JP6421083B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP6421083B2 JP6421083B2 JP2015120155A JP2015120155A JP6421083B2 JP 6421083 B2 JP6421083 B2 JP 6421083B2 JP 2015120155 A JP2015120155 A JP 2015120155A JP 2015120155 A JP2015120155 A JP 2015120155A JP 6421083 B2 JP6421083 B2 JP 6421083B2
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Description
そのため、積層された複数の半導体チップを有する半導体装置が提案されている。
ここで、複数の半導体チップを積層した際に、半導体チップの積層体に反りが発生する場合がある。積層体に反りが発生すると、積層体の封止や、積層体と電気的に接続される配線の形成が困難となり生産性が低下するおそれがある。
また、複数の半導体チップを基板上で積層する際には、半導体チップの反りの影響で、チップの電極と基板上の電極との位置合わせが難しくなり、生産性の向上が図れないという問題もある。
そのため、複数の半導体チップが積層された積層体を備え、高い生産性を有する半導体装置の製造方法、および半導体装置の開発が望まれていた。
なお、各図面中、同様の構成要素には同一の符号を付して詳細な説明は適宜省略する。 また、各図面中の矢印X、Y、Zは互いに直交する三方向を表している。例えば、基板2の主面に対して垂直な方向(積層方向)をZ方向としている。また、基板2の主面に対して平行な平面内の1つの方向をX方向とし、Z方向とX方向とに垂直な方向をY方向としている。
また、一例として、半導体装置1がNAND型フラッシュメモリなどの不揮発性半導体記憶装置である場合を例示する。ただし、半導体装置1は不揮発性半導体記憶装置に限定されるわけではない。
図1(a)、図1(b)、図2(a)〜(d)および図3(a)〜(e)は、第1の実施形態に係る半導体装置の製造方法について例示するための模式工程図である。
なお、図1(a)は模式平面図、図1(b)〜図3(e)は模式断面図である。
まず、図1(a)および図1(b)に示すように、基板2に溝2a(第1の溝の一例に相当する)、および溝2b(第2の溝の一例に相当する)を形成する。
溝2a、および溝2bは、例えば、ブレードダイシング法を用いて形成することができる。
溝2a、および溝2bは、基板2の一方の主面に形成される。
溝2aは、所定の間隔をあけて互いに平行となるように複数設けられている。
溝2aは、X方向(第1の方向の一例に相当する)に延びている。
溝2bは、所定の間隔をあけて互いに平行となるように複数設けられている。
溝2bは、Y方向(第2の方向の一例に相当する)に延びている。
溝2aの幅寸法W1、および溝2bの幅寸法W2は、後述する個片化の際に用いられるブレード100の厚み寸法Tよりも長くなっている。溝2bの幅寸法W2は、溝2aの幅寸法W1と同じとすることもできるし、溝2aの幅寸法W1と異なるものとすることもできる。
ただし、溝2bの深さ寸法D2を溝2aの深さ寸法D1と同じとし、溝2bの幅寸法W2を溝2aの幅寸法W1と同じとすれば、生産効率を向上させることができる。
そのため、複数の溝2a同士の間隔と、複数の溝2b同士の間隔は、半導体チップ3の平面寸法を考慮して決定することができる。
複数の領域2cは、マトリクス状に並んでいる。
そのため、基板2は、溝2a、および溝2bを有していても熱応力による変形や反りなどを抑制することができるような厚みとされている。
基板2に変形や反りなどが発生しなければ、積層体30の変形や反りを抑制することができる。積層体30の変形や反りを抑制することができれば、バンプ電極3bや接着層13が剥がれるのを抑制したり、配線層8の形成を容易としたりすることができる。
また、熱応力を低減させるために、基板2の熱膨張率は、半導体チップ3の熱膨張率となるべく同じとなるようにすることが好ましい。
この場合、半導体チップ3の主成分はシリコンであるため、基板2はシリコンを含むものとすることができる。
また、シリコンを含む基板2とすれば、加工性を向上させることもできる。
例えば、X方向に延びる複数の溝2aと、Y方向に延びる複数の溝2bとを有する基板2において、複数の溝2aと複数の溝2bとにより画された複数の領域2cのそれぞれに、複数の半導体チップ3を積層する。
1つの領域2cの上には、1つの積層体30が形成される。
積層体30は、領域2cの上に、複数の半導体チップ3を順次積層することで形成することができる。
本実施の形態においては、複数の半導体チップ3を順次積層する際に、溝2a、溝2b、および領域2cの輪郭の少なくともいずれかを位置合わせ用のマークとすることができる。
そのため、領域2cの上に接着される半導体チップ3の位置精度、および複数の半導体チップ3同士の間の位置精度、ひいては積層体30の位置精度や形状精度を向上させることができる。
積層体30に含まれる半導体チップ3の数は、例示をしたものに限定されるわけではなく、半導体チップ3の記憶容量、半導体装置1の記憶容量や用途などに応じて適宜変更することができる。
積層体30に含まれる半導体チップ3は、同じ構成を有するものとすることもできるし、異なる構成を有するものとすることもできる。
例えば、領域2cの上に設けられる半導体チップ3は、図示しないメモリセルアレイに電気的に接続されたバンプ電極3bを有し、貫通電極3aを有していなくてもよい。
キュア処理を施すなどして接着剤を硬化させることで、領域2cと半導体チップ3との間、および半導体チップ3同士の間に絶縁性を有する接着層13が形成される。
そして、バンプ電極3b同士を接触させた状態で積層体30を加熱し、バンプ電極3bを溶融させて一体化する。
なお、バンプ電極3b同士の一体化は必ずしも必要ではないが、バンプ電極3b同士を一体化すれば電気的な接続に関する信頼性を向上させることができる。
以上の様にして、複数の半導体チップ3が機械的および電気的に接続される。
バンプ電極3b同士を一体化する場合には、Z方向に隣接する2つのバンプ電極3bのうち少なくともいずれかは、半田材料から形成することができる。
半田材料は、Sn合金、Sn−Cu合金、Sn−Ag合金、Sn−Ag−Cu合金などとすることができる。
バンプ電極3b同士を一体化しない場合や、Z方向に隣接する2つのバンプ電極3bのうち一方を半田材料から形成しない場合には、バンプ電極3bは、例えば、Au、Cu、Ni、Sn、Pd、Agなどの金属、または、これらの金属を含む合金から形成することができる。バンプ電極3bは、単層膜とすることもできるし、複数の金属膜からなる積層膜とすることもできる。積層膜は、例えば、Ni/AuやNi/Pd/Auなどとすることができる。
この場合、Z方向に隣接する2つのバンプ電極3bのうち少なくともいずれかの形状を凸状とすれば、バンプ電極3b同士を接触させるのが容易となる。
この場合、積層膜からなるバンプ電極3bの形状は平面状とし、半田材料からなるバンプ電極3bの形状は凸状とすることが好ましい。
この様にすれば、下側に設けられた半導体チップ3の上面に平面状のバンプ電極3bが設けられ、上側に設けられた半導体チップ3の下面に凸状のバンプ電極3bが設けられることになる。そのため、上側に設けられた半導体チップ3の姿勢の安定性、バンプ電極3b同士の接触に対する信頼性、複数の半導体チップ3を積層する際の作業性などを向上させることができる。
半導体チップ3の平面形状は、例えば、四角形とすることができる。
この場合、領域2cの上に接着される半導体チップ3の厚みを他の半導体チップ3の厚みよりも厚くすることもできる。
インターフェースチップ4は、積層体30に含まれる複数の半導体チップ3と、半導体装置1の外部に設けられたデバイスとの間でデータ通信を行うためのインターフェース回路を有している。
なお、インターフェースチップ4は、少なくともインターフェース回路を有しているものであればよい。
例えば、インターフェースチップ4は、コントローラ回路をも有するものであってもよい。
積層体30の最上部に設けられた半導体チップ3の上面には、半導体装置1の外部に設けられたデバイスと、インターフェースチップ4の図示しない外部接続用電極とを電気的に接続するための配線3cがもうけられている。
この場合、インターフェースチップ4は、積層体30の最上部に設けられたバンプ電極3bおよび配線3cとフリップチップ接続することができる。
アンダーフィル樹脂は、補強のために充填される。
アンダーフィル樹脂を充填した際、余ったアンダーフィル樹脂は、積層体30の側面に付着する。
アンダーフィル樹脂を硬化させることで樹脂部5が形成される。
そのため、半導体装置1を個片化した際に封止部7から樹脂部5が露出することになる。
ところが、樹脂部5は、補強のためのものであるため、必ずしもこれらのことを考慮する必要はない。
そのため、封止部7から樹脂部5が露出していると、半導体装置1の信頼性が低下するおそれがある。
すなわち、積層された複数の半導体チップ3の側面に付着したアンダーフィル樹脂は、溝2a、および溝2bの少なくともいずれかにより、隣接する領域2cへの流出が抑制される。
スルービア電極6は、例えば、Auスタッドバンプや、Cuなどの金属コアと金属コアを覆う半田層とを有する柱状体などとすることができる。
すなわち、基板2の複数の半導体チップ3が積層された側を覆う封止部7を形成する。
封止部7は、例えば、モールド成形法を用いて形成することができる。
封止部7の材料は、例えば、エポキシ樹脂などの絶縁性樹脂とすることができる。
例えば、封止部7の上面を研削加工して、スルービア電極6の上端面を露出させるようにすることができる。
例えば、基板2の積層体30が設けられた側とは反対側の面を研削加工して、溝2a、および溝2bを露出させるようにすることができる。
この場合、溝2a、および溝2bの内部に封止部7が設けられていれば、封止部7が露出した時点を加工の終点とすることができる。
配線層8は、スルービア電極6の上端面と電気的に接続される。そのため、配線層8は、スルービア電極6、配線3c、貫通電極3a、およびバンプ電極3bを介して、積層された複数の半導体チップ3と電気的に接続される。
配線層8は、例えばメッキ法を用いて形成することができる。
絶縁層9は、配線層8同士の間に設けられ、配線層8同士の間を絶縁する。
本実施の形態においては、溝2a、溝2b、および領域2cの輪郭の少なくともいずれかを位置合わせマークとして、半導体チップ3を領域2c上に精度よく積層している。そのため、基板2の積層体30が設けられた側とは反対側の面を除去して露出させた溝2aおよび溝2bを位置合わせ用のマークとして、配線層8および絶縁層9を形成することで、配線層8および絶縁層9の位置精度を向上させることができる。
例えば、BGAパッケージとする場合には、外部接続端子10は、半田ボールとしたり、半田メッキやAuメッキなどが施された凸状体などとしたりすることができる。
なお、図3(d)に例示をしたものは、外部接続端子10が半田ボールの場合である。 また、例えば、LGAパッケージとする場合には、外部接続端子10は、金属ランドなどとすることができる。
以上のようにして、複数の半導体装置1が一体的に製造される。
例えば、ブレードダイシング法を用いて半導体装置1毎に分断することで、半導体装置1が得られる。
この場合、複数の溝2aと、複数の溝2bとに沿って封止部7を切断する。
また、溝2aの幅寸法W1、および溝2bの幅寸法W2よりも短い厚み寸法Tを有するブレード100を用いて封止部7を切断する。
硬さや剛性の異なる複数の層が積層された積層体を厚み方向に切断する場合には、各層における切断条件が異なるものとなる。そのため、切断の精度が悪化したり、切断面が傾いたり、硬さの硬い層が欠けたり、ブレード100の目詰まりや欠けが生じたりするおそれがある。
また、前述したように、溝2a、および溝2bの幅寸法Wは、個片化の際に用いられるブレード100の厚み寸法Tよりも長くなっている。
そのため、ブレード100は、封止部7のみを切断し、基板2を切断しないようにすることができる。
つまり、単一の切断条件により切断を行うことができる。
その結果、切断の精度や、切断面の品質などを向上させることができる。
また、封止部7に含まれる絶縁性樹脂を切断するのに適したブレード100を選定することができるので、ブレード100の目詰まりや欠けを抑制することができる。
図4に例示をする半導体装置1は、図3(e)において説明した個片化された半導体装置1である。
前述したように、溝2aの幅寸法W1、および溝2bの幅寸法W2は、個片化の際に用いられるブレード100の厚み寸法Tよりも長くなっている。
そのため、基板2の側面2dも封止部7で覆われている。
すなわち、半導体装置1は、基板2と、基板2の上に積層された複数の半導体チップ3と、基板2の複数の半導体チップ3が積層された側と、基板2の側面2dとを覆う封止部7と、を備えている。
基板2の側面2dが封止部7で覆われていれば、基板2と封止部7との接合強度を高めることができる。
また、基板2の側面2dが封止部7で覆われていれば、封止部7から樹脂部5が露出することがない。
そのため、半導体装置1の信頼性を向上させることができる。
図5(a)〜(d)および図6(a)〜(e)は、第2の実施形態に係る半導体装置の製造方法について例示するための模式工程図である。
まず、図1(a)および図1(b)に例示をしたものと同様にして基板2に溝2a、および溝2bを形成する。
この場合、図2(a)に例示をしたものと同様にして積層体30を形成することができる。
この場合、図2(b)に例示をしたものと同様にしてアンダーフィル樹脂を充填することができる。
この場合、図2(d)に例示をしたものと同様にして封止部7を形成することができる。
前述した第1の実施形態においては、スルービア電極6を形成した後に封止部7を形成する。 これに対して、第2の実施形態においては、封止部7を形成した後にスルービア電極6を形成する。
例えば、封止部7の上面を研削加工して、封止部7の厚み寸法が所定の値となるようにすることができる。
例えば、基板2の積層体30が設けられる側とは反対側の面を研削加工して、溝2a、および溝2bを露出させるようにすることができる。
この場合、溝2aの内部、および溝2bの内部に封止部7が設けられていれば、封止部7が露出した時点を加工の終点とすることができる。
後述するように貫通孔6aの内部には、スルービア電極6が形成される。そのため、貫通孔6aは、スルービア電極6が配線3cと電気的に接続される位置に形成される。
貫通孔6aは、例えば、レーザ穴開け法などを用いて形成することができる。
本実施の形態においては、貫通孔6aを形成する際に、溝2a、溝2b、および領域2cの輪郭の少なくともいずれかを位置合わせ用のマークとすることができる。
そのため、適切な位置に貫通孔6aを形成することが容易となる。
スルービア電極6は、例えば、メッキ法やPVD法などを用いて形成することができる。
続いて、封止部7の上面に配線層8および絶縁層9を形成する。
配線層8は、スルービア電極6の上端面と電気的に接続される。絶縁層9は、配線層8同士の間に設けられ、配線層8同士の間を絶縁する。
なお、スルービア電極6と配線層8は、別個に形成しても良いし、一括して形成しても良い。
本実施の形態においては、配線層8および絶縁層9を形成する際に、溝2a、溝2b、および領域2cの輪郭の少なくともいずれかを位置合わせ用のマークとすることができる。
そのため、配線層8および絶縁層9の位置精度を向上させることができる。
この場合、図3(d)に例示をしたものと同様にして外部接続端子10を形成することができる。
以上のようにして、複数の半導体装置1が一体的に製造される。
この場合、図3(e)に例示をしたものと同様にして半導体装置1を個片化することができる。
本実施の形態においても、図3(e)に例示をしたものと同様の効果を得ることができる。
また、図4に例示をした半導体装置1を得ることができる。
Claims (5)
- 第1の方向に延びる複数の第1の溝と、第1の方向と交差する第2の方向に延びる複数の第2の溝と、を有する基板において、前記複数の第1の溝と、前記複数の第2の溝と、により画された複数の領域のそれぞれに、複数の半導体チップを積層する工程と、
前記基板の前記複数の半導体チップが積層された側を覆う封止部を形成する工程と、
前記基板の前記複数の半導体チップが積層された側とは反対側の面を除去して、前記複数の第1の溝と、前記複数の第2の溝と、を露出させる工程と、
前記封止部の前記基板側とは反対側の面に、前記積層された複数の半導体チップと電気的に接続される配線層を形成する工程と、
前記複数の第1の溝と、前記複数の第2の溝と、に沿って前記封止部を切断する工程と、
を備え、
前記配線層を形成する工程において、前記基板の前記複数の半導体チップが積層された側とは反対側に露出した前記第1の溝、前記第2の溝、および前記領域の輪郭の少なくともいずれかを位置合わせ用のマークとして、前記配線層を形成する半導体装置の製造方法。 - 前記封止部を切断する工程において、前記第1の溝の幅寸法、および前記第2の溝の幅寸法よりも短い厚み寸法を有するブレードを用いて前記封止部を切断する請求項1記載の半導体装置の製造方法。
- 前記複数の半導体チップを積層する工程において、前記第1の溝、前記第2の溝、および前記領域の輪郭の少なくともいずれかを位置合わせ用のマークとして、前記複数の半導体チップを積層する請求項1または2に記載の半導体装置の製造方法。
- 前記積層された複数の半導体チップ同士の間の隙間にアンダーフィル樹脂を充填する工程をさらに備え、
前記積層された複数の半導体チップの側面に付着した前記アンダーフィル樹脂は、前記第1の溝、および前記第2の溝の少なくともいずれかにより、隣接する前記領域への流出が抑制される請求項1〜3のいずれか1つに記載の半導体装置の製造方法。 - 前記半導体チップ、および前記基板は、シリコンを含む請求項1〜4のいずれか1つに記載の半導体装置の製造方法。
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