチング処理装置 |
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