JP6476302B2 - 着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置 - Google Patents

着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置 Download PDF

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JP6476302B2
JP6476302B2 JP2017537671A JP2017537671A JP6476302B2 JP 6476302 B2 JP6476302 B2 JP 6476302B2 JP 2017537671 A JP2017537671 A JP 2017537671A JP 2017537671 A JP2017537671 A JP 2017537671A JP 6476302 B2 JP6476302 B2 JP 6476302B2
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JPWO2017038339A1 (ja
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金子　祐士
祐士 金子
高桑　英希
英希 高桑
恒光 留場
恒光 留場
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Fujifilm Corp
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/1462—Coatings
    • H01L27/14621—Colour filter arrangements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Power Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Solid State Image Pick-Up Elements (AREA)
JP2017537671A 2015-08-31 2016-08-01 着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置 Active JP6476302B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015171586 2015-08-31
JP2015171586 2015-08-31
PCT/JP2016/072492 WO2017038339A1 (ja) 2015-08-31 2016-08-01 着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置

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JPWO2017038339A1 JPWO2017038339A1 (ja) 2018-03-01
JP6476302B2 true JP6476302B2 (ja) 2019-02-27

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JP (1) JP6476302B2 (zh)
KR (1) KR102079525B1 (zh)
TW (1) TWI699618B (zh)
WO (1) WO2017038339A1 (zh)

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KR102599867B1 (ko) * 2017-04-21 2023-11-09 닛산 가가쿠 가부시키가이샤 감광성 수지 조성물
WO2018194169A1 (ja) * 2017-04-21 2018-10-25 日産化学株式会社 感光性樹脂組成物
WO2019058859A1 (ja) * 2017-09-20 2019-03-28 富士フイルム株式会社 着色組成物、硬化膜、パターン形成方法、カラーフィルタ、固体撮像素子及び画像表示装置
KR102456394B1 (ko) * 2018-03-20 2022-10-19 동우 화인켐 주식회사 녹색 감광성 수지 조성물 및 이를 포함하는 컬러필터
WO2019202908A1 (ja) * 2018-04-19 2019-10-24 富士フイルム株式会社 パターンの製造方法、光学フィルタの製造方法、固体撮像素子の製造方法、画像表示装置の製造方法、光硬化性組成物および膜
WO2020066919A1 (ja) * 2018-09-26 2020-04-02 富士フイルム株式会社 着色組成物、硬化膜の形成方法、カラーフィルタの製造方法および表示装置の製造方法
JPWO2020202329A1 (ja) * 2019-03-29 2021-10-28 昭和電工マテリアルズ株式会社 感光性樹脂組成物、硬化物、感光性エレメント、及び、レジストパターンの製造方法
WO2021014759A1 (ja) * 2019-07-22 2021-01-28 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置
CN114846405A (zh) * 2019-12-20 2022-08-02 三菱化学株式会社 感光性树脂组合物、间隔壁、有机场致发光元件、以及图像显示装置
CN116249920A (zh) 2020-11-17 2023-06-09 株式会社艾迪科 着色层的制造方法、剂及层叠体
CN115207003A (zh) * 2021-04-09 2022-10-18 和鑫光电股份有限公司 光感测装置的光感测单元
KR102352657B1 (ko) * 2021-07-19 2022-01-18 동우 화인켐 주식회사 반사방지 필름 및 이를 포함하는 유기발광 표시장치
WO2024053662A1 (ja) * 2022-09-07 2024-03-14 富士フイルム株式会社 光吸収フィルタ、光学フィルタ及びその製造方法、有機エレクトロルミネッセンス表示装置、無機エレクトロルミネッセンス表示装置及び液晶表示装置

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JP2008249868A (ja) * 2007-03-29 2008-10-16 Fujifilm Corp 感光性樹脂組成物、感光性転写材料、表示装置用遮光膜及びその製造方法、遮光膜付基板、液晶表示素子、並びに、液晶表示装置
JP5535814B2 (ja) * 2009-09-14 2014-07-02 富士フイルム株式会社 光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、液晶表示装置、平版印刷版原版、並びに、新規化合物
JP5657442B2 (ja) 2011-03-22 2015-01-21 富士フイルム株式会社 着色感放射線性組成物、パターンの形成方法、カラーフィルタ及びそのカラーフィルタの製造方法、並びに、固体撮像素子
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JP2015082046A (ja) * 2013-10-23 2015-04-27 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、及び、電子デバイス

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KR20180034570A (ko) 2018-04-04
TW201708955A (zh) 2017-03-01
KR102079525B1 (ko) 2020-02-20
WO2017038339A1 (ja) 2017-03-09
TWI699618B (zh) 2020-07-21
JPWO2017038339A1 (ja) 2018-03-01

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