JP6593441B2 - 電子材料用の洗浄剤組成物、洗浄剤原液、及び電子材料の洗浄方法 - Google Patents

電子材料用の洗浄剤組成物、洗浄剤原液、及び電子材料の洗浄方法 Download PDF

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Publication number
JP6593441B2
JP6593441B2 JP2017537334A JP2017537334A JP6593441B2 JP 6593441 B2 JP6593441 B2 JP 6593441B2 JP 2017537334 A JP2017537334 A JP 2017537334A JP 2017537334 A JP2017537334 A JP 2017537334A JP 6593441 B2 JP6593441 B2 JP 6593441B2
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water
cleaning
tertiary amine
cleaning composition
electronic material
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Japanese (ja)
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JPWO2017110885A1 (ja
Inventor
洋介 井内
俊 田中
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Arakawa Chemical Industries Ltd
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Arakawa Chemical Industries Ltd
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    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Detergent Compositions (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2017537334A 2015-12-25 2016-12-21 電子材料用の洗浄剤組成物、洗浄剤原液、及び電子材料の洗浄方法 Active JP6593441B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015254252 2015-12-25
JP2015254252 2015-12-25
PCT/JP2016/088131 WO2017110885A1 (ja) 2015-12-25 2016-12-21 電子材料用の洗浄剤組成物、洗浄剤原液、及び電子材料の洗浄方法

Publications (2)

Publication Number Publication Date
JPWO2017110885A1 JPWO2017110885A1 (ja) 2017-12-28
JP6593441B2 true JP6593441B2 (ja) 2019-10-30

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ID=59089545

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Application Number Title Priority Date Filing Date
JP2017537334A Active JP6593441B2 (ja) 2015-12-25 2016-12-21 電子材料用の洗浄剤組成物、洗浄剤原液、及び電子材料の洗浄方法

Country Status (4)

Country Link
JP (1) JP6593441B2 (ko)
KR (1) KR102635269B1 (ko)
CN (1) CN108779419B (ko)
WO (1) WO2017110885A1 (ko)

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5237300B2 (ja) * 2006-12-21 2013-07-17 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド エッチング後残留物を除去するための液体洗浄剤
CN101412950A (zh) * 2007-10-19 2009-04-22 安集微电子（上海）有限公司 一种等离子刻蚀残留物清洗液
JP5556658B2 (ja) * 2008-08-27 2014-07-23 荒川化学工業株式会社 鉛フリーはんだフラックス除去用洗浄剤組成物および鉛フリーはんだフラックス除去システム
JP5857740B2 (ja) * 2009-09-03 2016-02-10 荒川化学工業株式会社 鉛フリーハンダ水溶性フラックス除去用洗浄剤、除去方法及び洗浄方法
CN104312779B (zh) * 2010-07-09 2017-10-20 化研科技株式会社 洗涤剂组合物用原液、洗涤剂组合物以及洗涤方法
JP2012186470A (ja) * 2011-02-18 2012-09-27 Sanyo Chem Ind Ltd 銅配線半導体用洗浄剤
CN102827707A (zh) * 2011-06-16 2012-12-19 安集微电子科技(上海)有限公司 一种等离子刻蚀残留物清洗液
CN102827708A (zh) * 2011-06-16 2012-12-19 安集微电子（上海）有限公司 一种等离子刻蚀残留物清洗液
KR101880305B1 (ko) * 2011-12-16 2018-07-20 동우 화인켐 주식회사 전자재료용 세정액 조성물
JP2013157516A (ja) * 2012-01-31 2013-08-15 Advanced Technology Materials Inc 銅配線半導体用洗浄剤
JP2014049521A (ja) * 2012-08-30 2014-03-17 Advanced Technology Materials Inc 銅配線半導体用洗浄剤
JP6544237B2 (ja) * 2013-10-23 2019-07-17 荒川化学工業株式会社 リサイクル可能な工業用共沸洗浄剤、物品の洗浄方法、工業用共沸洗浄剤の再生方法、当該再生方法により再生された工業用共沸洗浄剤、並びに洗浄再生装置
JP6226144B2 (ja) * 2014-02-27 2017-11-08 荒川化学工業株式会社 洗浄剤組成物原液、洗浄剤組成物および洗浄方法
JP6487630B2 (ja) * 2014-05-20 2019-03-20 化研テック株式会社 洗浄剤組成物用原液、洗浄剤組成物および洗浄方法

Also Published As

Publication number Publication date
CN108779419A (zh) 2018-11-09
KR20180098527A (ko) 2018-09-04
CN108779419B (zh) 2021-04-20
JPWO2017110885A1 (ja) 2017-12-28
WO2017110885A1 (ja) 2017-06-29
KR102635269B1 (ko) 2024-02-13

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