JP6393448B2 - Ｔｅｍ／ｓｔｅｍトモグラフィ連続傾斜の取得および位置合せのための基準マーク形成 - Google Patents

Ｔｅｍ／ｓｔｅｍトモグラフィ連続傾斜の取得および位置合せのための基準マーク形成 Download PDF

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JP6393448B2
JP6393448B2 JP2016140965A JP2016140965A JP6393448B2 JP 6393448 B2 JP6393448 B2 JP 6393448B2 JP 2016140965 A JP2016140965 A JP 2016140965A JP 2016140965 A JP2016140965 A JP 2016140965A JP 6393448 B2 JP6393448 B2 JP 6393448B2
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sample
pillar
reference hole
tomographic
tomographic data
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JP2017026612A (ja
JP2017026612A5 (enExample
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セドリック・ブシェ−マルキ
リャン・ジャン
リー・プラン
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エフ・イ−・アイ・カンパニー
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/046—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material using tomography, e.g. computed tomography [CT]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/226—Image reconstruction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2611—Stereoscopic measurements and/or imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2802—Transmission microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/282—Determination of microscope properties
    • H01J2237/2826—Calibration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30433—System calibration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30433—System calibration
    • H01J2237/30438—Registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

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  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Pulmonology (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2016140965A 2015-07-23 2016-07-18 Ｔｅｍ／ｓｔｅｍトモグラフィ連続傾斜の取得および位置合せのための基準マーク形成 Active JP6393448B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201562196246P 2015-07-23 2015-07-23
US62/196,246 2015-07-23

Publications (3)

Publication Number Publication Date
JP2017026612A JP2017026612A (ja) 2017-02-02
JP2017026612A5 JP2017026612A5 (enExample) 2017-08-24
JP6393448B2 true JP6393448B2 (ja) 2018-09-19

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JP2016140965A Active JP6393448B2 (ja) 2015-07-23 2016-07-18 Ｔｅｍ／ｓｔｅｍトモグラフィ連続傾斜の取得および位置合せのための基準マーク形成

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Country Link
US (1) US9627176B2 (enExample)
EP (1) EP3121834A1 (enExample)
JP (1) JP6393448B2 (enExample)
CN (1) CN106370680B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017212020B3 (de) * 2017-07-13 2018-05-30 Carl Zeiss Microscopy Gmbh Verfahren zur In-situ-Präparation und zum Transfer mikroskopischer Proben, Computerprogrammprodukt sowie mikroskopische Probe
JP7154531B2 (ja) * 2018-03-22 2022-10-18 国立大学法人東北大学 電子デバイスの評価方法および評価装置
US10589360B2 (en) 2018-06-17 2020-03-17 Arevo, Inc. Systems of articles of manufacture with corresponding fiducial marks and dimensional variations
EP3657528A1 (en) * 2018-11-26 2020-05-27 FEI Company Method of imaging a sample using an electron microscope
US11264200B1 (en) * 2020-09-23 2022-03-01 Fei Company Lamella alignment based on a reconstructed volume
CN112903733B (zh) * 2021-01-25 2022-07-29 中国科学院广州地球化学研究所 一种透射电镜能谱超分辨分析方法
US12260583B2 (en) * 2021-02-09 2025-03-25 Fei Company 3D fiducial for precision 3D NAND channel tilt/shift analysis
US11476079B1 (en) * 2021-03-31 2022-10-18 Fei Company Method and system for imaging a multi-pillar sample
CN115078772B (zh) * 2022-05-30 2025-10-31 江苏第三代半导体研究院有限公司 一种apt样品制作方法及apt样品
EP4379348A1 (en) * 2022-11-30 2024-06-05 Fei Company Method for micromachining a biological sample for creating a lamella for analysis in a cryo-charged particle microscope
CN117553723B (zh) * 2024-01-12 2024-04-23 中铁大桥局集团有限公司 一种基于三维扫描技术的预埋件装配板孔群的定位方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7442924B2 (en) 2005-02-23 2008-10-28 Fei, Company Repetitive circumferential milling for sample preparation
US7312448B2 (en) 2005-04-06 2007-12-25 Carl Zeiss Nts Gmbh Method and apparatus for quantitative three-dimensional reconstruction in scanning electron microscopy
US7884326B2 (en) 2007-01-22 2011-02-08 Fei Company Manipulator for rotating and translating a sample holder
JP5268324B2 (ja) * 2007-10-29 2013-08-21 株式会社日立ハイテクノロジーズ 荷電粒子線顕微装置及び顕微方法
TWI372859B (en) * 2008-10-03 2012-09-21 Inotera Memories Inc Method for manufacturing an electron tomography specimen with fiducial markers and method for constructing 3d image
JP5321918B2 (ja) * 2010-06-15 2013-10-23 独立行政法人産業技術総合研究所 電子顕微鏡用試料作製方法
EP2402976A1 (en) 2010-06-30 2012-01-04 Fei Company Method of electron diffraction tomography
EP2708874A1 (en) 2012-09-12 2014-03-19 Fei Company Method of performing tomographic imaging of a sample in a charged-particle microscope
EP2738786A1 (en) 2012-11-29 2014-06-04 Fei Company Method of performing tomographic imaging of a sample in a charged-particle microscope
CN105264635B (zh) * 2012-12-31 2018-11-20 Fei 公司 用于利用带电粒子束的倾斜或掠射研磨操作的基准设计
EP2811288B1 (en) 2013-06-06 2016-08-10 Fei Company Method for electron tomography
EP2916342A1 (en) 2014-03-05 2015-09-09 Fei Company Fabrication of a lamella for correlative atomic-resolution tomographic analyses

Also Published As

Publication number Publication date
US20170025246A1 (en) 2017-01-26
CN106370680A (zh) 2017-02-01
US9627176B2 (en) 2017-04-18
JP2017026612A (ja) 2017-02-02
EP3121834A1 (en) 2017-01-25
CN106370680B (zh) 2019-04-23

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