JP6440551B2 - シリカ粒子の製造方法 - Google Patents

シリカ粒子の製造方法 Download PDF

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Publication number
JP6440551B2
JP6440551B2 JP2015072668A JP2015072668A JP6440551B2 JP 6440551 B2 JP6440551 B2 JP 6440551B2 JP 2015072668 A JP2015072668 A JP 2015072668A JP 2015072668 A JP2015072668 A JP 2015072668A JP 6440551 B2 JP6440551 B2 JP 6440551B2
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silica particles
particles
dispersion
silica
silicon
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Japanese (ja)
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JP2016190769A (ja
JP2016190769A5 (enrdf_load_stackoverflow
Inventor
美紀 江上
美紀 江上
宏忠 荒金
宏忠 荒金
良 村口
良 村口
小松　通郎
通郎 小松
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JGC Catalysts and Chemicals Ltd
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JGC Catalysts and Chemicals Ltd
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JP2015072668A 2015-03-31 2015-03-31 シリカ粒子の製造方法 Active JP6440551B2 (ja)

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JP2015072668A JP6440551B2 (ja) 2015-03-31 2015-03-31 シリカ粒子の製造方法

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JP2015072668A JP6440551B2 (ja) 2015-03-31 2015-03-31 シリカ粒子の製造方法

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JP2016190769A JP2016190769A (ja) 2016-11-10
JP2016190769A5 JP2016190769A5 (enrdf_load_stackoverflow) 2018-04-26
JP6440551B2 true JP6440551B2 (ja) 2018-12-19

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111032801B (zh) * 2017-08-31 2021-08-24 日挥触媒化成株式会社 硬质涂层形成用涂料组合物及光学部件
JP7470508B2 (ja) * 2018-11-22 2024-04-18 株式会社日本触媒 シリカ粉体、シリカ粉体の製造方法、および焼成シリカ粉体の製造方法
JP7225898B2 (ja) * 2019-02-21 2023-02-21 三菱ケミカル株式会社 シリカ粒子の製造方法、シリカゾルの製造方法及び研磨方法
JP7491081B2 (ja) * 2020-06-22 2024-05-28 三菱ケミカル株式会社 シリカ粒子の製造方法、シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法
CN112919542B (zh) * 2021-03-05 2024-04-19 赵琳琳 一种复合电镀用改性颗粒的制备方法
KR20250030503A (ko) * 2022-07-22 2025-03-05 가부시키가이샤 닛폰 쇼쿠바이 조성물

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4184683B2 (ja) * 2002-03-19 2008-11-19 宇部日東化成株式会社 金属酸化物球状粒子およびその製造方法
JP4731137B2 (ja) * 2004-07-06 2011-07-20 日揮触媒化成株式会社 シリカ系微粒子の製造方法
WO2006009132A1 (ja) * 2004-07-21 2006-01-26 Catalysts & Chemicals Industries Co., Ltd. シリカ系微粒子、その製造方法、被膜形成用塗料および被膜付基材
KR102260856B1 (ko) * 2013-08-01 2021-06-03 닛키 쇼쿠바이카세이 가부시키가이샤 해쇄 실리카 입자의 제조방법 및 그 입자를 포함하는 수지 조성물

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