JP6477174B2 - 半導体装置および半導体装置の製造方法 - Google Patents
半導体装置および半導体装置の製造方法 Download PDFInfo
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- JP6477174B2 JP6477174B2 JP2015076124A JP2015076124A JP6477174B2 JP 6477174 B2 JP6477174 B2 JP 6477174B2 JP 2015076124 A JP2015076124 A JP 2015076124A JP 2015076124 A JP2015076124 A JP 2015076124A JP 6477174 B2 JP6477174 B2 JP 6477174B2
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Description
実施の形態1にかかる半導体装置の構造について、超接合構造を備えたnチャネル型MOSFET(Metal Oxide Semiconductor Field Effect Transistor:絶縁ゲート型電界効果トランジスタ)を例に説明する。図1は、実施の形態1にかかる半導体装置の平面レイアウトを示す平面図である。図2は、図1の矩形枠Aにおける平面レイアウトを詳細に示す平面図である。図3は、図1の矩形枠Bにおける平面レイアウトを拡大して示す平面図である。図4は、図2の切断線C−C’における断面構造を示す断面図である。図1には、実施の形態1にかかる半導体装置の1/4の部分が示されている。また、図1には、第1,2並列pn層5,15を横切る平面、例えば素子活性部10aの第1並列pn層5の1/2の深さでの平面における形状が示されている。
次に、実施の形態2にかかる半導体装置の製造方法について説明する。図14は、実施の形態2にかかる半導体装置の製造途中の状態を示す平面図である。実施の形態2にかかる半導体装置の製造方法は、イオン注入により素子活性部10aに形成する不純物注入領域(図14ではn型不純物注入領域23a)の平面形状が実施の形態1にかかる半導体装置の製造方法と異なる。具体的には、段差領域25aの最外不純物注入領域26aの狭幅部(以下、第1狭幅部とする)26bの例えば第2方向xの外側の部分に凹部71を有することで、第1狭幅部26bの幅w13を部分的に狭くしている。
次に、実施の形態3にかかる半導体装置の製造方法について説明する。図15は、実施の形態3にかかる半導体装置の製造途中の状態を示す平面図である。実施の形態3にかかる半導体装置の製造方法は、イオン注入により形成する耐圧構造部10cの不純物注入領域42a,43a(図15ではn型不純物注入領域43a)の平面形状が実施の形態1にかかる半導体装置の製造方法と異なる。具体的には、段差領域25aの最外不純物注入領域26aに対向する、最外不純物注入領域26aと同導電型のn型不純物注入領域43aの幅w12を部分的に狭くしている。
2 n型バッファ層
3 第1n型領域
3a 段差領域の最外領域
3b 段差領域の最外領域の狭幅部
4 第1p型領域
5 第1並列pn層
5a,25a 段差領域
6 第1,2並列pn層間の中間領域
7 p型ベース領域
8 ソース電極
9 ドレイン電極
10a 素子活性部
10b 素子活性部と耐圧構造部との間の境界領域
10c 耐圧構造部
10d 素子周縁部
10e 第1領域
10f 第2領域
10g 第3領域
12 n-型領域
13 第2n型領域
14 第2p型領域
15 第2並列pn層
16 n型チャネルストッパー領域
17 p型最外周領域
18 チャネルストッパー電極
19 層間絶縁膜
21a〜21f n-型半導体層
22a〜22e,42a p型不純物注入領域
23a〜23e,43a n型不純物注入領域
24 エピタキシャル層
26a 段差領域の最外不純物注入領域
26b,26d 段差領域の最外不純物注入領域の狭幅部
26c 段差領域の最外不純物注入領域の広幅部
31,33 レジストマスク
32,34 イオン注入
43b 耐圧構造部の不純物注入領域の狭幅部
47 遷移領域
51,61 n+型ソース領域
52,62 p+型コンタクト領域
53,64 ゲート絶縁膜
54,65 ゲート電極
63 トレンチ
71,72 凹部
73 第3n型領域
74 第3p型領域
75 第3並列pn層
83 第4n型領域
84 第4p型領域
85 第4並列pn層
P1 第1並列pn層の繰り返しピッチ
P2 第2並列pn層の繰り返しピッチ
P3 段差領域のピッチの変わり目における第1並列pn層のピッチ
Y 第1p型領域と第2p型領域との中心が対向する位置間に挟まれた区間
a1 第1p型領域と第2p型領域との中心が対向する位置間に挟まれた区間の第1並列pn層の領域
a2 第1p型領域と第2p型領域との中心が対向する位置間に挟まれた区間の中間領域
a3 第1p型領域と第2p型領域との中心が対向する位置間に挟まれた区間の第2並列pn層の領域
a1’,a2’,a3’ 中点
d1 素子活性部に形成するn型不純物注入領域とp型不純物注入領域との間隔
d2 耐圧構造部に形成するn型不純物注入領域とp型不純物注入領域との間隔
w1 第1n型領域および第1p型領域の幅
w2 第2n型領域および第2p型領域の幅
w3 段差領域の最外領域の狭幅部の幅
w4 第1,2並列pn層間の中間領域の幅
w11 素子活性部の不純物注入領域の幅
w12 耐圧構造部の不純物注入領域の幅
w13,w21 段差領域の最外不純物注入領域の狭幅部の幅
w22 耐圧構造部の不純物注入領域の狭幅部の幅
t1 段差領域の最外不純物注入領域の狭幅部の長さ
t2 耐圧構造部の不純物注入領域の狭幅部の長さ
x 並列pn層のストライプと直交する横方向(第2方向)
y 並列pn層のストライプの延びる横方向(第1方向)
z 深さ方向
Claims (18)
- 第1主面側に設けられた表面素子構造と、
第2主面側に設けられた低抵抗層と、
前記表面素子構造と前記低抵抗層との間に設けられた、第1の第1導電型領域および第1の第2導電型領域が前記第1主面に平行な方向に交互に配置される第1並列pn層と、
前記第1並列pn層の周囲を囲むように設けられた、前記第1の第1導電型領域および前記第1の第2導電型領域の繰り返しピッチよりも狭いピッチで第2の第1導電型領域および第2の第2導電型領域が前記第1主面に平行な方向に交互に配置される第2並列pn層と、
を備え、
前記第1の第1導電型領域および前記第1の第2導電型領域は、ストライプ状の平面レイアウトに配置され、
前記第1並列pn層の平面形状は、前記第1の第1導電型領域および前記第1の第2導電型領域の、ストライプ状に延びる第1方向の長さを段階的に短くしてなる段階状のコーナー部を有する矩形状を有し、
前記第1の第1導電型領域または前記第1の第2導電型領域は、
段階状を有する部分で、前記第1方向に平行に前記第2の第1導電型領域または前記第2の第2導電型領域と隣り合う第1部分と、前記第1方向と直交する第2方向に前記第2の第2導電型領域または前記第2の第1導電型領域に対向する第2部分と、を備え、
前記第2方向の前記第1部分の幅は、前記第2部分の幅よりも狭くなっていることを特徴とする半導体装置。 - 前記第1部分は、前記第2並列pn層を構成する前記第2の第1導電型領域または前記第2の第2導電型領域のうちの導電型の異なる領域が隣り合うことを特徴とする請求項1に記載の半導体装置。
- 前記第1部分は、前記第2部分側の部分で前記第1部分の他の部分よりも幅が狭くなっている第1凹部を備えることを特徴とする請求項1または2に記載の半導体装置。
- 前記第1部分は、前記第2並列pn層を構成する前記第2の第1導電型領域または前記第2の第2導電型領域のうちの同導電型領域に前記第1方向に接しており、
前記同導電型領域は、前記第1部分側の部分で前記同導電型領域の他の部分よりも幅が狭くなっている第2凹部を備えることを特徴とする請求項1または2に記載の半導体装置。 - 前記第1の第1導電型領域および前記第1の第2導電型領域の長さは、前記第1並列pn層のコーナー部において前記第1の第1導電型領域および前記第1の第2導電型領域をそれぞれ2ピッチ以上繰り返すごとに段階的に短くなっていることを特徴とする請求項1〜4のいずれか一つに記載の半導体装置。
- 前記第2の第1導電型領域および前記第2の第2導電型領域は、前記第1の第1導電型領域および前記第1の第2導電型領域と同じ向きのストライプ状の平面レイアウトに配置されていることを特徴とする請求項1〜5のいずれか一つに記載の半導体装置。
- 対向する前記第1並列pn層と前記第2並列pn層との間に、
前記第1並列pn層に接するように設けられた、前記第1の第1導電型領域よりも平均不純物濃度の低い第3の第1導電型領域および前記第1の第2導電型領域よりも平均不純物濃度の低い第3の第2導電型領域と、
前記第2並列pn層に接するように設けられた、前記第2の第1導電型領域よりも平均不純物濃度の低い第4の第1導電型領域および前記第2の第2導電型領域よりも平均不純物濃度の低い第4の第2導電型領域と、を有する中間領域をさらに備え、
前記第1部分は、前記中間領域を介して前記第2方向に前記第2並列pn層に接することを特徴とする請求項1〜6のいずれか一つに記載の半導体装置。 - 前記表面素子構造および前記第1並列pn層が配置され、オン状態の時に電流が流れる素子活性部と、
前記第2並列pn層が配置された、前記素子活性部を囲む素子周縁部と、
をさらに備えることを特徴とする請求項1〜7のいずれか一つに記載の半導体装置。 - 第1導電型半導体層を堆積する第1工程と、
前記第1導電型半導体層の表面層に、前記第1導電型半導体層の表面に平行な方向に交互に配置されるように第1の第1導電型不純物注入領域および第1の第2導電型不純物注入領域を形成するとともに、前記第1の第1導電型不純物注入領域および前記第1の第2導電型不純物注入領域の繰り返しピッチよりも狭いピッチで前記第1導電型半導体層の表面に平行な方向に交互に配置されるように第2の第1導電型不純物注入領域および第2の第2導電型不純物注入領域を形成する第2工程と、
を繰り返し行う形成工程と、
熱処理により、前記第1の第1導電型不純物注入領域および前記第1の第2導電型不純物注入領域を拡散させて第1の第1導電型領域および第1の第2導電型領域が交互に配置された第1並列pn層を形成するとともに、前記第2の第1導電型不純物注入領域および前記第2の第2導電型不純物注入領域を拡散させて第2の第1導電型領域および第2の第2導電型領域が交互に配置された第2並列pn層を形成する熱処理工程と、
を含み、
前記第2工程では、
ストライプ状の平面レイアウトに、かつストライプ状に延びる第1方向の長さを段階的に短くして前記第1の第1導電型不純物注入領域および前記第1の第2導電型不純物注入領域を配置することで、前記第1並列pn層の第1形成領域の平面形状を段階状のコーナー部を有する矩形状にし、
段階状を形成する部分で前記第1の第1導電型不純物注入領域または前記第1の第2導電型不純物注入領域に前記第1方向と直交する第2方向に対向するように、前記第2並列pn層の第2形成領域を配置し、
前記第1の第1導電型不純物注入領域または前記第1の第2導電型不純物注入領域の、前記第2形成領域に対向する第1部分の幅を前記第1部分以外の第2部分の幅よりも狭くすることを特徴とする半導体装置の製造方法。 - 前記第2工程では、前記第1部分に前記第2方向に導電型の異なる領域が対向するように、前記第2形成領域に前記第2の第1導電型不純物注入領域および前記第2の第2導電型不純物注入領域を配置することを特徴とする請求項9に記載の半導体装置の製造方法。
- 前記第2工程では、前記第1部分の前記第2部分側の部分の幅を、前記第1部分の他の部分の幅よりも狭くする第3凹部を形成することを特徴とする請求項9または10に記載の半導体装置の製造方法。
- 前記第2工程では、
前記第1部分に前記第1方向に、前記第2の第1導電型不純物注入領域および前記第2の第2導電型不純物注入領域のうちの同導電型領域が対向するように、前記第2の第1導電型不純物注入領域および前記第2の第2導電型不純物注入領域を配置し、
前記同導電型領域の前記第1部分側の部分の幅を、前記同導電型領域の他の部分の幅よりも狭くする第4凹部を形成することを特徴とする請求項9または10に記載の半導体装置の製造方法。 - 前記第2工程では、前記第1の第1導電型不純物注入領域および前記第1の第2導電型不純物注入領域の前記第1方向の長さを、前記第1の第1導電型領域および前記第1の第2導電型領域をそれぞれ2ピッチ以上繰り返すごとに段階的に短くすることで、前記第1形成領域のコーナー部の平面形状を段階状にすることを特徴とする請求項9〜12のいずれか一つに記載の半導体装置の製造方法。
- 前記第2工程では、前記第1の第1導電型不純物注入領域および前記第1の第2導電型不純物注入領域と同じ向きのストライプ状の平面レイアウトに前記第2の第1導電型不純物注入領域および前記第2の第2導電型不純物注入領域を配置することを特徴とする請求項9〜13のいずれか一つに記載の半導体装置の製造方法。
- 前記第2工程では、前記第1の第1導電型不純物注入領域および前記第1の第2導電型不純物注入領域よりも外側に所定幅離した位置に、前記第2の第1導電型不純物注入領域および前記第2の第2導電型不純物注入領域を配置し、
前記熱処理工程では、前記第1並列pn層と前記第2並列pn層との間に、前記第1の第1導電型不純物注入領域、前記第1の第2導電型不純物注入領域、前記第2の第1導電型不純物注入領域および前記第2の第2導電型不純物注入領域を拡散させて、前記第1の第1導電型領域よりも平均不純物濃度の低い第3の第1導電型領域および前記第1の第2導電型領域よりも平均不純物濃度の低い第3の第2導電型領域と、前記第2の第1導電型領域よりも平均不純物濃度の低い第4の第1導電型領域および前記第2の第2導電型領域よりも平均不純物濃度の低い第4の第2導電型領域と、を有する中間領域を形成することを特徴とする請求項9〜14のいずれか一つに記載の半導体装置の製造方法。 - 前記第2工程では、前記第2方向に前記第2形成領域よりも離した位置に前記第1部分を配置し、
前記熱処理工程では、前記第1部分と前記第2形成領域との間に前記中間領域を形成することを特徴とする請求項15に記載の半導体装置の製造方法。 - 前記第1導電型半導体層よりも抵抗の低い低抵抗層上に前記第1並列pn層および前記第2並列pn層を形成し、
前記熱処理工程の後、前記第1並列pn層の前記低抵抗層側に対して反対側に表面素子構造を形成することを特徴とする請求項9〜16のいずれか一つに記載の半導体装置の製造方法。 - 前記第1並列pn層を、オン状態の時に電流が流れる素子活性部に形成し、
前記第2並列pn層を、前記素子活性部を囲む素子周縁部に形成することを特徴とする請求項9〜17のいずれか一つに記載の半導体装置の製造方法。
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CN103824884A (zh) * | 2012-11-19 | 2014-05-28 | 比亚迪股份有限公司 | 一种超级结mosfet、该超级结mosfet的形成方法 |
JP6197294B2 (ja) * | 2013-01-16 | 2017-09-20 | 富士電機株式会社 | 半導体素子 |
CN104183627B (zh) * | 2014-08-29 | 2017-05-03 | 电子科技大学 | 一种超结功率器件终端结构 |
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