JP6824962B2 - 基板液処理装置及び基板液処理方法並びに基板液処理プログラムを記憶したコンピュータ読み取り可能な記憶媒体 - Google Patents
基板液処理装置及び基板液処理方法並びに基板液処理プログラムを記憶したコンピュータ読み取り可能な記憶媒体 Download PDFInfo
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
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- H01L21/31105—Etching inorganic layers
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
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- H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
- H01L21/32134—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by liquid etching only
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- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
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- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H01L21/67248—Temperature monitoring
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/7684—Smoothing; Planarisation
Description
7 制御部
8 基板
38 液処理部
39 エッチング液供給部
Claims (11)
- エッチング液を貯留した処理槽に基板を浸漬させることで、凹部の内部および凹部の外部を覆う被膜が形成された基板の表面に前記被膜を除去するエッチング液を接触させてエッチング処理を行う基板液処理方法において、
第1エッチングレートになるよう前記処理槽に貯留した前記エッチング液を第1の温度にし、第1処理時間で前記凹部外部の前記被膜を除去する第1の被膜除去工程と、
次いで、前記第1エッチングレートより低い第2エッチングレートになるよう前記処理槽に貯留した前記エッチング液を第1の温度から第2の温度にし、第2処理時間で前記凹部内部の前記被膜を残し前記凹部外部の前記被膜を除去する第2の被膜除去工程と、
を有することを特徴とする基板液処理方法。 - 前記第1の被膜除去工程と前記第2の被膜除去工程で除去される前記被膜の量は、前記第1の被膜除去工程で除去される量の方が多いことを特徴とする請求項1に記載の基板液処理方法。
- 前記第2の温度は、第2処理時間の経過の間、連続的にまたは段階的に低くすることを特徴とする請求項1および請求項2に記載の基板液処理方法。
- 前記第2の被膜除去工程は、前記凹部外部の被膜を全て除去することを特徴とする請求項1〜3のいずれか一項に記載の基板液処理方法。
- 前記基板をエッチング処理中の大気圧を検出し、
予め設定された大気圧時に除去される前記被膜の量と同じになるように前記エッチング液の温度を検出した大気圧に応じて補正することを特徴とする請求項1〜4のいずれか一項に記載の基板液処理方法。 - エッチング液を貯留した処理槽に基板を浸漬させることで、凹部の内部および凹部の外部を覆う被膜が形成された基板の表面に前記被膜を除去するエッチング液を接触させてエッチング処理を行う基板液処理装置において、
前記凹部外部を覆う前記被膜の一部を除去するために、前記基板の表面に前記エッチング液を供給するエッチング液供給部と、
前記エッチング液供給部を制御する制御部と、
を具備し、
前記制御部は、前記エッチング液供給部から前記処理槽に貯留して前記基板の表面に供給される前記エッチング液の温度を第1エッチングレートになるよう第1の温度にして第1処理時間で前記凹部外部の前記被膜を除去するようにエッチング液供給部を制御し、次いで、前記処理槽に貯留した前記エッチング液の温度を前記第1エッチングレートより低い第2エッチングレートになるよう第1の温度から第2の温度にして第2処理時間で前記凹部内部の前記被膜を残し前記凹部外部の前記被膜を除去するようにエッチング液供給部を制御することを特徴とする基板液処理装置。 - 前記制御部は、前記第1処理時間で除去される前記被膜の量が、前記第2処理時間で除去される前記被膜の量よりも多く除去するよう制御することを特徴とする請求項6に記載の基板液処理装置。
- 前記制御部は、前記エッチング液供給部の前記第2の温度が第2処理時間の経過の間、連続的にまたは段階的に低くなるように制御することを特徴とする請求項6および請求項7に記載の基板液処理装置。
- 前記制御部は、前記第2処理時間に前記凹部内部の前記被膜を残し前記凹部外部の被膜を全て除去するように制御することを特徴とする請求項6〜8のいずれか一項に記載の基板液処理装置。
- 前記制御部は、前記エッチング液の温度検出部と大気圧検出部からの信号とを取得検出可能とし、取得検出した大気圧が予め設定された大気圧(設定大気圧)時に除去される前記被膜の量と同じになるように前記エッチング液供給部から供給される前記エッチング液の温度を検出した大気圧に応じて補正することを特徴とする請求項6〜8のいずれか一項に記載の基板液処理装置。
- 基板液処理装置の動作を制御するためのコンピュータにより実行されたときに、前記コンピュータが前記基板液処理装置を制御して請求項1〜5のいずれか一項に記載の基板液処理方法を実行させるプログラムが記録された記憶媒体。
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JP5180263B2 (ja) * | 2010-07-23 | 2013-04-10 | 倉敷紡績株式会社 | 基板処理装置 |
JP6271304B2 (ja) * | 2013-03-29 | 2018-01-31 | 芝浦メカトロニクス株式会社 | 基板処理装置及び基板処理方法 |
US8906810B2 (en) * | 2013-05-07 | 2014-12-09 | Lam Research Corporation | Pulsed dielectric etch process for in-situ metal hard mask shape control to enable void-free metallization |
JP6118689B2 (ja) * | 2013-09-13 | 2017-04-19 | 東京エレクトロン株式会社 | 基板液処理装置及び基板液処理方法並びに基板液処理プログラムを記憶したコンピュータ読み取り可能な記憶媒体 |
JP6244277B2 (ja) * | 2014-08-11 | 2017-12-06 | 東京エレクトロン株式会社 | 基板液処理装置及び基板液処理方法並びに基板液処理プログラムを記憶したコンピュータ読み取り可能な記憶媒体 |
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US20200312667A1 (en) | 2020-10-01 |
WO2017169155A1 (ja) | 2017-10-05 |
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KR102530228B1 (ko) | 2023-05-08 |
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