JP6660307B2 - 耐キズガラス及び作製方法 - Google Patents
耐キズガラス及び作製方法 Download PDFInfo
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- JP6660307B2 JP6660307B2 JP2016567895A JP2016567895A JP6660307B2 JP 6660307 B2 JP6660307 B2 JP 6660307B2 JP 2016567895 A JP2016567895 A JP 2016567895A JP 2016567895 A JP2016567895 A JP 2016567895A JP 6660307 B2 JP6660307 B2 JP 6660307B2
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- 239000011521 glass Substances 0.000 title claims description 208
- 230000003678 scratch resistant effect Effects 0.000 title claims description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 104
- 238000000034 method Methods 0.000 claims description 52
- 239000000377 silicon dioxide Substances 0.000 claims description 51
- 239000002253 acid Substances 0.000 claims description 41
- 238000005342 ion exchange Methods 0.000 claims description 28
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 21
- 239000011707 mineral Substances 0.000 claims description 21
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 17
- 239000003513 alkali Substances 0.000 claims description 16
- 239000005358 alkali aluminosilicate glass Substances 0.000 claims description 13
- 239000005407 aluminoborosilicate glass Substances 0.000 claims description 10
- 238000005336 cracking Methods 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 239000010410 layer Substances 0.000 description 70
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 21
- 239000000243 solution Substances 0.000 description 15
- 239000000203 mixture Substances 0.000 description 14
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 13
- 238000010306 acid treatment Methods 0.000 description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 150000002500 ions Chemical group 0.000 description 10
- 230000006835 compression Effects 0.000 description 9
- 238000007906 compression Methods 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- 238000007373 indentation Methods 0.000 description 8
- 239000011734 sodium Substances 0.000 description 8
- 239000002344 surface layer Substances 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000005388 borosilicate glass Substances 0.000 description 7
- 239000011260 aqueous acid Substances 0.000 description 6
- 150000001768 cations Chemical class 0.000 description 6
- 229910052845 zircon Inorganic materials 0.000 description 6
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 241000282575 Gorilla Species 0.000 description 4
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 239000002419 bulk glass Substances 0.000 description 4
- 239000005345 chemically strengthened glass Substances 0.000 description 4
- 230000000977 initiatory effect Effects 0.000 description 4
- 230000006872 improvement Effects 0.000 description 3
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910018068 Li 2 O Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 239000006121 base glass Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 229910001409 divalent cation oxide Inorganic materials 0.000 description 2
- 230000002085 persistent effect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 238000007655 standard test method Methods 0.000 description 2
- 239000005341 toughened glass Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 229910001491 alkali aluminosilicate Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910001408 cation oxide Inorganic materials 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- -1 for example Chemical compound 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 229910021426 porous silicon Inorganic materials 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000003283 slot draw process Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000006058 strengthened glass Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
- C03C11/005—Multi-cellular glass ; Porous or hollow glass or glass particles obtained by leaching after a phase separation step
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/008—Other surface treatment of glass not in the form of fibres or filaments comprising a lixiviation step
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/18—Compositions for glass with special properties for ion-sensitive glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
- Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]
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- Surface Treatment Of Glass (AREA)
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Description
SiO2を含むガラス品において、前記ガラス品がイオン交換されており、前記ガラス品の表面から前記ガラス品内に最大で約600nmの深さまで延び込んでいる多孔質富シリカ領域を有し、前記ガラス品が少なくとも約12Nのヌープキズ発生閾値を有する、ガラス品。
前記ガラス品が前記富シリカ領域の前記深さから少なくとも約20μmの層深さまで延びる圧縮層を有し、前記層が少なくとも約300MPaの最大圧縮応力を有する、実施形態1に記載のガラス品。
前記ガラス品が少なくとも約5kgf(4.9×105Pa)のビッカースクラック発生閾値を有する、実施形態1または2に記載のガラス品。
前記ガラス品がアルカリアルミノケイ酸ガラスを含む、実施形態1から3のいずれかに記載のガラス品。
前記ガラス品がホウケイ酸ガラスを含む、実施形態1から3のいずれかに記載のガラス品。
前記ガラス品の前記多孔質富シリカ領域が酸処理されている、実施形態1から5のいずれかに記載のガラス品。
耐キズガラス品を作製する方法において、前記ガラス品がSiO2を含み、前記方法がイオン交換されたガラス品の表面から前記ガラス品内に最大で約600nmまでの深さまで延びている多孔質富シリカ層を形成する工程を含み、前記ガラス品が少なくとも12Nのヌープクラック発生閾値及び少なくとも約5kgfのビッカースクラック発生閾値を有する、方法。
前記多孔質富シリカ層を形成する工程がフッ化水素酸以外の少なくとも1つの鉱酸で前記表面を処理する工程を含む、実施形態7に記載の方法。
前記少なくとも1つの鉱酸が、HCl、HNO3及びH2SO4の内の少なくとも1つを含む、実施形態8に記載の方法。
前記少なくとも1つの鉱酸が少なくとも約0.02Nの濃度で存在する、実施形態7または8に記載の方法。
前記少なくとも1つの鉱酸が約0.02Nから最高で約60Nまでの範囲にある濃度で存在する、実施形態10に記載の方法。
前記多孔質富シリカ層を形成する工程が、約25℃から最高で約95℃までの範囲にある温度において、少なくとも1つの鉱酸で前記表面を処理する工程を含む、実施形態8から11のいずれかに記載の方法。
前記多孔質富シリカ層を形成する工程が、約1時間から最長で約24時間までの範囲にある時間、少なくとも1つの鉱酸で前記表面を処理する工程を含む、実施形態8から12のいずれかに記載の方法。
前記富シリカ層を形成する工程に先立ち前記ガラス品をイオン交換する工程をさらに含む、実施形態7から13のいずれかに記載の方法。
前記ガラス品が前記多孔質富シリカ層の前記深さから少なくとも約20μmの層深さまで延びる圧縮層を有し、前記圧縮層が少なくとも約300MPaの最大圧縮応力を有する、実施形態14に記載の方法。
前記ガラス品がアルカリアルミノケイ酸ガラスを含む、実施形態7から15のいずれかに記載の方法。
前記ガラス品がアルカリアルミノホウケイ酸ガラスを含む、実施形態16に記載の方法。
前記ガラス品がホウケイ酸ガラスを含む、実施形態7から15のいずれかに記載の方法。
ガラスの耐キズ性を向上させる方法において、前記方法が、
a.前記ガラスの表面を、所定の時間、所定の温度において酸で処理する工程、
b.前記表面から非シリカ成分を取り除く工程、及び
c.前記ガラスの前記表面に多孔質富シリカ層を形成する工程、
を含み、
前記富シリカ層が前記表面から前記ガラス内に最大で約600nmまでの深さまで延び込む、
方法。
前記表面を酸で処理する工程に先立ち前記ガラスをイオン交換する工程をさらに含む、実施形態19に記載の方法。
前記ガラスが前記富シリカ領域の前記深さから少なくとも約20μmの層深さまで延びる圧縮層を有し、前記圧縮層が少なくとも約300MPaの最大圧縮応力を有する、実施形態20に記載の方法。
前記ガラスが少なくとも約12Nのヌープキズ発生閾値を有する、実施形態20または21に記載の方法。
前記ガラスが少なくとも約5kgfのビッカースクラック発生閾値を有する、実施形態19から22のいずれかに記載の方法。
前記ガラスがアルカリアルミノケイ酸ガラスを含む、実施形態19から23のいずれかに記載の方法。
前記ガラスがアルカリアルミノホウケイ酸ガラスを含む、実施形態24に記載の方法。
前記ガラスがホウケイ酸ガラスを含む、実施形態19から23のいずれかに記載の方法。
前記多孔質富シリカ層を形成する工程がフッ化水素酸以外の少なくとも1つの鉱酸で前記表面を処理する工程を含む、実施形態19から26のいずれかに記載の方法。
前記少なくとも1つの鉱酸が、HCl、HNO3及びH2SO4の内の少なくとも1つを含む、実施形態27に記載の方法。
前記少なくとも1つの鉱酸が少なくとも約0.02Nの濃度で存在する、実施形態27または28に記載の方法。
前記少なくとも1つの鉱酸が約0.02Nから最大で約60Nまでの範囲にある濃度で存在する、実施形態29に記載の方法。
前記所定の温度が約25℃から最高で約95℃までの範囲にある、実施形態19から30のいずれかに記載の方法。
前記所定の時間が約1時間から最長で約24時間までの範囲にある、実施形態19から31のいずれかに記載の方法。
110,112 表面
120,122 圧縮層
130,132 富シリカ層
Claims (11)
- SiO2を含むガラス品において、前記ガラス品がイオン交換されており、前記ガラス品の表面から前記ガラス品内に最大で600nmの深さまで延び込んでいる多孔質富シリカ領域を有し、前記ガラス品が少なくとも12Nのヌープキズ発生閾値を有することを特徴とするガラス品。
- 前記ガラス品が前記富シリカ領域の前記深さから少なくとも20μmの層深さまで延びる圧縮層を有し、前記層が少なくとも300MPaの最大圧縮応力を有することを特徴とする請求項1に記載のガラス品。
- 前記ガラス品が少なくとも5kgf(4.9×105Pa)のビッカースクラック発生閾値を有することを特徴とする請求項1または2に記載のガラス品。
- 前記ガラス品がアルカリアルミノケイ酸ガラスまたはアルカリアルミノホウケイ酸ガラスを含むことを特徴とする請求項1から3のいずれかに記載のガラス品。
- 耐キズガラス品を作製する方法において、前記ガラス品がSiO2を含み、前記方法が、イオン交換されたガラス品の表面から最大で600nmの深さまで延びる多孔質富シリカ層を形成するため、フッ化水素酸以外の少なくとも1つの鉱酸で前記表面を処理する工程を含み、前記ガラス品が少なくとも12Nのヌープクラック発生閾値及び少なくとも5kgfのビッカースクラック発生閾値を有することを特徴とする方法。
- 前記少なくとも1つの鉱酸が、HCl、HNO3及びH2SO4の内の少なくとも1つを含み、前記少なくとも1つの鉱酸が0.02Nから60Nまでの範囲にある濃度で存在することを特徴とする請求項5に記載の方法。
- 前記表面を少なくとも1つの鉱酸で処理する工程が25℃から95℃までの範囲にある温度において前記表面を少なくとも1つの鉱酸で処理する工程を含むことを特徴とする請求項5または6に記載の方法。
- 前記多孔質富シリカ層を形成する工程が、1時間から24時間までの範囲にある時間、前記表面を少なくとも1つの鉱酸で処理する工程を含むことを特徴とする請求項5から7のいずれかに記載の方法。
- 前記多孔質富シリカ層の前記深さから少なくとも20μmの層深さまで延びる圧縮層を形成するため、前記富シリカ層を形成する工程に先立ち前記ガラス品をイオン交換する工程をさらに含み、前記圧縮層が少なくとも300MPaの最大圧縮応力を有することを特徴とする請求項5から8のいずれかに記載の方法。
- 前記ガラス品が、アルカリアルミノケイ酸ガラスまたはアルカリアルミノホウケイ酸ガラスを含むことを特徴とする請求項5から9のいずれかに記載の方法。
- 前記多孔質富シリカ領域の前記深さが100nmから600nmの範囲にあることを特徴とする請求項1から4のいずれかに記載のガラス品。
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KR (1) | KR20170008830A (ja) |
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-
2015
- 2015-05-18 US US14/714,819 patent/US9670088B2/en active Active
- 2015-05-19 WO PCT/US2015/031491 patent/WO2015179345A1/en active Application Filing
- 2015-05-19 KR KR1020167035524A patent/KR20170008830A/ko not_active Application Discontinuation
- 2015-05-19 JP JP2016567895A patent/JP6660307B2/ja not_active Expired - Fee Related
- 2015-05-19 CN CN201580026924.1A patent/CN106458702B/zh not_active Expired - Fee Related
- 2015-05-19 EP EP15725218.0A patent/EP3145884A1/en not_active Withdrawn
- 2015-05-20 TW TW108117011A patent/TWI699342B/zh not_active IP Right Cessation
- 2015-05-20 TW TW104116146A patent/TWI663138B/zh not_active IP Right Cessation
-
2017
- 2017-05-03 US US15/585,817 patent/US11034611B2/en active Active
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2020
- 2020-02-07 JP JP2020019722A patent/JP2020073456A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
US11034611B2 (en) | 2021-06-15 |
WO2015179345A1 (en) | 2015-11-26 |
TWI663138B (zh) | 2019-06-21 |
TW201604165A (zh) | 2016-02-01 |
JP2017515784A (ja) | 2017-06-15 |
TWI699342B (zh) | 2020-07-21 |
CN106458702A (zh) | 2017-02-22 |
EP3145884A1 (en) | 2017-03-29 |
US9670088B2 (en) | 2017-06-06 |
CN106458702B (zh) | 2021-12-17 |
US20170283308A1 (en) | 2017-10-05 |
US20150336843A1 (en) | 2015-11-26 |
KR20170008830A (ko) | 2017-01-24 |
JP2020073456A (ja) | 2020-05-14 |
TW201934512A (zh) | 2019-09-01 |
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