JP6608130B2 - 計測装置、リソグラフィ装置、及び物品の製造方法 - Google Patents

計測装置、リソグラフィ装置、及び物品の製造方法 Download PDF

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Publication number
JP6608130B2
JP6608130B2 JP2014226407A JP2014226407A JP6608130B2 JP 6608130 B2 JP6608130 B2 JP 6608130B2 JP 2014226407 A JP2014226407 A JP 2014226407A JP 2014226407 A JP2014226407 A JP 2014226407A JP 6608130 B2 JP6608130 B2 JP 6608130B2
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Japan
Prior art keywords
mark
substrate
processing
alignment
alignment mark
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JP2014226407A
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English (en)
Japanese (ja)
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JP2016090444A (ja
JP2016090444A5 (enExample
Inventor
享 杉山
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2014226407A priority Critical patent/JP6608130B2/ja
Priority to US14/923,695 priority patent/US9984453B2/en
Publication of JP2016090444A publication Critical patent/JP2016090444A/ja
Publication of JP2016090444A5 publication Critical patent/JP2016090444A5/ja
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/0008—Industrial image inspection checking presence/absence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/10—Segmentation; Edge detection
    • G06T7/13—Edge detection
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/70—Determining position or orientation of objects or cameras
    • G06T7/73—Determining position or orientation of objects or cameras using feature-based methods
    • G06T7/74—Determining position or orientation of objects or cameras using feature-based methods involving reference images or patches
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G06V10/24—Aligning, centring, orientation detection or correction of the image
    • G06V10/245—Aligning, centring, orientation detection or correction of the image by locating a pattern; Special marks for positioning
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/40—Extraction of image or video features
    • G06V10/44—Local feature extraction by analysis of parts of the pattern, e.g. by detecting edges, contours, loops, corners, strokes or intersections; Connectivity analysis, e.g. of connected components
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V20/00—Scenes; Scene-specific elements
    • G06V20/60—Type of objects
    • G06V20/69—Microscopic objects, e.g. biological cells or cellular parts
    • G06V20/693—Acquisition
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Multimedia (AREA)
  • Quality & Reliability (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Signal Processing (AREA)
JP2014226407A 2014-11-06 2014-11-06 計測装置、リソグラフィ装置、及び物品の製造方法 Active JP6608130B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014226407A JP6608130B2 (ja) 2014-11-06 2014-11-06 計測装置、リソグラフィ装置、及び物品の製造方法
US14/923,695 US9984453B2 (en) 2014-11-06 2015-10-27 Measurement apparatus, lithography apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014226407A JP6608130B2 (ja) 2014-11-06 2014-11-06 計測装置、リソグラフィ装置、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2016090444A JP2016090444A (ja) 2016-05-23
JP2016090444A5 JP2016090444A5 (enExample) 2017-12-14
JP6608130B2 true JP6608130B2 (ja) 2019-11-20

Family

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Family Applications (1)

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JP2014226407A Active JP6608130B2 (ja) 2014-11-06 2014-11-06 計測装置、リソグラフィ装置、及び物品の製造方法

Country Status (2)

Country Link
US (1) US9984453B2 (enExample)
JP (1) JP6608130B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108509913B (zh) * 2018-03-30 2021-03-02 世纪美映影院技术服务（北京）有限公司 一种室内人数统计方法
EP3667423B1 (en) * 2018-11-30 2024-04-03 Canon Kabushiki Kaisha Lithography apparatus, determination method, and method of manufacturing an article
JP7353916B2 (ja) * 2019-10-25 2023-10-02 キヤノン株式会社 計測装置、リソグラフィ装置、及び物品の製造方法
JP7461240B2 (ja) 2020-07-22 2024-04-03 株式会社Ｓｃｒｅｅｎホールディングス 位置検出装置、描画システムおよび位置検出方法
JP7786821B2 (ja) * 2021-12-10 2025-12-16 キヤノン株式会社 計測装置、リソグラフィ装置、および物品製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2745764B2 (ja) * 1990-03-08 1998-04-28 松下電器産業株式会社 位置認識装置
JP3399681B2 (ja) * 1995-01-31 2003-04-21 松下電器産業株式会社 画像認識方法
JPH08234226A (ja) * 1995-02-28 1996-09-13 Toshiba Corp 液晶基板製造用画像処理装置
JPH1022201A (ja) * 1996-07-04 1998-01-23 Nikon Corp アライメントマーク検出装置
JP2000260699A (ja) 1999-03-09 2000-09-22 Canon Inc 位置検出装置及び該位置検出装置を用いた半導体露光装置
AU5703900A (en) * 1999-06-29 2001-01-31 Nikon Corporation Method and apparatus for detecting mark, exposure method and apparatus, and production method for device and device
JP2001274058A (ja) * 2000-03-24 2001-10-05 Nikon Corp マーク検出方法、並びに露光方法及び露光装置
US6891627B1 (en) * 2000-09-20 2005-05-10 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension and overlay of a specimen
DE10047211B4 (de) * 2000-09-23 2007-03-22 Leica Microsystems Semiconductor Gmbh Verfahren und Vorrichtung zur Positionsbestimmung einer Kante eines Strukturelementes auf einem Substrat
JP2005116580A (ja) * 2003-10-03 2005-04-28 Nikon Corp 位置検出装置及び方法、露光装置及び方法、並びにデバイス製造方法
JP2005302970A (ja) * 2004-04-09 2005-10-27 Nikon Corp レシピ作成方法、位置検出装置、および、位置ずれ検出装置
JPWO2008139955A1 (ja) * 2007-05-07 2010-08-05 株式会社目白プレシジョン 投影露光方法、アライメント方法及び投影露光装置
JP5691264B2 (ja) * 2010-06-30 2015-04-01 凸版印刷株式会社 露光装置
JP2012238650A (ja) * 2011-05-10 2012-12-06 Shibaura Mechatronics Corp 位置合わせマークの位置認識装置及び位置認識方法、電子部品の実装装置
JP2013007913A (ja) * 2011-06-24 2013-01-10 Hitachi High-Technologies Corp Ｆｐｄモジュール組立装置及び表示基板の搬送方法

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Publication number Publication date
JP2016090444A (ja) 2016-05-23
US20160131982A1 (en) 2016-05-12
US9984453B2 (en) 2018-05-29

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