JP6397869B2 - 円筒型スパッタリングターゲット及びその製造方法 - Google Patents

円筒型スパッタリングターゲット及びその製造方法 Download PDF

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Publication number
JP6397869B2
JP6397869B2 JP2016214323A JP2016214323A JP6397869B2 JP 6397869 B2 JP6397869 B2 JP 6397869B2 JP 2016214323 A JP2016214323 A JP 2016214323A JP 2016214323 A JP2016214323 A JP 2016214323A JP 6397869 B2 JP6397869 B2 JP 6397869B2
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JP
Japan
Prior art keywords
cylindrical
sintered body
oxygen
cylinder
sintering
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JP2016214323A
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English (en)
Japanese (ja)
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JP2017197425A (ja
Inventor
諭 館野
諭 館野
幸三 長田
幸三 長田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JX Nippon Mining and Metals Corp
Original Assignee
JX Nippon Mining and Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JX Nippon Mining and Metals Corp filed Critical JX Nippon Mining and Metals Corp
Priority to TW106106359A priority Critical patent/TWI635194B/zh
Priority to TW107109686A priority patent/TWI699444B/zh
Priority to TW109119026A priority patent/TWI704243B/zh
Priority to TW108132861A priority patent/TWI698542B/zh
Priority to CN201710112294.0A priority patent/CN107236934A/zh
Priority to CN201910536944.3A priority patent/CN110257782B/zh
Priority to KR1020170025870A priority patent/KR20170113075A/ko
Priority to JP2017104785A priority patent/JP6967372B2/ja
Publication of JP2017197425A publication Critical patent/JP2017197425A/ja
Priority to KR1020180054070A priority patent/KR102524402B1/ko
Application granted granted Critical
Publication of JP6397869B2 publication Critical patent/JP6397869B2/ja
Priority to KR1020190070769A priority patent/KR102001363B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/658—Atmosphere during thermal treatment
    • C04B2235/6583—Oxygen containing atmosphere, e.g. with changing oxygen pressures
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/658—Atmosphere during thermal treatment
    • C04B2235/6586—Processes characterised by the flow of gas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2016214323A 2016-03-28 2016-11-01 円筒型スパッタリングターゲット及びその製造方法 Active JP6397869B2 (ja)

Priority Applications (10)

Application Number Priority Date Filing Date Title
TW107109686A TWI699444B (zh) 2016-03-28 2017-02-24 圓筒形濺射靶件及其製造方法
TW109119026A TWI704243B (zh) 2016-03-28 2017-02-24 圓筒形濺射靶件及其製造方法
TW108132861A TWI698542B (zh) 2016-03-28 2017-02-24 圓筒形濺射靶件及其製造方法
TW106106359A TWI635194B (zh) 2016-03-28 2017-02-24 Cylindrical sputtering target and manufacturing method thereof
CN201910536944.3A CN110257782B (zh) 2016-03-28 2017-02-28 圆筒型溅射靶及其制造方法
KR1020170025870A KR20170113075A (ko) 2016-03-28 2017-02-28 원통형 스퍼터링 타겟 및 그 제조 방법
CN201710112294.0A CN107236934A (zh) 2016-03-28 2017-02-28 圆筒型溅射靶及其制造方法
JP2017104785A JP6967372B2 (ja) 2016-03-28 2017-05-26 円筒型スパッタリングターゲット及びその製造方法
KR1020180054070A KR102524402B1 (ko) 2016-03-28 2018-05-11 원통형 스퍼터링 타겟 및 그 제조 방법
KR1020190070769A KR102001363B1 (ko) 2016-03-28 2019-06-14 원통형 스퍼터링 타겟 및 그 제조 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016064132 2016-03-28
JP2016064132 2016-03-28

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2017104785A Division JP6967372B2 (ja) 2016-03-28 2017-05-26 円筒型スパッタリングターゲット及びその製造方法
JP2017179069A Division JP7244989B2 (ja) 2016-03-28 2017-09-19 円筒型スパッタリングターゲット及びその製造方法

Publications (2)

Publication Number Publication Date
JP2017197425A JP2017197425A (ja) 2017-11-02
JP6397869B2 true JP6397869B2 (ja) 2018-09-26

Family

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Family Applications (3)

Application Number Title Priority Date Filing Date
JP2016214323A Active JP6397869B2 (ja) 2016-03-28 2016-11-01 円筒型スパッタリングターゲット及びその製造方法
JP2017104785A Active JP6967372B2 (ja) 2016-03-28 2017-05-26 円筒型スパッタリングターゲット及びその製造方法
JP2017179069A Active JP7244989B2 (ja) 2016-03-28 2017-09-19 円筒型スパッタリングターゲット及びその製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2017104785A Active JP6967372B2 (ja) 2016-03-28 2017-05-26 円筒型スパッタリングターゲット及びその製造方法
JP2017179069A Active JP7244989B2 (ja) 2016-03-28 2017-09-19 円筒型スパッタリングターゲット及びその製造方法

Country Status (3)

Country Link
JP (3) JP6397869B2 (zh)
KR (1) KR102001363B1 (zh)
TW (4) TWI698542B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6523510B1 (ja) * 2018-03-30 2019-06-05 Ｊｘ金属株式会社 スパッタリングターゲット
BE1028481B1 (nl) 2020-07-14 2022-02-14 Soleras Advanced Coatings Bv Sputterdoel met grote densiteit
BE1028482B1 (nl) 2020-07-14 2022-02-14 Soleras Advanced Coatings Bv Vervaardiging en hervullen van sputterdoelen

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0776672B2 (ja) * 1986-08-26 1995-08-16 川崎重工業株式会社 流動層炉の分散板ノズル
JPH08144056A (ja) * 1994-11-22 1996-06-04 Mitsubishi Materials Corp 高強度を有するｉｔｏ薄膜形成用スパッタリングターゲット材の製造法
JP4227227B2 (ja) * 1998-10-30 2009-02-18 Ｄｏｗａホールディングス株式会社 Ｉｔｏスパッタリングターゲットの製造方法
JP2005069668A (ja) * 2003-08-01 2005-03-17 Asahi Glass Co Ltd 窒化ケイ素質セラミックス用焼成容器
TWI390062B (zh) * 2004-03-05 2013-03-21 Tosoh Corp 圓柱形濺射標靶，陶瓷燒結體，以及製造燒結體的方法
JP5299415B2 (ja) * 2010-12-13 2013-09-25 住友金属鉱山株式会社 円筒形スパッタリングターゲット用酸化物焼結体およびその製造方法
JP5750060B2 (ja) * 2012-01-18 2015-07-15 三井金属鉱業株式会社 セラミックス円筒形スパッタリングターゲット材およびその製造方法
WO2014021334A1 (ja) * 2012-07-30 2014-02-06 東ソー株式会社 酸化物焼結体、及びスパッタリングターゲット
JP6186649B2 (ja) * 2013-07-09 2017-08-30 株式会社大一商会 遊技機
JP5799154B2 (ja) * 2013-12-13 2015-10-21 Jx日鉱日石金属株式会社 スパッタリングターゲット及びその製造方法
JP5887391B1 (ja) * 2014-08-22 2016-03-16 三井金属鉱業株式会社 スパッタリングターゲット用ターゲット材の製造方法および爪部材
JP6464776B2 (ja) * 2014-10-29 2019-02-06 住友金属鉱山株式会社 円筒形セラミックス焼結体およびその製造方法
JP2016117950A (ja) * 2014-12-22 2016-06-30 住友化学株式会社 円筒型ターゲット材の製造方法および円筒型ターゲット材
JP5887625B1 (ja) * 2015-03-27 2016-03-16 Ｊｘ金属株式会社 円筒型スパッタリングターゲット、円筒型焼結体、円筒型成形体及びそれらの製造方法
JP6532287B2 (ja) * 2015-05-14 2019-06-19 キヤノン株式会社 医療診断支援装置、情報処理方法及びプログラム
JP2016014191A (ja) * 2015-07-21 2016-01-28 三井金属鉱業株式会社 セラミックス円筒形スパッタリングターゲット材およびその製造方法

Also Published As

Publication number Publication date
TW201819660A (zh) 2018-06-01
JP7244989B2 (ja) 2023-03-23
TWI698542B (zh) 2020-07-11
KR102001363B1 (ko) 2019-07-17
TWI635194B (zh) 2018-09-11
TWI704243B (zh) 2020-09-11
JP6967372B2 (ja) 2021-11-17
TW202035740A (zh) 2020-10-01
TW202014543A (zh) 2020-04-16
JP2017178784A (ja) 2017-10-05
KR20190071656A (ko) 2019-06-24
TWI699444B (zh) 2020-07-21
JP2018009251A (ja) 2018-01-18
JP2017197425A (ja) 2017-11-02
TW201734240A (zh) 2017-10-01

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