JP6529511B2 - レーザ及び深uvレーザ放射を生成する方法 - Google Patents
レーザ及び深uvレーザ放射を生成する方法 Download PDFInfo
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- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 claims description 18
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- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 claims description 4
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/39—Non-linear optics for parametric generation or amplification of light, infrared or ultraviolet waves
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/094003—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light the pumped medium being a fibre
- H01S3/094015—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light the pumped medium being a fibre with pump light recycling, i.e. with reinjection of the unused pump light back into the fiber, e.g. by reflectors or circulators
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/3534—Three-wave interaction, e.g. sum-difference frequency generation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0078—Frequency filtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
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- Testing Or Measuring Of Semiconductors Or The Like (AREA)
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Description
本願は、2014年3月20日に出願された、「レーザの帯域幅を縮小するめためのシステムと方法およびレーザを使用した検査システムと方法(A System and Method for Reducing the Bandwidth of a Laser and an Inspection System and Method Using a Laser)」と題する米国仮特許出願第61/955,792号の優先権を主張するものであり、同仮出願を参照によって本願に援用する。
本願は、2013年1月24日に出願された、「OPOを用いた193nmレーザおよび193nmレーザを用いた検査システム(193nm Laser Using OPO and an Inspection System Using a 193nm Laser)」と題する米国仮特許出願第61/756,209号、2014年1月17日に出願された、「193nmレーザおよび検査システム(193nm Laser and Inspection System)」と題する米国特許出願第14/158,615号、2013年3月12日に出願された、「固体レーザおよび193nmレーザを用いた検査システム(Solid−State Laser and Inspection System Using 193 nm Laser)」と題する米国特許出願第13/797,939号、2013年2月13日に出願された、「193nmレーザおよび193nmレーザを用いた検査システム(193nm Laser and an Inspection System Using a 193nm Laser)」と題する米国仮特許出願第61/764,441号、2014年1月31日に出願された、「193nmレーザおよび検査システム(193nm Laser and Inspection System)」と題する米国特許出願第14/170,384号、2012年12月5日に出願された、「レーザパルスマルチプライヤを用いた半導体検査および計測システム(Semiconductor Inspection and Metrology System Using Laser Pulse Multiplier)」と題する米国仮特許出願第61/733,858号、および2012年12月11日に出願された、「レーザパルスマルチプライヤを用いた半導体検査および計測システム(Semiconductor Inspection and Metrology System Using Laser Pulse Multiplier)」と題する米国特許出願第13/711,593号に関連する。これらの関連出願を、参照によって本願に援用する。
集積回路業界は、粒径が100nm以下と、微細化する欠陥や粒子を検出するために、ますます高感度の検査器具を必要としている。さらに、これらの検査器具は、フォトマスク、レチクル、またはウェハの面積の大部分、さらには100%を短時間、例えば1時間以内に検査するために、高速で動作しなければならない。
Claims (12)
- 基本波長帯域幅の基本波長を生成する基本レーザと、
基本波長の第一の部分を受け取り、第一の部分をポンプ光として用いて第二の波長を生成する周波数変換モジュールと、
基本波長の第二の部分を変換することで高調波波長を生成する高調波変換モジュールと、
前記周波数変換モジュールからの第二の波長を前記高調波変換モジュールからの高調波波長と混合して200nm未満の合計波長を生成する周波数混合モジュールと、
前記基本レーザからの前記基本波長を受け取るように配置され、前記基本波長から前記第一の部分と前記第二の部分を、前記第二の部分が基本波長帯域幅の中の、前記第一の部分より狭い波長範囲を含むように生成して前記周波数変換モジュールと前記高調波変換モジュールに出力する光学帯域幅フィルタ装置と、
を含むレーザ。 - 請求項1に記載のレーザにおいて、
光学帯域幅フィルタ装置はレーザ発振キャビティの外に位置付けられるレーザ。 - 請求項1に記載のレーザにおいて、
光学帯域幅フィルタ装置は、エタロン、光学誘電体フィルタ、体積ブラッグ回折格子、複屈折フィルタ、および光格子からなる群より選択される少なくとも1つの装置を含むレーザ。 - 請求項1に記載のレーザにおいて、
周波数変換モジュールは、光パラメトリック発振器(OPO)、光パラメトリック増幅器(OPA)、およびラマン増幅器からなる群より選択される少なくとも1つの装置を含むレーザ。 - 請求項4に記載のレーザにおいて、
第二の波長は、OPOまたはOPAからの信号光として生成されるレーザ。 - 請求項5に記載のレーザにおいて、
基本レーザは、ファイバレーザ、Nd:YAG(neodymium−doped yttrium aluminum garnet)レーザ、またはNdドープバンデートレーザを含むレーザ。 - 請求項6に記載のレーザにおいて、
合計波長は約180nm〜200nmの間の波長であるレーザ。 - 深UVレーザ放射を生成する方法であって、
基本波長と基本波長帯域幅を有する基本レーザ光を生成するステップと、
生成された基本レーザ光を第一の部分と第二の部分に分離するステップであり、第二の部分が基本波長帯域幅の中の、第一の部分より狭い波長範囲を含むように分離するステップと、
分離された第一の部分をポンプ光として用いて第二の波長を生成するステップと、
分離された第二の部分を変換することで高調波波長を生成するステップと、
生成された第二の波長と生成された高調波波長を合計して、深UV出力波長を生成するステップと、
を含む方法。 - 請求項8に記載の方法において、
分離する前記ステップは、エタロン、光学誘電体フィルタ、体積ブラッグ回折格子、複屈折フィルタ、または光格子のうちの少なくともいずれかを配置して基本レーザ光を受け取ることを含む方法。 - 請求項8に記載の方法において、
第一の部分を第二の波長に変換する前記ステップは、OPO、OPA、またはラマン増幅器により実行される方法。 - 請求項8に記載の方法において、
基本レーザ光を生成する前記ステップは、Nd:YAGレーザ、Ndドープバンデートレーザ、およびYbドープファイバレーザのうちの1つにより実行される方法。 - 請求項11に記載の方法において、
出力波長は約180nm〜200nmの間の波長である方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201461955792P | 2014-03-20 | 2014-03-20 | |
US61/955,792 | 2014-03-20 | ||
US14/300,227 US9804101B2 (en) | 2014-03-20 | 2014-06-09 | System and method for reducing the bandwidth of a laser and an inspection system and method using a laser |
US14/300,227 | 2014-06-09 | ||
PCT/US2015/021462 WO2015143152A1 (en) | 2014-03-20 | 2015-03-19 | System and method for reducing the bandwidth of a laser and an inspection system and method using a laser |
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JP2017509923A JP2017509923A (ja) | 2017-04-06 |
JP2017509923A5 JP2017509923A5 (ja) | 2018-04-26 |
JP6529511B2 true JP6529511B2 (ja) | 2019-06-12 |
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JP2016557881A Active JP6529511B2 (ja) | 2014-03-20 | 2015-03-19 | レーザ及び深uvレーザ放射を生成する方法 |
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US (2) | US9804101B2 (ja) |
EP (1) | EP3120427B1 (ja) |
JP (1) | JP6529511B2 (ja) |
KR (1) | KR102220081B1 (ja) |
CN (1) | CN106134019B (ja) |
IL (2) | IL247580B (ja) |
TW (1) | TWI658662B (ja) |
WO (1) | WO2015143152A1 (ja) |
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IL247580B (en) | 2020-05-31 |
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US20150268176A1 (en) | 2015-09-24 |
US9804101B2 (en) | 2017-10-31 |
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IL273328B (en) | 2021-07-29 |
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