JP6462882B2 - センサ基板およびセンサ装置 - Google Patents
センサ基板およびセンサ装置 Download PDFInfo
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- JP6462882B2 JP6462882B2 JP2017530860A JP2017530860A JP6462882B2 JP 6462882 B2 JP6462882 B2 JP 6462882B2 JP 2017530860 A JP2017530860 A JP 2017530860A JP 2017530860 A JP2017530860 A JP 2017530860A JP 6462882 B2 JP6462882 B2 JP 6462882B2
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- 238000010438 heat treatment Methods 0.000 claims description 55
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- 238000001514 detection method Methods 0.000 description 126
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- 239000010419 fine particle Substances 0.000 description 28
- 239000000463 material Substances 0.000 description 27
- 239000004020 conductor Substances 0.000 description 26
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 25
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 21
- 229910052751 metal Inorganic materials 0.000 description 20
- 239000002184 metal Substances 0.000 description 20
- 239000000919 ceramic Substances 0.000 description 19
- 239000010953 base metal Substances 0.000 description 17
- 239000004071 soot Substances 0.000 description 17
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 16
- 239000011651 chromium Substances 0.000 description 15
- BIJOYKCOMBZXAE-UHFFFAOYSA-N chromium iron nickel Chemical compound [Cr].[Fe].[Ni] BIJOYKCOMBZXAE-UHFFFAOYSA-N 0.000 description 14
- 230000003647 oxidation Effects 0.000 description 13
- 238000007254 oxidation reaction Methods 0.000 description 13
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 12
- 229910052804 chromium Inorganic materials 0.000 description 12
- 239000007789 gas Substances 0.000 description 12
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 description 12
- 229910052742 iron Inorganic materials 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 239000010936 titanium Substances 0.000 description 10
- 238000010304 firing Methods 0.000 description 9
- 229910052759 nickel Inorganic materials 0.000 description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 229910052697 platinum Inorganic materials 0.000 description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- 230000008859 change Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 230000001965 increasing effect Effects 0.000 description 6
- 239000000956 alloy Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical group [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 description 5
- 238000005219 brazing Methods 0.000 description 5
- 230000003197 catalytic effect Effects 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 229910021344 molybdenum silicide Inorganic materials 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000000788 chromium alloy Substances 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910016006 MoSi Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- NEIHULKJZQTQKJ-UHFFFAOYSA-N [Cu].[Ag] Chemical compound [Cu].[Ag] NEIHULKJZQTQKJ-UHFFFAOYSA-N 0.000 description 1
- KGWWEXORQXHJJQ-UHFFFAOYSA-N [Fe].[Co].[Ni] Chemical compound [Fe].[Co].[Ni] KGWWEXORQXHJJQ-UHFFFAOYSA-N 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010344 co-firing Methods 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/06—Investigating concentration of particle suspensions
- G01N15/0606—Investigating concentration of particle suspensions by collecting particles on a support
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/06—Investigating concentration of particle suspensions
- G01N15/0656—Investigating concentration of particle suspensions using electric, e.g. electrostatic methods or magnetic methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/02—Devices for withdrawing samples
- G01N1/22—Devices for withdrawing samples in the gaseous state
- G01N1/2247—Sampling from a flowing stream of gas
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N2015/0042—Investigating dispersion of solids
- G01N2015/0046—Investigating dispersion of solids in gas, e.g. smoke
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- Chemical & Material Sciences (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Dispersion Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Description
Claims (7)
- 絶縁基板と、
該絶縁基板の主面に設けられた検知電極と、
前記絶縁基板の内部に設けられ、発熱電極を含む抵抗配線とを有しており、
該抵抗配線は、前記発熱電極に接続され、配線および他の配線が並列に接続された多層配線部を有しており、
前記配線または前記他の配線は、前記発熱電極に接続された端部から他の端部にかけて幅が漸次狭くなっていることを特徴とするセンサ基板。 - 絶縁基板と、
該絶縁基板の主面に設けられた検知電極と、
前記絶縁基板の内部に設けられ、発熱電極を含む抵抗配線とを有しており、
該抵抗配線は、前記発熱電極に接続され、配線および他の配線が並列に接続された多層配線部を有しており、
前記配線および前記他の配線は、前記絶縁基板の厚み方向において隣接しており、平面透視で互いに重ならないように配置されていることを特徴とするセンサ基板。 - 前記多層配線部は、前記配線および前記他の配線が前記絶縁基板の厚み方向に多層に設けられていることを特徴とする請求項1または請求項2に記載のセンサ基板。
- 平面透視において、前記他の配線が前記配線に挟まれるように配置されていることを特徴とする請求項2に記載のセンサ基板。
- 平面透視において、前記配線と前記他の配線とが互いに挟まれる部分を有するように配置されていることを特徴とする請求項2に記載のセンサ基板。
- 前記検知電極は、くし歯状のパターンであり、互いにかみ合うように配置されていることを特徴とする請求項1乃至請求項5のいずれかに記載のセンサ基板。
- 請求項1乃至請求項6のいずれかに記載のセンサ基板と、
前記発熱電極に電位を供給する電源部とを有していることを特徴とするセンサ装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015148711 | 2015-07-28 | ||
JP2015148711 | 2015-07-28 | ||
PCT/JP2016/071741 WO2017018383A1 (ja) | 2015-07-28 | 2016-07-25 | センサ基板およびセンサ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2017018383A1 JPWO2017018383A1 (ja) | 2017-11-16 |
JP6462882B2 true JP6462882B2 (ja) | 2019-01-30 |
Family
ID=57884345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017530860A Active JP6462882B2 (ja) | 2015-07-28 | 2016-07-25 | センサ基板およびセンサ装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US10338019B2 (ja) |
EP (1) | EP3330702B1 (ja) |
JP (1) | JP6462882B2 (ja) |
CN (1) | CN107209135B (ja) |
WO (1) | WO2017018383A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3382379A4 (en) * | 2015-11-25 | 2019-08-14 | Kyocera Corporation | SENSOR SUBSTRATE AND SENSOR DEVICE |
JP2020034349A (ja) * | 2018-08-28 | 2020-03-05 | イビデン株式会社 | 粒子状物質検出センサ素子 |
JP2020034348A (ja) * | 2018-08-28 | 2020-03-05 | イビデン株式会社 | 粒子状物質検出センサ素子 |
JP7285056B2 (ja) * | 2018-09-21 | 2023-06-01 | Koa株式会社 | 流量センサ装置 |
CN109324219B (zh) * | 2018-11-28 | 2024-07-12 | 钧崴电子科技股份有限公司 | 短电极四端子电流感测组件及其生产工艺 |
CN112965116A (zh) * | 2021-03-29 | 2021-06-15 | 上海和辉光电股份有限公司 | 一种涂布中检知基板金属异物的装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
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US3839660A (en) * | 1973-02-05 | 1974-10-01 | Gen Motors Corp | Power semiconductor device package |
DE2836002C2 (de) | 1978-08-17 | 1986-09-11 | Robert Bosch Gmbh, 7000 Stuttgart | Sensor zur Überwachung der Rußfreiheit von Abgasen |
JPS59197847A (ja) | 1983-04-25 | 1984-11-09 | Ngk Spark Plug Co Ltd | スモーク濃度センサ |
JPS59225587A (ja) * | 1983-06-06 | 1984-12-18 | 株式会社日立製作所 | セラミツク配線基板 |
US4785243A (en) * | 1987-01-29 | 1988-11-15 | Ltv Steel Company | Electronically scanned eddy current flaw inspection |
US5766780A (en) * | 1996-10-15 | 1998-06-16 | Seagate Technology, Inc. | Reversed order NIMN exchange biasing for dual magnetoresistive heads |
JPH10267895A (ja) * | 1997-03-26 | 1998-10-09 | Ngk Spark Plug Co Ltd | 排気ガスセンサ及びそれを用いた排気ガスセンサシステム |
JP3316447B2 (ja) * | 1998-04-28 | 2002-08-19 | 三洋電機株式会社 | 集積回路 |
US7352191B2 (en) * | 2005-04-04 | 2008-04-01 | 3M Innovative Properties Company | Sensor assembly and method of forming the same |
JP2007024538A (ja) * | 2005-07-12 | 2007-02-01 | Yamaha Motor Co Ltd | ガス検出装置の温度制御装置ならびにそれを備える空燃比制御装置及び内燃機関 |
WO2009032262A1 (en) * | 2007-08-30 | 2009-03-12 | Ceramatec, Inc. | Ceramic particulate matter sensor with low electrical leakage |
JP5635776B2 (ja) * | 2010-01-07 | 2014-12-03 | 日本碍子株式会社 | 粒子状物質検出装置、及び粒子状物質検出装置の検査方法 |
JP2011226832A (ja) * | 2010-04-16 | 2011-11-10 | Ngk Insulators Ltd | 粒子状物質検出装置 |
JP5500028B2 (ja) * | 2010-09-30 | 2014-05-21 | 株式会社デンソー | 粒子状物質検出センサの製造方法 |
US9681996B2 (en) * | 2011-08-11 | 2017-06-20 | 3M Innovative Properties Company | Wetness sensors |
WO2013134610A1 (en) * | 2012-03-08 | 2013-09-12 | Quality Manufacturing Inc. | Touch sensitive robotic gripper |
JP5984505B2 (ja) * | 2012-05-22 | 2016-09-06 | 株式会社日立製作所 | 半導体ガスセンサおよびその製造方法 |
-
2016
- 2016-07-25 US US15/554,108 patent/US10338019B2/en active Active
- 2016-07-25 CN CN201680009483.9A patent/CN107209135B/zh active Active
- 2016-07-25 EP EP16830488.9A patent/EP3330702B1/en active Active
- 2016-07-25 WO PCT/JP2016/071741 patent/WO2017018383A1/ja active Application Filing
- 2016-07-25 JP JP2017530860A patent/JP6462882B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
US20180052128A1 (en) | 2018-02-22 |
CN107209135B (zh) | 2019-10-01 |
EP3330702B1 (en) | 2020-05-27 |
EP3330702A1 (en) | 2018-06-06 |
WO2017018383A1 (ja) | 2017-02-02 |
US10338019B2 (en) | 2019-07-02 |
CN107209135A (zh) | 2017-09-26 |
JPWO2017018383A1 (ja) | 2017-11-16 |
EP3330702A4 (en) | 2019-03-13 |
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